Backside metal patterning die singulation system and related methods
Implementations of methods of singulating a plurality of die included in a substrate may include forming a plurality of die on a first side of a substrate, forming a backside metal layer on a second side of a substrate, applying a photoresist layer over the backside metal layer, patterning the photoresist layer along a die street of the substrate, and etching through the backside metal layer located in the die street of the substrate. The substrate may be exposed through the etch. The method may also include singulating the plurality of die included in the substrate through removing a substrate material in the die street.
1. A method of aligning a silicon carbide substrate, the method comprising:
forming a plurality of die on a first side of the silicon carbide substrate;
forming an edge ring on a second side of the silicon carbide substrate;
forming a backside metal layer on the second side of the silicon carbide substrate;
applying a photoresist layer over the backside metal layer; and
aligning the silicon carbide substrate from the second side of the silicon carbide substrate using a plurality of alignment features comprised one of in the edge ring or on the photoresist layer.
2. The method of claim 1 , further comprising:
patterning the photoresist layer along a die street of the silicon carbide substrate;
etching through the backside metal layer located in the die street of the silicon carbide substrate, wherein the silicon carbide substrate is exposed through the etching; and
singulating the plurality of die comprised in the silicon substrate through removing substrate material in the die street.
3. The method of claim 1 , wherein the plurality of alignment features are formed on the photoresist layer.
4. The method of claim 1 , wherein the silicon carbide substrate is thinned to 75 micrometers thick.
5. The method of claim 1 , wherein the backside metal layer is 10 micrometers thick.
6. The method of claim 1 , further comprising thinning the edge ring prior to aligning the silicon carbide substrate.
7. The method of claim 1 , wherein removing substrate material in a die street further comprises plasma etching.
8. A method of aligning a substrate, the method comprising:
forming a plurality of power semiconductor die on a first side of the substrate;
forming an edge ring on a second side of the substrate;
forming a backside metal layer on the second side of the substrate;
applying a photoresist layer over the backside metal layer; and
aligning the substrate from the second side of the substrate using a plurality of alignment features comprised one of in the edge ring or on the photoresist layer.
9. The method of claim 8 , further comprising forming a seed layer over the second side of the substrate.
10. The method of claim 8 , wherein the plurality of alignment features are formed on the photoresist layer.
11. The method of claim 8 , wherein the plurality of power semiconductor die comprise one of an IGBT, a MOSFET, or both the IGBT and the MOSFET.
12. The method of claim 8 , wherein the backside metal layer is 10 micrometers thick.
13. The method of claim 8 , further comprising thinning the edge ring prior to aligning the substrate.
14. A method of singulating a plurality of die comprised in a substrate, the method comprising:
forming a plurality of die on a first side of the substrate;
forming a seed layer on a second side of the substrate opposite the first side of the substrate;
applying a photoresist layer over the seed layer;
aligning the substrate from the second side of the substrate using a plurality of alignment features one of in a periphery of the substrate or on the photoresist layer;
patterning the photoresist layer;
forming a backside metal layer over the seed layer;
removing the photoresist layer;
singulating the plurality of die comprised in the substrate through removing substrate material in a die street and through removing the seed layer in the die street; and
remote plasma healing a sidewall of each singulated die.
15. The method of claim 14 , wherein the plurality of alignment features are formed on the photoresist layer.
16. The method of claim 14 , wherein the substrate is a silicon carbide substrate.
17. The method of claim 14 , wherein the backside metal layer is 10 micrometers thick.
18. The method of claim 14 , wherein the substrate is thinned to less than 50 microns thick.
19. The method of claim 14 , wherein removing substrate material in the die street further comprises plasma etching.
20. The method of claim 14 , wherein the plurality of die comprise a plurality of power semiconductor die.