Electrostatic chuck, substrate processing apparatus, and substrate processing method
The present disclosure provides an electrostatic chuck, in which a heat transfer layer using a heat transfer fluid is disposed between a chuck main body disposed at an upper side of the electrostatic chuck and a chuck base disposed at a lower side of the electrostatic chuck, and the chuck main body is simply placed on the chuck base so as to be physically in contact with the heat transfer layer, such that heat may be stably transferred without damage even in a condition in which the heat transfer layer is at a high temperature, and the chuck main body may be easily separated from the chuck base for maintenance.
1. An electrostatic chuck comprising:
a chuck main body disposed at an upper side of the electrostatic chuck and configured to hold a substrate with an electrostatic force;
a chuck base disposed at a lower side of the electrostatic chuck and configured to receive high-frequency power and adjust a temperature of the chuck main body;
a heat transfer layer disposed between the chuck main body and the chuck base and configured to transfer heat between the chuck base and the chuck main body using a heat transfer fluid;
an insert including an upper end which is connected to a lower surface of the chuck main body and extends downward; and
a chuck pressing unit configured to maintain a state in which the heat transfer layer contacts each of the chuck main body and the chuck base,
wherein the chuck base has a hole through which the insert passes,
wherein the heat transfer layer has a through space through which the insert passes, and
wherein an upper end of the chuck pressing unit is connected to a lower surface of the chuck base and a lower end of the chuck pressing unit is connected to a lower end of the insert so that the chuck pressing unit applies a downward force to the lower end of the insert.
2. The electrostatic chuck of claim 1 ,
wherein the heat transfer layer provides a heat transfer space disposed between the chuck main body and the chuck base and configured to accommodate the heat transfer fluid.
3. The electrostatic chuck of claim 2 ,
wherein the heat transfer layer comprises an annular outer seal disposed at an outer region of the heat transfer layer and interposed between the chuck main body and the chuck base, such that a gap is formed between the chuck main body and the chuck base, and
wherein the heat transfer space is defined by the chuck main body, the chuck base, and the annular outer seal.
4. The electrostatic chuck of claim 3 ,
wherein the annular outer seal has a hollow portion connected to the heat transfer space, and
wherein the hollow portion is filled with the heat transfer fluid.
5. The electrostatic chuck of claim 3 ,
wherein the annular outer seal comprises a heat resistance material.
6. The electrostatic chuck of claim 3 , further comprising:
a seal protection member covering the annular outer seal.
7. The electrostatic chuck of claim 2 ,
wherein a heat transfer fluid supply line is connected to the heat transfer space.
8. The electrostatic chuck of claim 7 ,
wherein a heat transfer fluid return line is connected to the heat transfer space.
9. The electrostatic chuck of claim 1 ,
wherein the chuck main body is placed on the chuck base, and
wherein the chuck main body contacts the heat transfer layer.
10. The electrostatic chuck of claim 9 ,
wherein the heat transfer layer is provided on an upper portion of the chuck base.
11. The electrostatic chuck of claim 1 ,
wherein the heat transfer layer comprises:
an annular inner seal disposed at an inner region relatively close to a periphery of the through space; and
an annular outer seal disposed at an outer region relatively distant from the periphery of the through space,
wherein the annular inner seal and the annular outer seal are interposed between the chuck main body and the chuck base,
wherein a gap is formed between the chuck main body and the chuck base, and
wherein a heat transfer space for accommodating the heat transfer fluid is defined by the chuck main body, the chuck base, the annular inner seal, and the annular outer seal.
12. The electrostatic chuck of claim 1 ,
wherein the insert has a cavity into which a power line is introduced.
13. The electrostatic chuck of claim 1 ,
wherein the chuck base comprises at least any one of a heating element and a cooling element.
14. The electrostatic chuck of claim 1 ,
wherein the heat transfer fluid is an inert gas.
15. The electrostatic chuck of claim 1 , further comprising:
an insulating member disposed under the lower surface of the chuck base, wherein the insert extends through the insulating member, and the upper end of the chuck pressing unit contacts a lower surface of the insulating member.
16. The electrostatic chuck of claim 1 , further comprising:
an auxiliary plate connecting the lower end of the insert to the lower end of the chuck pressing unit.
17. A substrate processing apparatus comprising:
a process chamber having a substrate processing space; and
an electrostatic chuck disposed in the substrate processing space,
wherein the electrostatic chuck comprises:
a chuck main body disposed at an upper side of the electrostatic chuck and configured to hold a substrate with an electrostatic force;
a chuck base disposed at a lower side of the electrostatic chuck and configured to receive high-frequency power and adjust a temperature of the chuck main body;
a heat transfer layer disposed between the chuck main body and the chuck base and configured to transfer heat between the chuck base and the chuck main body using a heat transfer fluid;
an insert including an upper end which is connected to a lower surface of the chuck main body and extends downward; and
a chuck pressing unit configured to maintain a state in which the heat transfer layer contacts each of the chuck main body and the chuck base,
wherein the chuck base has a hole through which the insert passes,
wherein the heat transfer layer has a through space through which the insert passes, and
wherein an upper end of the chuck pressing unit is connected to a lower surface of the chuck base and a lower end of the chuck pressing unit is connected to a lower end of the insert and the chuck pressing unit is configured to apply a downward force to the lower end of the insert.