Forming electrochromic stacks using at most one metallic lithium deposition station
The present disclosure describes various processes of forming an electrochromic stack using at most one metallic lithium deposition station. In some aspects, a process may include depositing metallic lithium only within an electrochromic counter-electrode of an electrochromic stack. In some aspects, a process may include using a lithium-containing ceramic counter-electrode target to form an electrochromic counter-electrode and depositing metallic lithium only within or above an electrochromic electrode of the electrochromic stack. In some embodiments, a process may include using a lithium-containing ceramic electrode target, and optionally additionally depositing metallic lithium to add mobile lithium to the electrochromic stack. In some embodiments, a process may include using a single metallic lithium deposition station to deposit metallic lithium between an ion-conducting layer and an electrochromic electrode of the electrochromic stack.
1. A process of forming an electrochromic stack having a single layer of metallic lithium disposed within the electrochromic stack, the process comprising:
depositing, using a lithium-containing ceramic electrode target, at least a portion of an electrochromic (EC) layer;
forming an electrochromic counter-electrode (CE) layer over the EC layer; and
depositing a metallic lithium layer over at least a portion of the electrochromic CE layer, wherein the metallic lithium layer is the only layer of the electrochromic stack deposited with metallic lithium.
2. The process of claim 1 , further comprising forming an ion-conducting (IC) layer between the EC layer and the electrochromic CE layer.
3. The process of claim 1 , wherein the electrochromic CE layer includes a first portion and a second portion, wherein depositing the metallic lithium layer over at least the portion of the electrochromic CE layer comprises depositing the metallic lithium layer directly over the first portion of the electrochromic CE layer; and further comprising:
forming the second portion of the electrochromic CE layer directly over the metallic lithium layer.
4. The process of claim 3 , further comprising forming an ion-conducting (IC) layer between the EC layer and the electrochromic CE layer.
5. The process of claim 3 wherein the first portion of the electrochromic CE layer has a first thickness that is not less than 20 nm, and wherein the first portion of the electrochromic CE layer and the second portion of the electrochromic CE layer have a combined thickness of about 270 nm.
6. A process of forming an electrochromic stack having a single layer of metallic lithium disposed within the electrochromic stack, the process comprising:
forming an electrochromic (EC) layer;
forming a first portion of an electrochromic counter-electrode (CE) layer over the EC layer;
depositing a metallic lithium layer over the first portion of the electrochromic CE layer, wherein the metallic lithium layer is the only layer of the electrochromic stack deposited with metallic lithium; and
forming a second portion of the electrochromic (CE) layer directly over the metallic lithium layer.
7. The process of claim 6 , wherein forming the EC layer comprises depositing the EC layer using a lithium-containing ceramic electrode target.
8. The process of claim 6 , further comprising forming an ion-conducting (IC) layer between the EC layer and the first portion of the electrochromic CE layer.
9. The process of claim 6 , wherein the first portion of the electrochromic CE layer has a first thickness that is not less than 20 nm, and wherein the first portion of the electrochromic CE layer and the second portion of the electrochromic CE layer have a combined thickness of about 270 nm.
10. The process of claim 6 , wherein the CE layer comprises a NiWOx material.
11. A process of forming an electrochromic stack, the process comprising:
depositing, using a lithium-containing ceramic electrode target, an electrochromic (EC) layer; and
depositing, using a lithium-containing ceramic counter-electrode target, an electrochromic counter-electrode (CE) layer over the EC layer.
12. The process of claim 11 , further comprising forming an ion-conducting (IC) layer between the EC layer and the electrochromic CE layer.
13. The process of claim 11 , further comprising:
depositing a metallic lithium layer over the EC layer, wherein the metallic lithium layer is the only layer of the electrochromic stack deposited with metallic lithium.
14. The process of claim 11 , further comprising:
depositing a metallic lithium layer over the electrochromic CE layer, wherein the metallic lithium layer is the only layer of the electrochromic stack deposited with metallic lithium.
15. The process of claim 11 , wherein the electrochromic stack includes no metallic lithium layer.
16. A process of forming an electrochromic stack having a single layer of metallic lithium disposed within the electrochromic stack, the process comprising:
forming an electrochromic (EC) layer;
forming an electrochromic counter-electrode (CE) layer over the EC layer; and
depositing a metallic lithium between at least a portion of the EC layer and the electrochromic CE layer, wherein the metallic lithium layer is the only layer of the electrochromic stack deposited with metallic lithium.
17. The process of claim 16 , further comprising forming an ion-conducting (IC) layer between the EC layer and the electrochromic CE layer.
18. The process of claim 16 , wherein the electrochromic CE layer includes a first portion and a second portion, wherein depositing the metallic lithium layer over at least the portion of the electrochromic CE layer comprises depositing the metallic lithium layer directly over the first portion of the electrochromic CE layer; and further comprising:
forming the second portion of the electrochromic CE layer directly over the metallic lithium layer.
19. The process of claim 16 , further comprising forming an ion-conducting (IC) layer between the second portion of the EC layer and the electrochromic CE layer.
20. The process of claim 16 , wherein the first portion of the electrochromic CE layer has a first thickness that is not less than 20 nm, and wherein the first portion of the electrochromic CE layer and the second portion of the electrochromic CE layer have a combined thickness of about 270 nm.