IP Library Granted Patent US 12,376,317
Granted Patent B2
US 12,376,317 · App. 18/353,307 · Granted Jul 29, 2025

Semiconductor device structure with magnetic element

Inventors: Chi-Cheng Chen (Tainan, TW); Wei-Li Huang (Pingtung, TW); Chien-Chih Kuo (Tainan, TW); Hon-Lin Huang (Hsinchu, TW); Chin-Yu Ku (Hsinchu, TW); Chen-Shien Chen (Zhubei, TW)
Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
H10D1/20H01F41/046H01L21/76823H01L23/3114H01L23/3171H01L23/53204H01L24/05H01L24/32H01L24/48H01L2224/04042H01L2224/04073H01L2224/05
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Quick Facts
Patent No.
US 12,376,317
App. No.
18/353,307
Filed
Jul 17, 2023
Granted
Jul 29, 2025
Kind
B2
Examiner
LE, THAO P
Art Unit
2818
USPC
257/783
Abstract

A semiconductor device structure is provided. The semiconductor device structure includes a substrate and a magnetic element over the substrate. The semiconductor device structure also includes an isolation element partially covering the magnetic element. The semiconductor device structure further includes a conductive feature over the isolation element.

Claims (37)

1. A semiconductor device structure, comprising:

a substrate;

a magnetic element over the substrate;

an isolation element partially covering the magnetic element, wherein the isolation element and the magnetic element have different widths; and

a conductive feature over the isolation element.

2. The semiconductor device structure as claimed in claim 1 , further comprising:

an adhesive element between the magnetic element and the substrate.

3. The semiconductor device structure as claimed in claim 2 , wherein the isolation element extends exceeding opposite edges of the adhesive element.

4. The semiconductor device structure as claimed in claim 2 , wherein the adhesive element extends exceeding an edge of the magnetic element.

5. The semiconductor device structure as claimed in claim 2 , wherein the adhesive element comprises titanium, aluminum, copper, or a combination thereof.

6. The semiconductor device structure as claimed in claim 1 , wherein the isolation element is wider than the magnetic element along a first direction, and the magnetic element is wider than the isolation element along a second direction.

7. The semiconductor device structure as claimed in claim 1 , wherein the magnetic element comprises a plurality of sub-layers, and each sub-layers is wider than another sub-layer above it.

8. The semiconductor device structure as claimed in claim 7 , wherein a topmost sub-layer of the sub-layers has a first portion and a second portion, the second portion laterally surrounds the first portion, and the first portion is thicker than the second portion.

9. The semiconductor device structure as claimed in claim 1 , wherein opposite edges of the isolation element are laterally between opposite edges of the magnetic element.

10. The semiconductor device structure as claimed in claim 1 , wherein the isolation element extends across opposite edges of the magnetic element.

11. A semiconductor device structure, comprising:

a substrate;

a magnetic element over the substrate;

an isolation element extending across an edge of the magnetic element, wherein the magnetic element extends across opposite edges of the isolation element; and

a conductive feature over the isolation element.

12. The semiconductor device structure as claimed in claim 11 , further comprising an adhesive element between the magnetic element and the substrate.

13. The semiconductor device structure as claimed in claim 12 , wherein the adhesive element is separated from the conductive feature by a hole.

14. The semiconductor device structure as claimed in claim 12 , wherein an edge of the adhesive element is closer to an edge of the isolation element than the edge of the magnetic element.

15. The semiconductor device structure as claimed in claim 11 , wherein opposite edges of the conductive feature are laterally between opposite edges of the isolation element.

16. A semiconductor device structure, comprising:

a substrate;

a magnetic element over the substrate;

a first isolation element covering a first portion of the magnetic element;

a second isolation element covering a second portion of the magnetic element, wherein the first isolation element is spaced apart from the second isolation element;

a first conductive feature over the first isolation element; and

a second conductive feature over the second isolation element.

17. The semiconductor device structure as claimed in claim 16 , wherein opposite edges of first isolation element are laterally between opposite edges of the magnetic element, and opposite edges of the second isolation element are laterally between the opposite edges of the magnetic element.

18. The semiconductor device structure as claimed in claim 17 , wherein each of the first isolation element and the second isolation element extends across the magnetic element.

19. The semiconductor device structure as claimed in claim 16 , further comprising:

a metal-containing element between the magnetic element and the substrate, wherein the first isolation element is closer to the first conductive feature than the metal-containing element.

20. The semiconductor device structure as claimed in claim 19 , further comprising:

a dielectric element between the magnetic element and the metal-containing element.

Continuity (5)
Continuation 17578757 · Jan 19, 2022
Continuation 16933062 · Jul 20, 2020
Continuation 16260599 · Jan 29, 2019
Provisional Application 62725695 · Aug 31, 2018
Related Publication 20230361156A1 · Nov 9, 2023
References Cited (27)
US 7042032B2 · Lin · 2006 [cited by examiner]
US 7470927B2 · Lee et al. · 2008 [cited by applicant]
US 9691544B2 · Sun · 2017 [cited by applicant]
US 10446209B2 · Watts · 2019 [cited by examiner]
US 11107808B1 · Or-Bach et al. · 2021 [cited by applicant]
US 11749711B2 · Chen · 2023 [cited by examiner]
US 20040021382A1 · Steinmeyer · 2004 [cited by applicant]
US 20060014052A1 · Watanabe · 2006 [cited by examiner]
US 20090050991A1 · Nagai et al. · 2009 [cited by applicant]
US 20120181640A1 · von Koblinski et al. · 2012 [cited by applicant]
US 20140167193A1 · Iuliano et al. · 2014 [cited by applicant]
US 20150311901A1 · Bromberg et al. · 2015 [cited by applicant]
US 20160254255A1 · Hori et al. · 2016 [cited by applicant]
US 20160307991A1 · Kuo et al. · 2016 [cited by applicant]
US 20170365755A1 · Chu · 2017 [cited by applicant]
US 20180366536A1 · Hsu et al. · 2018 [cited by applicant]
US 20190006455A1 · Ku et al. · 2019 [cited by applicant]
US 20190164920A1 · Tsao et al. · 2019 [cited by applicant]
US 20190203564A1 · Henschel, Jr. et al. · 2019 [cited by applicant]
US 20200006465A1 · Ku et al. · 2020 [cited by applicant]
US 20210296574A1 · Reznicek · 2021 [cited by examiner]
US 20210376053A1 · Hsu et al. · 2021 [cited by applicant]
US 20210384182A1 · Xu et al. · 2021 [cited by applicant]
US 20220140065A1 · Chen et al. · 2022 [cited by applicant]
US 20220230979A1 · Williamson et al. · 2022 [cited by applicant]
US 20220262892A1 · Ku · 2022 [cited by examiner]
U.S. Office Action for U.S. Appl. No. 16/432,625, dated Dec. 9, 2020. [cited by applicant]