Buried power rail after replacement metal gate
Embodiments herein include semiconductor structures with a first source/drain (S/D) connected to a first field-effect transistor (FET) region, a second S/D connected to a second FET region, and a buried power rail (BPR) region. The BPR region may include a BPR, a first dielectric liner lining a first lateral side of the BPR region, and a second dielectric liner lining a second lateral side. The first dielectric liner isolates the BPR from the first FET region and the first S/D, and the second dielectric liner isolates the BPR from the second FET region. Embodiments may also include a contact electrically connecting the second S/D and the BPR through a second lateral side of the BPR region. The liners enable the BPR to be formed after the formation of gates and the S/Ds, so that the BPR does not cause problems during annealing processes of the gates and the S/Ds.
1. A semiconductor structure, comprising:
a first source/drain (S/D) connected to a first field-effect transistor (FET) region;
a second S/D connected to a second FET region;
a buried power rail (BPR) region extending laterally in a first direction, and located between the first FET region and the second FET region, comprising:
a buried power rail (BPR);
a first dielectric liner lining a first lateral side of the BPR region, wherein the first dielectric liner isolates the BPR from the first FET region and the first S/D;
a second dielectric liner lining a second lateral side of the BPR region, wherein the second dielectric liner isolates the BPR from the second FET region; and
a contact electrically connecting the second S/D and the BPR through the second lateral side of the BPR region, wherein the first dielectric liner extends higher than the second dielectric liner in the BPR region.
2. The semiconductor structure of claim 1 , wherein the first FET region and the second FET region are devices with a first polarity selected from the group consisting of: a PFET and an NFET.
3. The semiconductor structure of claim 1 , wherein the first dielectric liner and the second dielectric liner connect below the BPR to isolate a lower portion of the BPR from a substrate.
4. The semiconductor structure of claim 1 , further comprising a horizontal metal extension, wherein the horizontal metal extension extends from the contact over a top surface of the BPR between the first dielectric liner and the second dielectric liner.
5. The semiconductor structure of claim 1 , further comprising a gate region adjacent to the first FET region and the second FET region along the BPR in the first direction, wherein at the gate region the first dielectric liner separates the BPR from a first gate, and the second dielectric liner separates the BPR from a second gate.
6. The semiconductor structure of claim 5 , further comprising:
an interlayer dielectric (ILD) between the first dielectric liner and the second dielectric liner; and
a horizontal metal extension located between the ILD and the BPR.
7. A method, comprising:
forming a first gate and a second gate in a gate region of a semiconductor structure;
forming a first source/drain (S/D) and a second S/D in a S/D region adjacent to the gate region;
etching a buried power rail (BPR) region between the first gate and the second gate and between the first S/D and the second S/D;
forming a first dielectric liner lining a first lateral side of the BPR region;
forming a second dielectric liner lining a second lateral side of the BPR region;
forming a BPR between the first dielectric liner and the second dielectric liner;
forming a contact opening through the second dielectric liner in the S/D region and at least part of the second S/D.
8. The method of claim 7 , further comprising:
forming a first fin field-effect transistor (FET) of a first doping type before forming the first gate above the first fin FET; and
forming a second fin FET of the first doping type before forming the second gate above the second fin FET.
9. The method of claim 7 , wherein the first dielectric liner and the second dielectric liner line a lower portion of the BPR region to isolate the BPR from a substrate.
10. The method of claim 7 , further comprising:
recessing the BPR from an interlayer dielectric (ILD) portion at a top of the BPR;
forming an ILD in the ILD portion before cutting the contact.
11. The method of claim 10 , further comprising:
forming a first dielectric cap above the BPR before forming the ILD;
etching the first dielectric cap after cutting the contact to form a horizontal metal extension region; and
metalizing the horizontal metal extension region to form a horizontal metal extension.
12. A semiconductor structure, comprising:
a gate region comprising a first dielectric liner between a first gate and a buried power rail (BPR), and a second dielectric liner between a second gate and the BPR;
a source/drain (S/D) region comprising the first dielectric liner between a first source/drain (S/D) and the BPR, and a second S/D contacting the BPR; and
a horizontal metal extension of the second S/D, wherein the horizontal metal extension contacts an interior side of the first dielectric liner.
13. The semiconductor structure of claim 12 , wherein the gate region further comprises an interlayer dielectric (ILD) between the first dielectric liner and the second dielectric liner, wherein the horizontal metal extension is located between the ILD and the BPR.
14. The semiconductor structure of claim 12 , wherein the first dielectric liner and the second dielectric liner isolate a lower portion of the BPR from a substrate.
15. The semiconductor structure of claim 12 , wherein the gate region is adjacent to the S/D region along the BPR.
16. A semiconductor structure, comprising:
a first field-effect transistor (FET) region comprising a first source/drain (S/D) contact;
a second FET region comprising a second S/D contact;
a deep shallow trench isolation (STI) between the first FET region and the second FET region; and
a buried power rail (BPR), wherein a lower portion of the BPR is isolated from the first FET region and the second FET region by the deep STI an upper portion of the BPR is isolated from the first S/D contact by a first dielectric liner, and the upper portion of the BPR contacts the second S/D contact, and the first dielectric liner isolates the upper portion of the BPR from a first gate, and a second dielectric liner isolates the upper portion of the BPR from a second gate.
17. The semiconductor structure of claim 16 , wherein the lower portion of the BPR contacts the second S/D contact.