IP Library › Granted Patent US 12,406,927
Granted Patent B2
US 12,406,927 · App. 17/730,495 · Granted Sep 2, 2025

RF switch device including multi-width air gaps

Inventors: Ki Won Lim (Suwon-si, KR); Jin Hyo Jung (Suwon-si, KR); Hae Taek Kim (Bucheon, KR); Seung Hyun Eom (Seoul, KR); Ja Geon Koo (Eumseong-gun, KR); Hyun Joong Lee (Daejeon, KR); Sang Yong Lee (Chungju-si, KR)
Assignee: DB HiTek Co., Ltd.
H01L23/5283H01L21/7682H10D64/519H01L21/76885H01L23/5329
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Quick Facts
Patent No.
US 12,406,927
App. No.
17/730,495
Granted
Sep 2, 2025
Kind
B2
Abstract

An RF switch device in a stacked configuration and a method of manufacturing the same seek to reduce or eliminate a voltage imbalance, a condition in which different voltages are applied to different stages of the RF switch device, by forming air gaps on or over corresponding gate electrodes, in which each of the air gaps in a single stage has a different width.

Claims (24)

1. An RF switch device, comprising:

a semiconductor layer;

gate electrodes spaced apart from each other in a single stage and on the semiconductor layer;

sources in the semiconductor layer;

drains in the semiconductor layer;

a lower source contact connected to one of the sources;

a first lower metal structure connected to the lower source contact;

an upper source contact connected to the first lower metal structure;

a first upper metal structure connected to the upper source contact;

a lower drain contact connected to one of the drains;

a second lower metal structure connected to the lower drain contact;

an upper drain contact connected to the second lower metal structure;

a second upper metal structure connected to the upper drain contact; and

air gaps configured such that, in the single stage and on or over each gate electrode, at least one of the air gaps has a different width than other ones of the air gaps,

wherein the first upper metal structure includes:

a source tab extending along a first direction; and

a plurality of source extensions extending in a second direction from the source tab,

the second upper metal structure includes:

a drain tab extending in the first direction and spaced apart from the source tab in the second direction; and

a plurality of drain extensions extending in the second direction from the drain tab, and

each of the source extensions and the drain extensions has a length less than half a distance between the source tab and the drain tab in the second direction.

2. The RF switch device of claim 1 , comprising multiple stages, the multiple stages including the single stage.

3. The RF switch device of claim 2 , wherein the air gaps within the single stage have different widths to reduce or eliminate a voltage imbalance in the RF switch device.

4. The RF switch device of claim 1 , wherein the source extensions and the drain extensions do not overlap each other along the first direction.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2022
From: LIM, KI WON; JUNG, JIN HYO; KIM, HAE TAEK; EOM, SEUNG HYUN; KOO, JA GEON; LEE, HYUN JOONG; LEE, SANG YONG
To: DB HITEK CO., LTD.
Reel/Frame 059742/0098 →
Priority Claims (1)
KR 10-2021-0061299 · May 12, 2021 · national
Continuity (1)
Related Publication 20220367354A1 · Nov 17, 2022
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