Semiconductor device and display device including the semiconductor device
A semiconductor device including an oxide semiconductor film that includes a transistor with excellent electrical characteristics is provided. It is a semiconductor device including a transistor. The transistor includes a gate electrode, a first insulating film, an oxide semiconductor film, a source electrode, a drain electrode, and a second insulating film. The source electrode and the drain electrode each include a first conductive film, a second conductive film over and in contact with the first conductive film, and a third conductive film over and in contact with the second conductive film. The second conductive film contains copper, the first conductive film and the third conductive film include a material that inhibits diffusion of copper, and an end portion of the second conductive film includes a region containing copper and silicon.
1. A semiconductor device comprising:
a substrate;
a first conductive film over the substrate;
a first insulating film over the first conductive film;
a second insulating film over the first insulating film;
an oxide semiconductor film and a second conductive film over the second insulating film;
a third insulating film over the oxide semiconductor film and the second conductive film;
a fourth insulating film over the third insulating film; and
a third conductive film over the fourth insulating film,
wherein the first conductive film is configured to function as a first gate electrode of a transistor,
wherein the third conductive film is configured to function as a second gate electrode of the transistor,
wherein the oxide semiconductor film comprises a channel formation region of the transistor,
wherein the second conductive film comprises a fourth conductive film, a fifth conductive film, and a sixth conductive film,
wherein the fourth conductive film is in contact with the first conductive film in a first opening provided in the first insulating film and the second insulating film,
wherein the third conductive film is in contact with the sixth conductive film in a second opening provided in the third insulating film and the fourth insulating film, and
wherein an end portion of the fifth conductive film comprises copper and silicon.
2. A semiconductor device comprising:
a substrate;
a first conductive film over the substrate;
a first insulating film over the first conductive film;
an oxide semiconductor film and a second conductive film over the first insulating film;
a second insulating film over the oxide semiconductor film and the second conductive film; and
a third conductive film over the second insulating film,
wherein the oxide semiconductor film comprises a channel formation region of a transistor,
wherein the first conductive film is electrically connected to the third conductive film via the second conductive film, and
wherein the second conductive film is formed by processing a conductive film functioning as one of a source electrode and a drain electrode of the transistor.
3. A semiconductor device comprising:
a transistor, the transistor comprising:
a gate electrode;
a gate insulating film over the gate electrode;
an oxide semiconductor film overlapping with the gate electrode with the gate insulating film therebetween;
a source electrode comprising a region in contact with a top surface of the oxide semiconductor film;
a drain electrode comprising a region in contact with the top surface of the oxide semiconductor film; and
a first insulating film over the oxide semiconductor film, the source electrode, and the drain electrode,
wherein the semiconductor device further comprises:
a pixel electrode over the first insulating film; and
a common electrode overlapping with the pixel electrode with a second insulating film therebetween,
wherein the oxide semiconductor film comprises a first oxide semiconductor film and a second oxide semiconductor film over the first oxide semiconductor film,
wherein the oxide semiconductor film comprises a first region overlapping with the source electrode,
wherein the oxide semiconductor film comprises a second region overlapping with the drain electrode,
wherein, in the first region of the oxide semiconductor film, a thickness of the second oxide semiconductor film is greater than a thickness of the first oxide semiconductor film,
wherein, in the second region of the oxide semiconductor film, a thickness of the second oxide semiconductor film is greater than a thickness of the first oxide semiconductor film,
wherein each of the source electrode and the drain electrode comprises a first conductive film and a second conductive film in contact with a top surface of the first conductive film,
wherein, in a channel length direction of the transistor, an end portion of the first conductive film comprises a region which protrudes farther than an end portion of the second conductive film,
wherein the first insulating film comprises a region in contact with the top surface of the first conductive film and a region in contact with a side surface of the first conductive film,
wherein the pixel electrode is electrically connected to one of the source electrode and the drain electrode,
wherein the common electrode comprises a region overlapping with the oxide semiconductor film with the first insulating film therebetween,
wherein the first conductive film comprises titanium,
wherein the second conductive film comprises copper, and
wherein the end portion of the second conductive film comprises a compound including copper.
4. The semiconductor device according to claim 3 , wherein each of the first oxide semiconductor film and the second oxide semiconductor film comprises In, Zn, and M, and
wherein M is represented by Al, Ga, Y, or Sn.