Electronic devices having glass layers with scratch resistant coatings
An electronic device may be surrounded by an exterior region and may have an interior region. Electronic components may be mounted in the interior region. Housing walls such as housing walls formed from transparent layers of material may separate the interior region from the exterior region. A display may be visible through one of the transparent layers of material. A transparent layer of material may be coupled to housing structures in the device and may be formed of glass or glass-ceramic. The transparent layer may have two opposing chemically strengthened surface layers of different thicknesses. A coating may be formed on a thinner of the two opposing chemically strengthened surface layers. The coating may have an oleophobic outer coating layer, an antireflection layer, and an antiscratch layer. The antiscratch layer may have one or more compressively stressed dielectric layers and may have one or more corresponding graded composition layers.
1. An electronic device, comprising:
a display;
a sensor; and
a coated transparent layer overlapping the display and the sensor, wherein the coated transparent layer comprises:
a layer of glass-ceramic, wherein the layer of glass-ceramic comprises first and second opposing chemically strengthened surface layers, and the first chemically strengthened surface layer is thinner than the second chemically strengthened surface layer; and
a coating on the glass-ceramic that comprises an antiscratch layer, the antiscratch layer comprising:
a compressively stressed layer; and
graded composition layer that extends from the compressively stressed layer to the layer of glass-ceramic, wherein the coating is directly on the first chemically strengthened surface layer.
2. The electronic device defined in claim 1 wherein the compressively stressed layer comprises a silicon oxynitride layer and wherein the graded composition layer has a composition varying from silicon oxynitride to silicon oxide as a function of distance through the graded composition layer.
3. The electronic device defined in claim 2 further comprising:
an oleophobic layer; and
an antireflection layer between the oleophobic layer and the compressively stressed layer.
4. The electronic device defined in claim 3 wherein the antireflection layer comprises alternating layers of first and second dielectric with respective first and second refractive index values.
5. The electronic device defined in claim 4 wherein the first dielectric comprises silicon oxynitride.
6. The electronic device defined in claim 5 wherein the second dielectric comprises silicon nitride.