Semiconductor device
A semiconductor structure includes first and second active regions extending in a first direction. The semiconductor structure further includes gate electrodes extending in a second direction perpendicular to the first direction. Each of the gate electrodes includes a first segment over at least one of the first active region or the second active region; a gate extension extending beyond each of the first active region and the second active region, wherein the gate extension has a uniform width in the first direction, and a conductive element, wherein a width of the conductive element in the first direction increases as a distance from the gate extension increases along an entirety of the conductive element in the second direction.
1. A semiconductor structure comprising:
first and second active regions extending in a first direction;
gate electrodes extending in a second direction perpendicular to the first direction, wherein each of the gate electrodes comprises:
a first segment over at least one of the first active region or the second active region;
a gate extension extending beyond each of the first active region and the second active region, wherein the gate extension has a uniform width in the first direction, and
a conductive element, wherein a width of the conductive element in the first direction increases as a distance from the gate extension increases along an entirety of the conductive element in the second direction.
2. The semiconductor structure of claim 1 , wherein a first gate electrode of the gate electrodes extends beyond the first active region on a first side and on a second side, wherein the second side is opposite the first side.
3. The semiconductor structure of claim 1 , wherein a length of the gate extension in the second direction is less than or equal to 50 nanometers (nm).
4. The semiconductor structure of claim 1 , wherein a maximum width of the conductive element ranges from about 100 nm to about 150 nm.
5. The semiconductor structure of claim 1 , wherein a width of the first segment is equal to a width of the gate extension.
6. The semiconductor structure of claim 1 , wherein a first segment over the first active region is aligned with a first segment over the second active region in the first direction.
7. The semiconductor structure of claim 1 , wherein a length of the gate extension in the second direction is less than or equal to a width of the gate extension in the first direction.
8. The semiconductor structure of claim 1 , wherein a width of the first segment is less than or equal to 50 nm.
9. A semiconductor structure comprising:
an active region extending in a first direction;
a gate electrode extending in a second direction perpendicular to the first direction, wherein the gate electrode comprises:
a first segment over the active region;
a gate extension extending beyond the active region, wherein the gate extension has a uniform width in the first direction, and
a conductive element, wherein a width of the conductive element in the first direction increases as a distance from the gate extension increases along an entirety of the conductive element in the second direction.
10. The semiconductor structure of claim 9 , wherein the gate electrode further comprises a rear extension extending beyond the active region on an opposite side from the gate extension.
11. The semiconductor structure of claim 10 , wherein a width of the rear extension is uniform along an entire length of the rear extension.
12. The semiconductor structure of claim 9 , further comprising a second active region spaced from the first active region in the second direction.
13. The semiconductor structure of claim 12 , wherein the gate extension extends toward the second active region.
14. The semiconductor structure of claim 9 , wherein the conductive element comprises a curved surface.
15. A semiconductor structure comprising:
an active region extending in a first direction;
a gate electrode extending in a second direction perpendicular to the first direction, wherein the gate electrode comprises:
a first segment over the active region;
a first gate extension extending beyond a first edge of the active region, wherein the first gate extension has a uniform width in the first direction,
a second gate extension extending beyond a second edge of the active region, wherein the first edge is opposite the second edge, and the second gate extension has a uniform width in the first direction, and
a conductive element, wherein a width of the conductive element in the first direction increases as a distance from the first gate extension increases along an entirety of the conductive element in the second direction.
16. The semiconductor structure of claim 15 , wherein the uniform width of the first gate extension is equal to the uniform width of the second gate extension.
17. The semiconductor structure of claim 15 , wherein the uniform width of the first gate extension is equal to a width of the first segment.
18. The semiconductor structure of claim 15 , wherein a length of the first gate extension is less than or equal to the uniform width of the first gate extension.
19. The semiconductor structure of claim 15 , wherein the conductive element comprises a curved surface.
20. The semiconductor structure of claim 15 , wherein the width of the conductive element increases in a constant manner as the distance from the first gate extension increases.