IP Library Granted Patent US 12,441,606
Granted Patent B2
US 12,441,606 · App. 18/075,882 · Granted Oct 14, 2025

MEMS device including coil structure with corrugated polymer film

Inventors: Jung-Hao Chang (Taoyuan, TW); Weng-Yi Chen (Hsinchu County, TW)
Assignee: UNITED MICROELECTRONICS CORP.
B81C1/00476B81B7/02B81B2201/0257B81B2203/0315B81B2203/033B81B2203/0353B81B2207/01B81C2201/0108B81C2201/0132B81C2201/0133B81C2201/014B81C2201/0176
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Quick Facts
Patent No.
US 12,441,606
App. No.
18/075,882
Granted
Oct 14, 2025
Kind
B2
Abstract

A micro electro mechanical system (MEMS) device and a method for manufacturing the same are provided. The MEMS device includes a substrate, a polymer film on the substrate and having a lower surface facing toward the substrate, a cavity passing through the substrate, and coil structures on the substrate and in the polymer film. The polymer film includes a corrugation pattern on the lower surface of the polymer film. A portion of the polymer film is exposed in the cavity.

Claims (14)

1. A micro electro mechanical system (MEMS) device, comprising:

a substrate;

a polymer film on the substrate and having a lower surface facing toward the substrate, wherein the polymer film comprises a corrugation pattern on the lower surface of the polymer film;

a cavity passing through the substrate, wherein a portion of the polymer film is exposed in the cavity;

coil structures on the substrate and in the polymer film;

a dielectric layer between the substrate and the polymer film, wherein the cavity passes through the dielectric layer; and

an oxide layer between the dielectric layer and the substrate.

2. The MEMS device according to claim 1 , wherein the corrugation pattern of the polymer film is exposed in the cavity.

3. The MEMS device according to claim 1 , wherein the corrugation pattern of the polymer film comprises convex portions separated from each other, the convex portions protrude toward the cavity.

4. The MEMS device according to claim 1 , wherein the polymer film has an upper surface opposite to the lower surface, the upper surface of the polymer film comprises a flat surface portion, and the flat surface portion overlaps the corrugation pattern along a longitudinal direction.

5. The MEMS device according to claim 1 , wherein the dielectric layer has a lower surface facing toward the substrate, a portion of the lower surface of the dielectric layer is exposed in the cavity.

6. The MEMS device according to claim 1 , wherein the oxide layer and the dielectric layer comprise different materials.

7. The MEMS device according to claim 1 , wherein the cavity passes through the oxide layer.

8. The MEMS device according to claim 1 , further comprising a metal layer between the substrate and the polymer film, a portion of the metal layer is exposed in the cavity.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2022
From: CHANG, JUNG-HAO; CHEN, WENG-YI
To: UNITED MICROELECTRONICS CORP.
Reel/Frame 061997/0590 →
Priority Claims (1)
TW 111143258 · Nov 11, 2022 · national
Continuity (1)
Related Publication 20240158225A1 · May 16, 2024
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