IP Library Granted Patent US 12,451,402
Granted Patent B2
US 12,451,402 · App. 17/747,932 · Granted Oct 21, 2025

Liquid metal thermal interface

Inventor: Ross B. Berntson (New Hartford, NY)
Assignee: INDIUM CORPORATION
H01L23/3733H01L21/4882H01L23/3672H01L23/3675H01L23/3735H01L24/29G01R31/2874H01L23/42H01L24/16H01L24/32H01L24/73H01L24/83H01L2224/16225H01L2224/16227H01L2224/16238H01L2224/29083H01L2224/29105H01L2224/29109H01L2224/29111H01L2224/29118H01L2224/29205H01L2224/29209H01L2224/29305H01L2224/29309H01L2224/29311H01L2224/29318H01L2224/32225H01L2224/32502H01L2224/32506H01L2224/73204H01L2224/73253H01L2224/83201H01L2224/83805H01L2924/0132H01L2924/0133H01L2924/0134H01L2924/16235H01L2924/16251H01L2924/1632H01L2924/16598
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,451,402
App. No.
17/747,932
Granted
Oct 21, 2025
Kind
B2
Abstract

Liquid metal thermal interface materials and their uses in electronics assembly are described. In one implementation, a semiconductor assembly includes: a semiconductor die; a heat exchanger; and a thermal interface material (TIM) alloy bonding the semiconductor die to the heat exchanger without using a separate metallization layer on a surface of the semiconductor die or a surface of the heat exchanger. The TIM alloy may be formed by placing a TIM material between the semiconductor die and the heat exchanger, the TIM material comprising a first liquid metal foam in touching relation with the surface of the semiconductor die, a second liquid metal foam in touching relation with the surface of the heat exchanger.

Claims (29)

1. A semiconductor assembly, comprising:

a semiconductor die;

a heat exchanger; and

a thermal interface material (TIM) alloy bonding the semiconductor die to the heat exchanger without a separate metallization layer on a surface of the semiconductor die or a surface of the heat exchanger, the TIM alloy comprising:

a first liquid metal foam in touching relation with the surface of the semiconductor die,

a second liquid metal foam in touching relation with the surface of the heat exchanger, and

a thermally conductive metal foil between and in touching relation with the first liquid metal foam and the second liquid metal foam, the thermally conductive metal foil comprising multiple first regions and multiple second regions, the first regions having a first thickness and the second regions having a second thickness greater than the first thickness and forming a patterned surface on the thermally conductive metal foil.

2. A semiconductor assembly, comprising:

a semiconductor die;

a heat exchanger; and

a thermal interface material (TIM) alloy bonding the semiconductor die to the heat exchanger without a separate metallization layer on a surface of the semiconductor die or a surface of the heat exchanger, the TIM alloy comprising:

a first liquid metal in touching relation with the surface of the semiconductor die,

a second liquid metal in touching relation with the surface of the heat exchanger, and

a thermally conductive metal foil between and in touching relation with the first liquid metal and the second liquid metal, the thermally conductive metal foil comprising multiple first regions and multiple second regions, the first regions having a first thickness and the second regions having a second thickness greater than the first thickness and forming a patterned surface on the thermally conductive metal foil.

3. The semiconductor assembly of claim 2 , wherein the thermally conductive metal foil consists essentially of indium or an indium alloy.

4. The semiconductor assembly of claim 1 , wherein the thermally conductive metal foil consists essentially of indium or an indium alloy.

5. The semiconductor assembly of claim 1 , wherein each of the first liquid metal foam and the second liquid metal foam comprises:

gallium oxide; and

liquid gallium or a liquid gallium alloy.

6. The semiconductor assembly of claim 5 , wherein the thermally conductive metal foil consists essentially of indium or an indium alloy.

7. The semiconductor assembly of claim 1 , wherein the heat exchanger comprises a heat sink, a heat spreader, or a semiconductor package lid.

8. The semiconductor assembly of claim 7 , wherein the heat exchanger comprises the heat sink.

9. The semiconductor assembly of claim 7 , wherein the heat exchanger comprises the heat spreader or the semiconductor package lid.

10. The semiconductor assembly of claim 2 , wherein each of the first liquid metal and the second liquid metal comprises gallium.

11. The semiconductor assembly of claim 10 , wherein each of the first liquid metal and the second liquid metal comprises gallium and indium.

12. The semiconductor assembly of claim 11 , wherein the thermally conductive metal foil consists essentially of indium or an indium alloy.

13. The semiconductor assembly of claim 2 , wherein the heat exchanger comprises a heat sink, a heat spreader, or a semiconductor package lid.

14. The semiconductor assembly of claim 13 , wherein the heat exchanger comprises the heat sink.

15. The semiconductor assembly of claim 13 , wherein the heat exchanger comprises the semiconductor package lid.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 18, 2022
From: BERNTSON, ROSS B.
To: INDIUM CORPORATION
Reel/Frame 059951/0586 →
Continuity (2)
Provisional Application 63190586 · May 19, 2021
Related Publication 20220375817A1 · Nov 24, 2022
References Cited (36)
US 5150274A · Okada · 1992 [cited by examiner]
US 5323294A · Layton · 1994 [cited by examiner]
US 6196307B1 · Ozmat · 2001 [cited by examiner]
US 7593228B2 · Jarrett et al. · 2009 [cited by applicant]
US 10607857B2 · Berntson et al. · 2020 [cited by applicant]
US 10672530B2 · Ronay · 2020 [cited by applicant]
US 10943795B2 · Berntson et al. · 2021 [cited by applicant]
US 10943796B2 · Berntson et al. · 2021 [cited by applicant]
US 20020175403A1 · Sreeram · 2002 [cited by examiner]
US 20030027910A1 · Misra · 2003 [cited by examiner]
US 20030227959A1 · Balian · 2003 [cited by examiner]
US 20060000591A1 · Adams · 2006 [cited by examiner]
US 20060137862A1 · Huang · 2006 [cited by examiner]
US 20060157223A1 · Gelorme · 2006 [cited by examiner]
US 20080023665A1 · Weiser · 2008 [cited by examiner]
US 20080166492A1 · Lu · 2008 [cited by examiner]
US 20080191729A1 · Blanco et al. · 2008 [cited by applicant]
US 20110061848A1 · Chiou · 2011 [cited by examiner]
US 20130120939A1 · Voss · 2013 [cited by examiner]
US 20130134591A1 · Sakamoto · 2013 [cited by examiner]
US 20130224510A1 · Deng et al. · 2013 [cited by applicant]
US 20150077941A1 · Hosseini · 2015 [cited by examiner]
US 20180301392A1 · Stegmeier · 2018 [cited by examiner]
US 20190301814A1 · Lin et al. · 2019 [cited by applicant]
US 20200211920A1 · Lee · 2020 [cited by examiner]
US 20210233832A1 · Uppal · 2021 [cited by examiner]
US 20220020659A1 · Zheng · 2022 [cited by examiner]
CN 105914189A · 2016 [cited by examiner]
CN 106929733B · 2018 [cited by applicant]
CN 108511407A · 2018 [cited by examiner]
CN 112694858A · 2021 [cited by applicant]
EP 2883930A1 · 2015 [cited by applicant]
WO WO2015104954A1 · 2015 [cited by examiner]
“Thermal Management: Why Indium is the Best Choice” by Indium Corporation (Year: 2016). [cited by examiner]
International Search Report and Written Opinion mailed Sep. 12, 2022 for International Application No. PCT/US2022/029901, filed on May 18, 2022. [cited by applicant]
Non-final Office Action dated Aug. 23, 2024 for U.S. Appl. No. 17/747,923. [cited by applicant]
Cited By (1)
US 12,721,169