Granted Patent B2

US 12,504,320 · App. 18/186,039 · Granted Dec 23, 2025

Inventors: Behrad Habib Afshar (Stanford, CA); Michel J.F. Digonnet (Palo Alto, CA)

Assignee: THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY

G01H9/004G02B6/4214G02B6/423G02B6/424G02B6/4245

Abstract

Claims (35)

1 . An acoustic sensor comprising:

at least one optical waveguide configured to emit an optical beam;

a substantially planar first substrate optically coupled to the at least one optical waveguide, the first substrate configured to be illuminated by the optical beam and to reflect at least a portion of the optical beam to the at least one optical waveguide, the first substrate comprising:

a first substrate portion configured to reflect a first portion of the optical beam back to the at least one optical waveguide; and

a diaphragm configured to reflect, at an edge of the diaphragm, a second portion of the optical beam back to the at least one optical waveguide, the diaphragm responsive to a perturbation by moving relative to the first substrate portion, the optical beam centered on a region between the first substrate portion and the diaphragm; and

a substantially planar second substrate affixed to the first substrate and affixed to the at least one optical waveguide, the second substrate substantially parallel to the first substrate.

2 . The acoustic sensor of claim 1 , wherein the second substrate comprises a feedthrough hole extending through the second substrate and configured to receive the optical waveguide.

3 . The acoustic sensor of claim 2 , wherein the optical waveguide is fixed within the feedthrough hole such that an end of the optical waveguide is spaced from the first substrate and positioned such that the optical beam is emitted from the end of the optical waveguide and propagates substantially perpendicularly to the first substrate, and light reflected from the diaphragm and the first substrate portion propagates substantially perpendicularly to the first substrate back to the end of the optical waveguide.

4 . The acoustic sensor of claim 3 , wherein the first substrate comprises at least one alignment island and the second substrate comprises at least one alignment well, the at least one alignment island configured to fit within the at least one alignment well to fix relative positions of the diaphragm of the first substrate and the feedthrough hole of the second substrate.

5 . The acoustic sensor of claim 4 , wherein a perimeter of the at least one alignment island has a step edge such that the at least one alignment island has a height above a surface of a region of the first substrate substantially surrounding the at least one alignment island and a perimeter of the at least one alignment well has a depth below a surface of a region of the second substrate substantially surrounding the at least one alignment well, the height less than the depth.

6 . The acoustic sensor of claim 4 , wherein the at least one alignment island has a first width and the at least one alignment well has a second width, the first width less than the second width.

7 . The acoustic sensor of claim 4 , wherein the at least one alignment island comprises at least one alignment ledge extending from a perimeter of the at least one alignment island and the at least one alignment well comprises at least one alignment notch extending from a perimeter of the at least one alignment well.

8 . The acoustic sensor of claim 7 , wherein the at least one alignment island comprises a single alignment island having a single substantially rectangular alignment ledge extending substantially perpendicularly to the perimeter of the alignment island and the at least one alignment well comprises a single alignment well having four substantially rectangular alignment notches positioned equidistantly around the alignment well.

9 . The acoustic sensor of claim 1 , wherein the first substrate and the second substrate comprise complementary mating structures configured to facilitate alignment of the optical waveguide with an edge of the diaphragm.

10 . The acoustic sensor of claim 1 , wherein the second substrate further comprises one or more orifices configured to allow a fluid medium to flow out from a region between the first substrate and the second substrate.

11 . A method of fabricating an acoustic sensor, the method comprising:

fabricating a substantially planar first substrate comprising a first substrate portion and a diaphragm, the diaphragm configured to move relative to the first substrate portion in response to an acoustic perturbation;

fabricating a substantially planar second substrate, the second substrate comprising a feedthrough hole and a plurality of orifices configured to allow a fluid medium to flow out from a region between the first substrate and the second substrate during operation of the acoustic sensor;

aligning the first substrate and the second substrate to one another such that the feedthrough hole is aligned over a region between the first substrate portion and the diaphragm; and

affixing the first substrate and the second substrate to one another such that the second substrate is substantially parallel to the first substrate.

12 . The method of claim 11 , wherein said fabricating the substantially planar first substrate comprises thinning a device layer using thermal oxidation, using deep reactive ion etching to form the diaphragm, releasing the diaphragm, and coating the device layer with an adhesion layer and a reflective layer.

13 . The method of claim 11 , wherein said fabricating the substantially planar second substrate comprises using deep reactive ion etching to form a plurality of lines tracing perimeters of the plurality of orifices.

14 . The method of claim 13 , wherein said fabricating the substantially planar second substrate further comprises using deep reactive ion etching to form etch patterns configured to substantially reduce asymmetry in electric fields at a surface of the second substrate in proximity of the feedthrough hole that would otherwise occur during deep reactive ion etching to form the plurality of orifices.

15 . The method of claim 11 , wherein said aligning the first substrate and the second substrate to one another comprises:

placing the first and second substrates in a plurality of rotational orientation relative to one another;

substantially aligning a center of the feedthrough hole with an edge of the diaphragm while the first and second substrates are in each rotational orientation of the plurality of rotational orientations;

measuring an offset between the center of the feedthrough hole and the edge of the diaphragm while the first and second substrates are in each rotational orientation of the plurality of rotational orientations; and

comparing the offsets to one another and evaluating which of the rotational orientations has the least offset between the center of the feedthrough hole and the edge of the diaphragm.

16 . The method of claim 15 , wherein said affixing the first substrate and the second substrate to one another comprises:

substantially realigning the center of the feedthrough hole with the edge of the diaphragm while in the first substrate and the second substrate are in the rotational orientation having the least offset; and

bonding the first and second substrates to one another while in the first substrate and the second substrate are in the rotational orientation having the least offset.

17 . The method of claim 15 , wherein said aligning the first substrate and the second substrate to one another comprises using a flip-chip bonder.

18 . The method of claim 11 , further comprising inserting an end of an optical waveguide into the feedthrough hole and attaching the optical waveguide to the second substrate.

19 . The method of claim 18 , wherein said inserting comprises aligning the end of the optical waveguide to the center of the feedthrough hole and moving the end into the feedthrough hole to an operational distance from the first substrate.

20 . The method of claim 19 , further comprises determining a waveguide-diaphragm distance by measuring a free spectral range of weak interferometry between reflections at the end and reflections from the first substrate.

Assignments (1)

Continuity (2)

References Cited (283)