IP Library › Granted Patent US 12,512,415
Granted Patent B2
US 12,512,415 · App. 17/689,108 · Granted Dec 30, 2025

Semiconductor package with barrier layer

Inventor: Sanguk Kim (Cheonan-si, KR)
Assignee: Samsung Electronics Co., Ltd.
H01L23/5389H01L21/4853H01L21/4857H01L21/565H01L23/3128H01L23/5383H01L23/5386H01L24/16H01L24/19H01L24/20H01L25/105H01L2224/16265H01L2224/214H01L2225/1035H01L2225/1052H01L2225/1058
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Quick Facts
Patent No.
US 12,512,415
App. No.
17/689,108
Granted
Dec 30, 2025
Kind
B2
Abstract

A packaged integrated circuit device includes a frame having a cavity therein and an inner semiconductor chip within the cavity. A lower re-distribution layer is provided, which extends adjacent lower surfaces of the frame and the inner semiconductor chip. The lower re-distribution layer has an opening therein which at least partially exposes the lower surface of the inner semiconductor chip. A lower semiconductor chip is provided, which extends adjacent the lower surface of the inner semiconductor chip, and within the opening in the lower re-distribution layer. This lower re-distribution layer includes: (i) an insulating layer covering the lower surface of the frame, (ii) a re-distribution pattern disposed on the insulating layer, and (iii) a barrier layer, which is disposed on the insulating layer and surrounds at least a portion of the lower semiconductor chip.

Claims (46)

1 . A packaged integrated circuit device, comprising:

a first semiconductor chip;

a lower re-distribution layer extending adjacent lower surface of the first semiconductor chip, said lower re-distribution layer having an opening therein which at least partially exposes the lower surface of the first semiconductor chip;

and a second semiconductor chip adjacent the lower surface of the first semiconductor chip, and within the opening in the lower re-distribution layer, which comprises: (i) an insulating layer, (ii) a re-distribution pattern disposed on the insulating layer;

wherein an upper surface of the opening of the lower re-distribution layer comprises a stepped structure.

2 . The device of claim 1 , wherein the lower re-distribution comprises a barrier layer disposed on the insulating layer and surrounds at least a portion of the second semiconductor chip.

3 . The device of claim 2 , wherein the barrier layer has a generally quadrangular rim shape when viewed from a top plan view perspective.

4 . The device of claim 2 , wherein an upper surface of the opening of the lower re-distribution layer comprises first stepped surface, and

wherein the first stepped surface exposes partially an upper surface of the barrier layer.

5 . The device of claim 4 , wherein the upper surface of the opening of the lower re-distribution layer further comprises a second stepped surface at which an upper surface of the insulating layer is partially exposed.

6 . The device of claim 2 , wherein the barrier layer has an inclined side surface.

7 . The device of claim 2 , wherein an inner side surface of the insulating layer is inclined at an angle of about 60° to about 80°.

8 . The device of claim 1 , wherein the lower semiconductor chip comprises:

a body disposed on the lower surface of the first semiconductor chip;

a solder ball electrically connecting the body and the first semiconductor chip; and

a mold layer extending between the body and the lower re-distribution layer.

9 . The device of claim 8 , wherein the mold layer fills the opening and completely covers a side surface of the body while extending through the lower re-distribution layer.

10 . The device of claim 9 , wherein the mold layer exposes an upper surface of the second semiconductor chip.

11 . The device of claim 1 , further comprising:

an upper re-distribution layer disposed on the first semiconductor chip, the upper re-distribution layer comprising a re-distribution pattern and an insulating layer; and

a third semiconductor chip disposed on the upper re-distribution layer.

12 . The device of claim 11 , further comprising a through-silicon-via, which electrically connects the re-distribution pattern of the lower re-distribution layer and the re-distribution pattern of the upper re-distribution layer.

13 . A packaged semiconductor device, comprising:

a first semiconductor chip;

a lower re-distribution layer extending adjacent lower surface of the first semiconductor chip, said lower re-distribution layer comprising a first insulating layer covering at least a portion of the lower surface of the first semiconductor chip, a re-distribution pattern disposed on the first insulating layer, a second insulating layer disposed on the re-distribution pattern while partially exposing an upper surface of the first insulating layer; and

a second semiconductor chip adjacent the lower surface of the first semiconductor chip;

wherein the first insulating layer, the re-distribution pattern, and the second insulating layer of the lower re-distribution layer comprise a stepped structure.

14 . The device of claim 13 , wherein the stepped structure includes at least four stepped structures surrounding the second semiconductor chip.

15 . The device of claim 13 , wherein the second semiconductor chip comprises:

a body disposed on the lower surface of the first semiconductor chip;

a solder ball electrically connecting the body and the first semiconductor chip; and

a mold layer extending between the body and the lower re-distribution layer.

16 . The device of claim 15 , wherein an upper surface of the mold layer connects an edge of the lower re-distribution layer and an edge of the body of the second semiconductor chip.

17 . The device of claim 15 , wherein an upper surface of the mold layer has an inclination with respect to the lower surface of the first semiconductor chip.

18 . The device of claim 13 , wherein the lower re-distribution layer comprises a barrier layer between the first insulating layer and the second insulating layer,

wherein the second insulating layer exposes partially an upper surface of the barrier layer.

19 . The device of claim 18 , wherein the re-distribution pattern is electrically connected to the first semiconductor chip, and the barrier layer is electrically insulated from the first semiconductor chip.

20 . A packaged integrated circuit device, comprising:

a first semiconductor chip;

a lower re-distribution layer extending adjacent lower surface of the first semiconductor chip, said lower re-distribution layer having an opening therein which at least partially exposes the lower surface of the first semiconductor chip; and

a second semiconductor chip adjacent the lower surface of the first semiconductor chip, and within the opening in the lower re-distribution layer, which comprises: (i) an first insulating layer covering at least a portion of the lower surface of the first semiconductor chip, (ii) a re-distribution pattern disposed on the first the insulating layer; (iii) a second insulating layer disposed on the re-distribution pattern,

wherein the second semiconductor chip comprises:

a body disposed on the lower surface of the first semiconductor chip;

a solder ball electrically connecting the body and the first semiconductor chip, and

a mold layer interposed between the body and the lower re-distribution layer;

wherein an upper surface of the opening of the lower re-distribution layer comprises a stepped structure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 5, 2025
From: KIM, SANGUK
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 072170/0816 →
Priority Claims (1)
KR 10-2020-0007407 · Jan 20, 2020 · national
Continuity (2)
Continuation 16929956 · Jul 15, 2020
Related Publication 20220189881A1 · Jun 16, 2022
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