IP Library › Granted Patent US 12,514,016
Granted Patent B2
US 12,514,016 · App. 17/841,817 · Granted Dec 30, 2025

Photoelectric conversion device, photoelectric conversion system, moving body, and manufacturing method of photoelectric conversion device

Inventor: Kosei Uehira (Tokyo, JP)
Assignee: Canon Kabushiki Kaisha
H10F39/811H10F30/225H10F39/024H10F39/802H10F39/8057H10F39/8067
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Quick Facts
Patent No.
US 12,514,016
App. No.
17/841,817
Granted
Dec 30, 2025
Kind
B2
Abstract

A photoelectric conversion device having pixels lined up in a plurality of rows and a plurality of columns, the photoelectric conversion device including: a semiconductor layer which has a front surface and a rear surface and which includes an avalanche photodiode; a wiring layer arranged on a side of the front surface of the semiconductor layer; and a trench arranged in a boundary portion between two pixels, wherein the trench has at least any of a metal or a metal compound arranged therein and extends from inside of the semiconductor layer to inside of the wiring layer.

Claims (39)

1 . A photoelectric conversion device having pixels lined up in a plurality of rows and a plurality of columns, the photoelectric conversion device comprising:

a semiconductor layer which has a front surface and a rear surface and which includes an avalanche photodiode;

a wiring layer arranged on a side of the front surface of the semiconductor layer; and

a trench arranged in a boundary portion between two pixels,

wherein the trench has at least any of a metal or a metal compound arranged therein and extends from inside of the semiconductor layer to inside of the wiring layer,

the trench is connected to a wiring in the wiring layer which, of wiring in the wiring layer, is nearest to the semiconductor layer,

the wiring layer has a first wiring and a second wiring,

a distance from the semiconductor layer to the second wiring is longer than a distance from the semiconductor layer to the first wiring,

the first wiring is arranged so as to overlap with a semiconductor region constituting a cathode of the avalanche photodiode in a plan view, and

the trench extends to the second wiring.

2 . The photoelectric conversion device according to claim 1 , wherein the trench is arranged so as to surround each pixel in a plan view.

3 . The photoelectric conversion device according to claim 1 , wherein the trench is not arranged in a diagonal portion of each pixel.

4 . The photoelectric conversion device according to claim 1 , wherein the trench at least extends to the rear surface of the semiconductor layer.

5 . The photoelectric conversion device according to claim 1 , wherein the photoelectric conversion device has an optical layer on a side of the rear surface of the semiconductor layer, and

the trench extends to inside of the optical layer.

6 . The photoelectric conversion device according to claim 5 , wherein the optical layer has a reflective plate, and

the trench extends to the reflective plate.

7 . The photoelectric conversion device according to claim 5 , wherein the optical layer has a reflective plate,

a second light-shielding wall is arranged between the reflective plate and the semiconductor layer, and

the trench extends to the second light-shielding wall.

8 . A photoelectric conversion system, comprising:

the photoelectric conversion device according to claim 1 ; and

a signal processing device configured to generate an image using a signal output by the photoelectric conversion device.

9 . A moving body, comprising:

the photoelectric conversion device according to claim 1 ,

wherein the moving body comprises a control device configured to control movement of the moving body using a signal output by the photoelectric conversion device.

10 . A photoelectric conversion device having pixels lined up in a plurality of rows and a plurality of columns, the photoelectric conversion device comprising:

a semiconductor layer which has a front surface and a rear surface and which includes an avalanche photodiode;

a wiring layer arranged on a side of the front surface of the semiconductor layer; and

a trench arranged in a boundary portion between two pixels,

wherein the trench has at least any of a metal or a metal compound arranged therein and extends from inside of the semiconductor layer to inside of the wiring layer,

the trench is connected to a wiring in the wiring layer which, of wiring in the wiring layer, is nearest to the semiconductor layer,

the photoelectric conversion device has an optical layer on a side of the rear surface of the semiconductor layer, and

the trench extends to inside of the optical layer.

11 . The photoelectric conversion device according to claim 10 , wherein the optical layer has a reflective plate, and

the trench extends to the reflective plate.

12 . The photoelectric conversion device according to claim 10 , wherein the optical layer has a reflective plate,

a second light-shielding wall is arranged between the reflective plate and the semiconductor layer, and

the trench extends to the second light-shielding wall.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 29, 2022
From: UEHIRA, KOSEI
To: CANON KABUSHIKI KAISHA
Reel/Frame 060520/0661 →
Priority Claims (1)
JP 2021-103193 · Jun 22, 2021 · national
Continuity (1)
Related Publication 20220406835A1 · Dec 22, 2022
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