Substrate treating composition and method for fabricating a semiconductor device using the same
Provided is a substrate treating composition. The substrate treating composition includes a first monomer, a second monomer and an acid. The first monomer is represented by Formula 1 and the second monomer is represented by Formula 7. The molecular weight of the solid content of the substrate treating composition including the first monomer, the second monomer and the acid is from about 1,000 g/mol to about 50,000 g/mol. X—Si(R1) 2 (R2) [Formula 1] Y—Si(R3) 3 [Formula 7]
1 . A substrate treating composition, consisting essentially of a solid content and a solvent, the solid content consisting a first monomer, a second monomer, a dehydration-condensation product of the first monomer and the second monomer, and an acid, wherein
the first monomer is represented by Formula 1:
X—Si(R1) 2 (R2) [Formula 1]
wherein each of R1 and R2 is an alkyl group of 1 to 20 carbon atoms or an alkoxy group of 1 to 20 carbon atoms, and X is represented by Formula 2 or Formula 4:
the second monomer is represented by Formula 7:
Y—Si(R3) 3 [Formula 7]
wherein R3 is an alkoxy group of 1 to 20 carbon atoms, and Y is represented by Formula 8, Formula 9, Formula 10, Formula 11, Formula 12:
in which Ts is a p-toluenesulfonyl group,
in which Ms is a methanesulfonyl group,
in which Ms is a methanesulfonyl group,
wherein a molecular weight of the dehydration-condensation product of the first monomer and the second monomer is from 1,000 g/mol to 100,000 g/mol.
2 . The substrate treating composition of claim 1 , wherein X is bonded to a Si atom via a Si—C bond, and Y is bonded to a Si atom via a Si—C bond.
3 . The substrate treating composition of claim 1 , wherein the solvent comprises at least one of propylene glycol ethyl ether (PGEE), propylene glycol methyl ether acetate (PGMEA), propylene glycol methyl ether (PGME), or de-ionized water.
4 . The substrate treating composition of claim 3 , wherein the acid is a carboxylic acid.
5 . The substrate treating composition of claim 1 , wherein the first monomer is an organic silane represented by Formula 1-1 or Formula 1-3:
6 . The substrate treating composition of claim 1 , wherein the second monomer is an organic silane represented by Formula 7-1, Formula 7-2, Formula 7-3, Formula 7-4, or Formula 7-5:
in which Ts is a p-toluenesulfonyl group,
in which Ms is a methanesulfonyl group,
in which Ms is a methanesulfonyl group,
7 . The substrate treating composition of claim 1 , wherein a ratio of a content by wt % of the first monomer to a content by wt % of the solvent is 0.1:100.
8 . The substrate treating composition of claim 1 , wherein a ratio of a content by wt % of the second monomer to a content by wt % of a solution including the first monomer and the solvent is 0.0005:100.