Fill fins for semiconductor devices
An integrated circuit (IC) structure includes a first channel region, a first gate metal engaging the first channel region, a first dielectric material layer disposed under the first gate metal and on an end of the first gate metal, a second channel region, a second gate metal engaging the second channel region, a second dielectric material layer disposed under the second gate metal and on an end of the second gate metal, and a dielectric block disposed between the end of the first gate metal and the end of the second gate metal. A horizontal portion of the first dielectric material layer abuts a horizontal portion of the second dielectric material layer, and the horizontal portion of the first dielectric material layer and the horizontal portion of the second dielectric material layer are in physical contact with the dielectric block.
1 . An integrated circuit (IC) structure, comprising:
a first transistor, comprising:
a first channel region;
a first gate metal engaging the first channel region; and
a first portion of a dielectric material layer disposed under the first gate metal and on a sidewall of the first gate metal;
a second transistor, comprising:
a second channel region;
a second gate metal engaging the second channel region, wherein a longitudinal axis of the first gate metal is aligned with a longitudinal axis of the second gate metal; and
a second portion of the dielectric material layer disposed under the second gate metal and on a sidewall of the second gate metal,
wherein the sidewall of the first gate metal faces the sidewall of the second gate metal, and the first portion of the dielectric material layer and the second portion of the dielectric material layer are disposed between the sidewall of the first gate metal and the sidewall of the second gate metal; and
a dielectric block disposed between the sidewall of the first gate metal and the sidewall of the second gate metal,
wherein a third portion of the dielectric material layer connects the first portion of the dielectric material layer and the second portion of the dielectric material layer, and the third portion of the dielectric material layer is above and in contact with the dielectric block.
2 . The IC structure of claim 1 , wherein the dielectric block has a first sidewall surface facing the sidewall of the first gate metal, a second sidewall surface facing the sidewall of the second gate metal, and a horizontal surface extending from the first sidewall surface to the second sidewall surface, and wherein the third portion of the dielectric material layer is in physical contact with the horizontal surface of the dielectric block.
3 . The IC structure of claim 2 , wherein the horizontal surface is a top surface of the dielectric block.
4 . The IC structure of claim 2 , wherein the horizontal surface is in an opening of a top portion of the dielectric block.
5 . The IC structure of claim 4 , wherein the horizontal surface is below a top surface of the first channel region and a top surface of the second channel region.
6 . The IC structure of claim 1 , wherein the first dielectric material layer and the second dielectric material layer include a same material composition.
7 . The IC structure of claim 1 , wherein the first portion of the dielectric material layer includes a first oxide layer and a first high-k dielectric layer, and the second portion of the dielectric material layer includes a second oxide layer and a second high-k dielectric layer, and wherein the third portion of the dielectric material layer connects the first high-k dielectric layer and the second high-k dielectric layer.
8 . The IC structure of claim 7 , wherein the first oxide layer and the second oxide layer are separated by the dielectric block.
9 . The IC structure of claim 1 , wherein each of the first channel region and the second channel region has a fin-shape structure.
10 . The IC structure of claim 1 , further comprising: a metal feature connecting the first gate metal and the second gate metal.
11 . An integrated circuit (IC) structure, comprising:
a fin including a first semiconductor material;
a substrate below the fin, the substrate including a second semiconductor material;
an isolation feature over the substrate, the fin protruding from the isolation feature;
a metal gate disposed on sidewalls and a top surface of the fin, the metal gate including a first sidewall and a second sidewall opposing the first sidewall;
a first dielectric wall disposed on the first sidewall of the metal gate, a bottom portion of the first dielectric wall below a top surface of the isolation feature; and
a second dielectric wall disposed on the second sidewall of the metal gate, a bottom portion of the second dielectric wall below the top surface of the isolation feature, the first and second dielectric walls sandwiching the metal gate.
12 . The IC structure of claim 11 , wherein the bottom portion of the first dielectric wall is embedded in the isolation feature, and the bottom portion of the second dielectric wall is embedded in the isolation feature.
13 . The IC structure of claim 11 , wherein the first semiconductor material is different from the second semiconductor material.
14 . The IC structure of claim 11 , wherein top surfaces of the metal gate and the first and second dielectric walls are substantially coplanar.
15 . The IC structure of claim 11 , wherein a top portion of the second dielectric wall has a recess, wherein the metal gate extends directly above the recess.
16 . The IC structure of claim 11 , wherein a bottom surface of the first dielectric wall is below a bottom surface of the second dielectric wall.
17 . The IC structure of claim 11 , wherein the fin is a first fin and the metal gate is a first metal gate, the IC structure further comprising:
a second fin, the first and second fin sandwiching the first dielectric wall; and
a second metal gate disposed on sidewalls and a top surface of the second fin, the first dielectric wall isolating the first metal gate from the second metal gate.
18 . An integrated circuit (IC) structure, comprising:
a first fin extending lengthwise along a first direction;
a second fin extending lengthwise along the first direction;
a first gate structure engaging the first fin, the first gate structure extending lengthwise along a second direction perpendicular to the first direction;
a second gate structure engaging the second fin, the second gate structure extending lengthwise along the second direction;
a dielectric block disposed between the first and second fins and extending lengthwise along the first direction, wherein the dielectric block isolates the first gate structure from the second gate structure;
a third gate structure engaging the first fin, the third gate structure extending lengthwise along the second direction; and
a fourth gate structure engaging the second fin, the fourth gate structure extending lengthwise along the second direction,
wherein the third gate structure abuts the fourth gate structure at a location directly above the dielectric block.
19 . The IC structure of claim 18 , further comprising:
a substrate; and
an isolation feature over the substrate, wherein the first and second fins are protruding through the isolation feature, and a bottommost portion of the dielectric block is above the isolation feature.
20 . The IC structure of claim 18 , wherein the dielectric block has an uneven top surface.