IP Library › Granted Patent US 12,546,816
Granted Patent B2
US 12,546,816 · App. 18/483,850 · Granted Feb 10, 2026

Semiconductor device

Inventor: Mitsuhiko Igarashi (Tokyo, JP)
Assignee: RENESAS ELECTRONICS CORPORATION
G01R31/2874G01K7/42G06F11/3058
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Quick Facts
Patent No.
US 12,546,816
App. No.
18/483,850
Granted
Feb 10, 2026
Kind
B2
Abstract

A semiconductor device includes: a local sensor including a transistor, arranged in proximity to a measurement target region in a semiconductor chip, and outputs a leak current of the transistor as a sensor signal according to a temperature in the measurement target region; a conversion circuit arranged on the semiconductor chip, and converting the sensor signal from the local sensor into a digital count value; and a circuit block arranged between the local sensor and the conversion circuit in the semiconductor chip when viewed in a plan view.

Claims (43)

1 . A semiconductor device comprising:

a local sensor including a transistor, arranged in proximity to a measurement target region in a semiconductor chip, and outputs a leak current of the transistor as a sensor signal according to a temperature in the measurement target region;

a conversion circuit arranged on the semiconductor chip, and converting the sensor signal from the local sensor into a digital count value; and

a circuit block arranged between the local sensor and the conversion circuit in the semiconductor chip when viewed in a plan view,

wherein a global sensor that outputs a sensor signal corresponding to an average temperature of the semiconductor chip is arranged on and above the semiconductor chip, and the average temperature measured by the global sensor is outputted as a digital value.

2 . The semiconductor device according to claim 1 ,

wherein the measurement target region includes a first standard cell, and the circuit block is configured by a second standard cell.

3 . The semiconductor device according to claim 2 ,

wherein the first standard cell includes a plurality of cells, and the local sensor is embedded between the plurality of cells when viewed in a plan view.

4 . The semiconductor device according to claim 3 ,

wherein each of the first standard cell and the second standard cell includes a plurality of transistors.

5 . The semiconductor device according to claim 1 ,

wherein the local sensor includes a diode-connected transistor as the transistor, and the leak current is a leak current that flows between predetermined voltages via the diode-connected transistor.

6 . The semiconductor device according to claim 5 ,

wherein the diode-connected transistor is a P-channel or N-channel type transistor.

7 . The semiconductor device according to claim 1 ,

wherein the local sensor includes a plurality of local sensors arranged in mutually different regions on and above the semiconductor chip when viewed in a plan view.

8 . The semiconductor device according to claim 2 ,

wherein the first standard cell includes two cells whose boundaries are not physically separated, and a drain electrode for extracting the sensor signal is arranged between the two cells.

9 . The semiconductor device according to claim 2 ,

wherein the second standard cell includes a plurality of second standard cells operating according to a plurality of clock signals, and

wherein the first standard cell includes a plurality of first standard cells that generate the plurality of clock signals, and the local sensor is arranged in proximity to some of the plurality of first standard cells.

10 . A semiconductor device comprising:

a local sensor including a transistor, arranged in proximity to a measurement target region in a semiconductor chip, and outputs a leak current of the transistor as a sensor signal according to a temperature in the measurement target region;

a conversion circuit arranged on the semiconductor chip, and converting the sensor signal from the local sensor into a digital count value; and

a circuit block arranged between the local sensor and the conversion circuit in the semiconductor chip when viewed in a plan view,

wherein the measurement target region includes a first standard cell, and the circuit block is configured by a second standard cell, and

wherein the first standard cell includes a plurality of cells, and the local sensor is embedded between the plurality of cells when viewed in a plan view.

11 . The semiconductor device according to claim 10 , wherein each of the first standard cell and the second standard cell includes a plurality of transistors.

12 . The semiconductor device according to claim 10 , wherein the local sensor includes a diode-connected transistor as the transistor, and the leak current is a leak current that flows between predetermined voltages via the diode-connected transistor.

13 . The semiconductor device according to claim 12 , wherein the diode-connected transistor is a P-channel or N-channel type transistor.

14 . The semiconductor device according to claim 10 , wherein a global sensor that outputs a sensor signal corresponding to an average temperature of the semiconductor chip is arranged on and above the semiconductor chip, and the average temperature measured by the global sensor is outputted as a digital value.

15 . The semiconductor device according to claim 14 , wherein the local sensor includes a plurality of local sensors arranged in mutually different regions on and above the semiconductor chip when viewed in a plan view.

16 . The semiconductor device according to claim 10 , wherein the first standard cell includes two cells whose boundaries are not physically separated, and a drain electrode for extracting the sensor signal is arranged between the two cells.

17 . The semiconductor device according to claim 10 ,

wherein the second standard cell includes a plurality of second standard cells operating according to a plurality of clock signals, and

wherein the first standard cell includes a plurality of first standard cells that generate the plurality of clock signals, and the local sensor is arranged in proximity to some of the plurality of first standard cells.

18 . A semiconductor device comprising:

a local sensor including a transistor, arranged in proximity to a measurement target region in a semiconductor chip, and outputs a leak current of the transistor as a sensor signal according to a temperature in the measurement target region;

a conversion circuit arranged on the semiconductor chip, and converting the sensor signal from the local sensor into a digital count value; and

a circuit block arranged between the local sensor and the conversion circuit in the semiconductor chip when viewed in a plan view,

wherein the measurement target region includes a first standard cell, and the circuit block is configured by a second standard cell, and

wherein the first standard cell includes two cells whose boundaries are not physically separated, and a drain electrode for extracting the sensor signal is arranged between the two cells.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 17, 2023
From: IGARASHI, MITSUHIKO
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 065258/0080 →
Priority Claims (1)
JP 2022-183256 · Nov 16, 2022 · national
Continuity (1)
Related Publication 20240159598A1 · May 16, 2024
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