Plasma showerhead assembly and method of reducing defects
Plasma showerhead assemblies are disclosed comprising a conductive plate having a plurality of the conductive plate gas openings, a dielectric faceplate having a thickness and a plurality of dielectric faceplate gas openings extending through the dielectric faceplate thickness in fluid communication with the plurality of the conductive plate gas openings. A plurality of tri-lobed o-rings surrounding the conductive plate gas openings and the dielectric faceplate gas openings are configured to form a seal between the dielectric faceplate gas openings and the conductive plate gas openings from atmospheric pressure.
1 . A plasma showerhead assembly comprising:
a conductive plate including a first surface and a second surface opposite to the first surface defining a conductive plate thickness, a plurality of resonator openings extending through the conductive plate thickness, a plurality of gas channels formed inside the conductive plate, and a plurality of conductive plate gas openings extending from the second surface of the conductive plate in fluid communication with the plurality gas channels;
a dielectric faceplate comprising a first surface and a second surface opposite to the first surface defining a dielectric faceplate thickness, a plurality of dielectric resonators protruding from the first surface and arranged in a pattern and configured to mount through the plurality of resonator openings when assembled, each of the plurality of dielectric resonators having geometric center and an opening to receiving a microwave antenna; a plurality of dielectric faceplate gas openings extending through the dielectric faceplate thickness in fluid communication with the plurality of the conductive plate gas openings; and
a plurality of tri-lobed o-rings surrounding the conductive plate gas openings and the dielectric faceplate gas openings and configured to form a seal between the dielectric faceplate gas openings and the conductive plate gas openings from atmospheric pressure.
2 . The plasma showerhead assembly of claim 1 , wherein further comprising a conductive insert surrounding a portion of at least one of the tri-lobed o-rings.
3 . The plasma showerhead assembly of claim 2 , wherein the conductive insert comprises a jacket that surrounds a first lobe of the at least one of the tri-lobed o-rings, the jacket comprising a conductive material.
4 . The plasma showerhead assembly of claim 3 , wherein the conductive material is selected from the group consisting of aluminum, nickel, titanium, molybdenum, doped silicon and alloys comprising a combination of one or more aluminum, nickel, titanium, molybdenum, and doped silicon.
5 . The plasma showerhead assembly of claim 3 , wherein the conductive insert the jacket is semicircular.
6 . The plasma showerhead assembly of claim 5 , wherein the at least one of the tri-lobed o-rings comprise a second lobe and a third lobe that form the seal between the dielectric faceplate gas openings and the conductive plate gas openings from atmospheric pressure.
7 . The plasma showerhead assembly of claim 6 , wherein the first lobe extends laterally from the second lobe and the third lobe.
8 . The plasma showerhead assembly of claim 7 , wherein the first lobe, the second lobe and the third lobe are each circular in cross-section.
9 . The plasma showerhead assembly of claim 5 , wherein the conductive insert is configured to shield the first lobe from plasma exposure.
10 . The plasma showerhead assembly of claim 6 , wherein the conductive insert provides a shield to the second lobe and the third lobe and protects the at least one of the tri-lobed o-rings from microwave plasma damage.
11 . The plasma showerhead assembly of claim 5 , wherein the conductive insert comprises aluminum having less than 0.5% by weight impurities.
12 . The plasma showerhead assembly according to claim 11 , wherein the at least one tri-lobed o-ring comprises an elastomer that is free of fluorine.
13 . The plasma showerhead assembly according to claim 12 , wherein the elastomer comprises a silicone.
14 . A microwave plasma processing chamber comprising:
the plasma showerhead assembly of claim 2 ;
a substrate processing region; and
a microwave plasma power supply configured to generate a microwave plasma that is delivered through the plasma showerhead assembly.
15 . A method of processing a substrate in the microwave plasma processing chamber of claim 14 , the method comprising:
generating a microwave plasma and delivering the microwave plasma through the plasma showerhead assembly; and
attenuating the microwave plasma with the conductive insert having a length disposed within at least one of the plurality of dielectric faceplate gas openings.
16 . A method of reducing defects in a microwave plasma processing chamber of claim 15 , the method comprising inserting conductive insert having a length disposed within at least one of the plurality of dielectric faceplate gas openings.