Display device and method of fabricating the same
A display device includes: a display panel having a display area and a non-display area; and a viewing angle control layer in the display area. The viewing angle control layer includes a plurality of viewing angle control patterns spaced apart from one another, and each of the viewing angle control patterns includes a transparent insulating pattern and a multi-layer sidewall on a side surface of the transparent insulating pattern. The multi-layer sidewall includes a first metal nitride layer, a second metal nitride layer, and a metal layer between the first metal nitride layer and the second metal nitride layer, and the first metal nitride layer, the second metal nitride layer, and the metal layer each includes Al or Ti.
1 . A display device comprising:
a display panel having a display area and a non-display area; and
a viewing angle control layer in the display area, the viewing angle control layer comprising a plurality of viewing angle control patterns spaced apart from one another, each of the viewing angle control patterns comprising a transparent insulating pattern and a multi-layer sidewall on a side surface of the transparent insulating pattern,
wherein the multi-layer sidewall comprises a first metal nitride layer, a second metal nitride layer, and a metal layer between the first metal nitride layer and the second metal nitride layer, and
wherein the first metal nitride layer, the second metal nitride layer, and the metal layer each comprises Al or Ti.
2 . The display device of claim 1 , wherein the first metal nitride layer, the second metal nitride layer, and the metal layer comprise a same metal.
3 . The display device of claim 1 , wherein the multi-layer sidewall further comprises a metal oxide layer.
4 . The display device of claim 3 , wherein the first metal nitride layer, the metal layer, the second metal nitride layer, and the metal oxide layer are sequentially stacked on the transparent insulating pattern.
5 . The display device of claim 1 , wherein a height of the viewing angle control patterns has a same ratio as a distance from a central axis of a first one of the viewing angle control patterns to a center axis of an adjacent second one of the viewing angle control patterns.
6 . The display device of claim 1 , wherein a thickness of the first metal nitride layer is equal to a thickness of the second metal nitride layer, and
wherein a thickness of the metal layer is greater than the thickness of the first metal nitride layer.
7 . The display device of claim 6 , wherein the multi-layer sidewall further comprises a metal oxide layer, and
wherein the metal oxide layer is thinner than the first metal nitride layer.
8 . The display device of claim 1 , wherein the transparent insulating pattern has a cross-sectional shape of an isosceles trapezoid having a longer base side, and
wherein base angles of the isosceles trapezoid are in a range from 60 degrees to 89.5 degrees.
9 . The display device of claim 1 , wherein the display panel comprises:
a substrate;
an emission material layer on the substrate and comprising a pixel a pixel-defining layer defining the pixel, the pixel comprising a pixel electrode, an emissive layer, and a common electrode; and
a thin-film encapsulation layer on the emission material layer, and
wherein the viewing angle control layer is on the thin-film encapsulation layer.
10 . The display device of claim 9 , wherein a ratio of a width of the viewing angle control patterns to a width of the emissive layer in a range from 1:3 to 1:4.
11 . The display device of claim 10 , further comprising a touch sensing layer between the thin-film encapsulation layer and the viewing angle control layer.
12 . The display device of claim 11 , wherein the touch sensing layer comprises a touch electrode, and
wherein at least a part of the viewing angle control pattern overlaps with the touch electrode.
13 . The display device of claim 10 , further comprising a touch sensing layer on the viewing angle control layer.
14 . A display device comprising:
a display panel having a display area and a non-display area; and
a viewing angle control layer comprising a plurality of viewing angle control patterns spaced apart from one another in the display area,
wherein each of the viewing angle control patterns comprises a transparent insulating pattern and a multi-layered sidewall on a side surface of the transparent insulating pattern,
wherein the multi-layer sidewall comprises a first metal nitride layer, a second metal nitride layer, and a metal layer between the first metal nitride layer and the second metal nitride layer, and
wherein the first metal nitride layer, the metal layer, and the second metal nitride layer are either AlN, Al, AlN, respectively, or TiN, Ti, TiN, respectively.
15 . The display device of claim 14 , wherein the multi-layer sidewall further comprises a metal oxide layer formed of Al 2 O 3 or Ti 2 O 3 .
16 . The display device of claim 15 , wherein a height of the viewing angle control patterns is has a same ratio as a distance from a central axis of a first one of the viewing angle control patterns to a center axis of an adjacent second one of the viewing angle control patterns.
17 . The display device of claim 15 , wherein the display panel further comprises a plurality of pixels in the display area,
wherein the each of the pixel comprises a pixel electrode, an emissive layer, and a common electrode, and
wherein a ratio of a width of the pixels to a width of the viewing angle control patterns is in a range from 1:3 to 1:4.
18 . A method of fabricating a display device, the method comprising:
forming a plurality of transparent insulating layer patterns spaced apart from one another at a uniform distance on a display panel;
forming a light-absorbing layer by sequentially stacking a first metal nitride layer, a metal layer, and a second metal nitride layer on the display panel and covering the plurality of transparent insulating layer patterns, the first metal nitride layer, the second metal nitride layer, and the metal layer each comprise Al or Ti; and
etching the light-absorbing layer on upper surfaces of the plurality of transparent insulating layer patterns and between adjacent ones of the plurality of transparent insulating layer patterns by anisotropic etching.
19 . The method of claim 18 , wherein the forming of the light-absorbing layer comprises stacking a metal oxide layer on the second metal nitride layer.
20 . The method of claim 19 , wherein the first metal nitride layer, the metal layer, and the second metal nitride layer are AlN, Al, and AlN, respectively, or TiN, Ti, and TiN, respectively.
21 . The method of claim 20 , wherein the metal oxide layer is Al 2 O 3 or Ti 2 O 3 .