IP Library Granted Patent US 12,622,265
Granted Patent B2
US 12,622,265 · App. 18/446,076 · Granted May 5, 2026

Stacked semiconductor device including a cooling structure

Inventor: Jen-Yuan Chang (Hsinchu, TW)
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
H01L23/36H01L21/50H01L23/5384H01L24/80H01L25/0657
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Quick Facts
Patent No.
US 12,622,265
App. No.
18/446,076
Granted
May 5, 2026
Kind
B2
Abstract

A stacked semiconductor device includes a cooling structure to increase the cooling efficiency of the stacked semiconductor device. The cooling structure includes various types of cooling components integrated into the stacked semiconductor device that are configured to remove and/or dissipate heat from dies of the stacked semiconductor device. In this way, the cooling structure reduces device failures and permits the stacked semiconductor device to operate at greater voltages, greater speeds, and/or other increased performance parameters by removing and/or dissipating heat from the stacked semiconductor device.

Claims (73)

1 . A stacked semiconductor device, comprising:

a first die;

a second die bonded with the first die at a bonding layer;

a first dielectric layer around side surfaces of the first die;

a second dielectric layer around side surfaces of the second die; and

a cooling structure including:

a plurality of heat removal structures configured to remove heat from at least one of the first die or the second die; and

a plurality of vertical heat dissipation structures configured to dissipate the heat,

wherein a first vertical heat dissipation structure of the plurality of vertical heat dissipation structures is formed in the first dielectric layer,

wherein second multiple vertical heat dissipation structures, of the plurality of vertical heat dissipation structures, are formed in the second dielectric layer,

wherein at least one horizontal heat removal structure, of the plurality of heat removal structures, is formed in the bonding layer and above a portion of the first die, and

wherein the at least one horizontal heat removal structure is physically connected to the first vertical heat dissipation structure and the second multiple vertical heat dissipation structures.

2 . The stacked semiconductor device of claim 1 , wherein at least one of a heat removal structure of the plurality of heat removal structures or a vertical heat dissipation structure of the plurality of vertical heat dissipation structures is surrounded by:

a guard ring, and

an intermetal dielectric buffer ring.

3 . The stacked semiconductor device of claim 1 , wherein at least one of a heat removal structure of the plurality of heat removal structures or a vertical heat dissipation structure of the plurality of vertical heat dissipation structures includes:

a round structure, or

a polygon structure.

4 . The stacked semiconductor device of claim 1 , wherein the plurality of heat removal structures extend in a first plane of the stacked semiconductor device; and

wherein the plurality of vertical heat dissipation structures extend in a second plane, of the stacked semiconductor device, that is approximately perpendicular to the first plane.

5 . The stacked semiconductor device of claim 1 , wherein one or more of the plurality of vertical heat dissipation structures include a hollow structure that is configured to dissipate the heat through convection.

6 . The stacked semiconductor device of claim 1 , further comprising:

an inter-die cooling structure that extends through the first die and the second die,

wherein the inter-die cooling structure is connected to one or more of the plurality of heat removal structures.

7 . The stacked semiconductor device of claim 1 , wherein the first die and the second die are connected by a through substrate via (TSV).

8 . The stacked semiconductor device of claim 1 , wherein at least one of a heat removal structure of the plurality of heat removal structures or a vertical heat dissipation structure of the plurality of vertical heat dissipation structures includes a plurality of fins.

9 . A stacked semiconductor device, comprising:

a first die;

a second die bonded with the first die at a bonding layer;

a first dielectric layer around side surfaces of the first die;

a second dielectric layer around side surfaces of the second die; and

a thermoelectric cooling structure, that extends into at least a portion of the first die and into at least a portion of the second die, comprising:

a cold side, included in the first die, configured to cool the first die,

a hot side, included in the second die, configured to receive heat from the cold side,

an n-type semiconductor structure that thermally connects the cold side included in the first die and the hot side included in the second die,

a p-type semiconductor structure that thermally connects the cold side, included in the first die, and the hot side included in the second die,

a first vertical heat dissipation structure formed in the first dielectric layer,

a second plurality of vertical heat dissipation structures formed in the second dielectric layer, and

a horizontal heat removal structure formed in the bonding layer and below a portion of the first die,

wherein the horizontal heat removal structure is physically connected to the first vertical heat dissipation structure and the second plurality of vertical heat dissipation structures.

10 . The stacked semiconductor device of claim 9 , wherein the n-type semiconductor structure extends through a substrate of the second die; and

wherein the p-type semiconductor structure extends through the substrate of the second die.

11 . The stacked semiconductor device of claim 9 , wherein the n-type semiconductor structure and the p-type semiconductor structure are thermally connected to the cold side included in the first die and the hot side included in the second die in parallel; and

wherein the n-type semiconductor structure and the p-type semiconductor structure are configured to be electrically connected to an electrical source in series.

12 . The stacked semiconductor device of claim 9 , wherein the n-type semiconductor structure is a first n-type semiconductor structure that extends through a substrate of the first die;

wherein the p-type semiconductor structure is a first p-type semiconductor structure that extends through the substrate of the first die; and

wherein the stacked semiconductor device further comprises:

a second n-type semiconductor structure that extends through a substrate of the second die; and

a second p-type semiconductor structure that extends through the substrate of the second die,

wherein the second n-type semiconductor structure and the second p-type semiconductor structure thermally connect the cold side included in the first die and the hot side included in the second die.

13 . The stacked semiconductor device of claim 9 , wherein the hot side included in the second die comprises:

a plurality of heat removal structures configured to remove heat from at least one of the first die or the second die; and

a plurality of heat dissipation structures configured to dissipate heat.

14 . The stacked semiconductor device of claim 13 , wherein the plurality of heat dissipation structures comprise one or more vertical heat dissipation structures.

15 . A stacked semiconductor device, comprising:

a first die;

a second die bonded with the first die at a bonding layer;

a first dielectric layer around side surfaces of the first die;

a second dielectric layer around side surfaces of the second die; and

a cooling structure including:

an inter-die cooling structure formed in and through the first die and the second die,

wherein the inter-die cooling structure is configured to remove heat from the first die and the second die;

a plurality of heat removal structures configured to remove heat from at least one of the first die or the second die; and

a plurality of heat dissipation structures configured to remove heat from at least one of the first die or the second die,

wherein a first heat dissipation structure of the plurality of heat dissipation structures is formed in the first dielectric layer,

wherein second multiple heat dissipation structures, of the plurality of heat dissipation structures, are formed in the second dielectric layer,

wherein at least one horizontal heat removal structure, of the plurality of heat removal structures, is formed in the bonding layer and above a portion of the first die, and

wherein the at least one horizontal heat removal structure is physically connected to the first heat dissipation structure and the second multiple heat dissipation structures.

16 . The stacked semiconductor device of claim 15 , wherein the inter-die cooling structure is connected to one or more heat removal structures of the plurality of heat removal structures.

17 . The stacked semiconductor device of claim 15 , further comprising another inter-die cooling structure.

18 . The stacked semiconductor device of claim 15 , wherein the plurality of heat removal structures are arranged horizontally in the stacked semiconductor device.

19 . The stacked semiconductor device of claim 15 , wherein the plurality of heat dissipation structures are arranged perpendicular to the plurality of heat removal structures.

20 . The stacked semiconductor device of claim 15 , wherein third multiple heat dissipation structures, of the plurality of heat dissipation structures, are formed above the second die.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 8, 2023
From: CHANG, JEN-YUAN
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 064524/0966 →
Continuity (3)
Division 17304983 · Jun 29, 2021
Provisional Application 63201300 · Apr 22, 2021
Related Publication 20230386957A1 · Nov 30, 2023
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