Granted Patent B2

US 12,631,973 · App. 17/591,891 · Granted May 19, 2026

Inventor: Yen-Liang Chen (Zhubei, TW)

Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

G03F7/70633G01B11/272G03F7/70683G03F9/7076G03F9/7073

Abstract

Claims (77)

1 . An overlay error measurement structure, comprising:

a lower-layer pattern disposed over a substrate and an upper-layer pattern disposed over the lower-layer pattern, wherein:

the lower-layer pattern comprises a first plurality of first sub-patterns extending a first length in a first direction and being arranged in an extent having a second length in a second direction crossing the first direction in a first portion of the lower-layer pattern,

the upper-layer pattern comprises a second plurality of second sub-patterns extending a third length in the first direction and being arranged in an extent having a fourth length in the second direction in a first portion of the upper-layer pattern,

at least one pattern of the second plurality of second sub-patterns overlaps at least one pattern of the first plurality of first sub-patterns in plan view,

within at least one of at least a part of the first plurality of first sub-patterns and at least a part of the second plurality of second sub-patterns, the first sub-patterns comprise three or more first primary patterns arranged along the first direction and having variable lengths along the first direction and having variable distances in the first direction between consecutive first primary patterns, and the second sub-patterns comprise three or more second primary patterns arranged along the first direction and having variable lengths along the first direction and having variable distances in the first direction between consecutive second primary patterns, and

the three or more first primary patterns include a plurality of first single-line patterns arranged along the first direction, a plurality of first double-line patterns arranged along the first direction, and a plurality of first broken-line patterns arranged along the first direction and between the plurality of first single-line patterns and the plurality of first double-line patterns along the second direction, and the three or more second primary patterns include a plurality of second single-line patterns arranged along the second direction, a plurality of second double-line patterns arranged along the second direction, and a plurality of second broken-line patterns arranged along the second direction and between the plurality of second single-line patterns and the plurality of second double-line patterns along the first direction.

2 . The overlay error measurement structure of claim 1 , wherein:

the lower-layer pattern further comprises a third plurality of third sub-patterns having substantially the second length extending in the second direction and being arranged in an extent substantially having the first length in the first direction in a second portion of the lower-layer pattern adjacent to the first portion of the lower-layer pattern,

the upper-layer pattern further comprises a fourth plurality of fourth sub-patterns having substantially the fourth length extending in the second direction and being arranged in an extent having substantially the third length in the first direction in a second portion of the upper-layer pattern adjacent to the first portion of the upper-layer pattern,

at least one pattern of the fourth plurality of fourth sub-patterns overlaps at least one pattern of the third plurality of third sub-patterns in plan view, and

within at least one of at least a part of the third plurality of third sub-patterns and at least a part of the fourth plurality of fourth sub-patterns, the third sub-patterns comprise three or more third primary patterns arranged along the second direction and having variable lengths along the second direction and having variable distances in the second direction between consecutive third primary patterns, and the fourth sub-patterns comprise three or more fourth primary patterns arranged along the second direction and having variable lengths along the second direction and having variable distances in the second direction between consecutive fourth primary patterns.

3 . The overlay error measurement structure of claim 2 , wherein:

the lower-layer pattern further comprises:

a fifth plurality of fifth sub-patterns extending in the first direction and being arranged in the second direction in a third portion of the lower-layer pattern adjacent to the first and second portions of the lower-layer pattern, wherein each fifth sub-pattern comprises a pair of parallel fifth primary patterns having variable widths and having variable distances in the second direction between each two fifth primary patterns of the pair of parallel fifth primary patterns, and

a seventh plurality of seventh sub-patterns extending in the second direction and being arranged in the first direction in a fourth portion of the lower-layer pattern adjacent to the first, second, and third portions of the lower-layer pattern, wherein each seventh sub-pattern comprises a pair of parallel seventh primary patterns having variable widths and having variable distances in the first direction between each two seventh primary patterns of the pair of parallel seventh primary patterns, and wherein the upper-layer pattern further comprises:

a sixth plurality of sixth sub-patterns extending in the first direction and being arranged in the second direction in a third portion of the upper-layer pattern adjacent to the first and second portions of the upper-layer pattern, wherein each sixth sub-pattern comprises a pair of parallel sixth primary patterns having variable widths and having variable distances in the second direction between each two sixth primary patterns of the pair of parallel sixth primary patterns, and

an eighth plurality of eighth sub-patterns extending in the second direction and being arranged in the first direction in a fourth portion of the upper-layer pattern adjacent to the first, second, and third portions of the upper-layer pattern, wherein each eighth sub-pattern comprises a pair of parallel eighth primary patterns having variable widths and having variable distances in the first direction between each two eighth primary patterns of the pair of parallel eighth primary patterns.

4 . The overlay error measurement structure of claim 3 , wherein:

the fifth plurality of fifth sub-patterns include line-and-space patterns, and

the sixth plurality of sixth sub-patterns include line-and-space patterns, and a line width of line patterns of the line-and-space patterns of the sixth plurality of sixth sub-patterns varies along the second direction.

5 . The overlay error measurement structure of claim 3 , wherein:

at least one of the fifth plurality of fifth sub-patterns and the seventh plurality of seventh sub-patterns include line-and-space patterns, the line-and-space patterns are arranged along the second direction for the fifth plurality of fifth sub-patterns, and are arranged along the first direction for the seventh plurality of seventh sub-patterns.

6 . The overlay error measurement structure of claim 1 , wherein:

a pattern pitch of the second plurality of second sub-patterns varies along the second direction, and at least a part of the second plurality of second sub-patterns has a different pattern pitch in the second direction than a pattern pitch of the first plurality of first sub-patterns in the second direction.

7 . The overlay error measurement structure of claim 1 , wherein:

a pattern pitch of the second plurality of second sub-patterns along the second direction is constant, and

a pattern pitch of the first plurality of first sub-patterns varies along the second direction, and at least a part of the first plurality of first sub-patterns has a different pattern pitch, along the second direction, than the second plurality of second sub-patterns.

8 . The overlay error measurement structure of claim 1 , wherein a pattern length along the first direction within at least one of at least a part of the first plurality of first sub-patterns and at least a part of the second plurality of second sub-patterns is a constant.

9 . An overlay error measurement structure, comprising:

a lower-layer pattern disposed over a substrate and an upper-layer pattern disposed over the lower-layer pattern, wherein:

the lower-layer pattern comprises a first plurality of first sub-patterns extending a first length in a first direction and being arranged in an extent having a second length in a second direction crossing the first direction in a first portion of the lower-layer pattern,

the upper-layer pattern comprises a second plurality of second sub-patterns extending a third length in the first direction and being arranged in an extent having a fourth length in the second direction in a first portion of the upper-layer pattern,

within at least one of at least a part of the first plurality of first sub-patterns and at least a part of the second plurality of second sub-patterns, the first sub-patterns comprise three or more first primary patterns arranged along the first direction and having variable lengths along the first direction and having variable distances in the first direction between consecutive first primary patterns, and the second sub-patterns comprise three or more second primary patterns arranged along the first direction and having variable lengths along the first direction and having variable distances in the first direction between consecutive second primary patterns,

the three or more first primary patterns include a plurality of first single-line patterns arranged along the first direction, a plurality of first double-line patterns arranged along the first direction, and a plurality of first broken-line patterns arranged along the first direction and between the plurality of first single-line patterns and the plurality of first double-line patterns along the second direction, and the three or more second primary patterns include a plurality of second single-line patterns arranged along the second direction, a plurality of second double-line patterns arranged along the second direction, and a plurality of second broken-line patterns arranged along the second direction and between the plurality of second single-line patterns and the plurality of second double-line patterns along the first direction, and

a pattern pitch of the second plurality of second sub-patterns varies along the second direction, and at least a part of the second plurality of second sub-patterns has a different pattern pitch in the second direction than a pattern pitch of the first plurality of first sub-patterns in the second direction.

10 . The overlay error measurement structure of claim 9 , wherein:

the lower-layer pattern further comprises a third plurality of third sub-patterns having substantially the second length extending in the second direction and being arranged in an extent substantially having the first length in the first direction in a second portion of the lower-layer pattern adjacent to the first portion of the lower-layer pattern,

the upper-layer pattern further comprises a fourth plurality of fourth sub-patterns having substantially the fourth length extending in the second direction and being arranged in an extent having substantially the third length in the first direction in a second portion of the upper-layer pattern adjacent to the first portion of the upper-layer pattern,

at least one pattern of the fourth plurality of fourth sub-patterns overlaps at least one pattern of the third plurality of third sub-patterns in plan view, and

within at least one of at least a part of the third plurality of third sub-patterns and at least a part of the fourth plurality of fourth sub-patterns, the third sub-patterns comprise three or more third primary patterns arranged along the second direction and having variable lengths along the second direction and having variable distances in the second direction between consecutive third primary patterns, and the fourth sub-patterns comprise three or more fourth primary patterns arranged along the second direction and having variable lengths along the second direction and having variable distances in the second direction between consecutive fourth primary patterns.

11 . The overlay error measurement structure of claim 10 , wherein:

the lower-layer pattern further comprises:

a fifth plurality of fifth sub-patterns extending in the first direction and being arranged in the second direction in a third portion of the lower-layer pattern adjacent to the first and second portions of the lower-layer pattern, wherein each fifth sub-pattern comprises a pair of parallel fifth primary patterns having variable widths and having variable distances in the second direction between each two fifth primary patterns of the pair of parallel fifth primary patterns, and

a seventh plurality of seventh sub-patterns extending in the second direction and being arranged in the first direction in a fourth portion of the lower-layer pattern adjacent to the first, second, and third portions of the lower-layer pattern, wherein each seventh sub-pattern comprises a pair of parallel seventh primary patterns having variable widths and having variable distances in the first direction between each two seventh primary patterns of the pair of parallel seventh primary patterns, and wherein the upper-layer pattern further comprises:

a sixth plurality of sixth sub-patterns extending in the first direction and being arranged in the second direction in a third portion of the upper-layer pattern adjacent to the first and second portions of the upper-layer pattern, wherein each sixth sub-pattern comprises a pair of parallel sixth primary patterns having variable widths and having variable distances in the second direction between each two sixth primary patterns of the pair of parallel sixth primary patterns, and

an eighth plurality of eighth sub-patterns extending in the second direction and being arranged in the first direction in a fourth portion of the upper-layer pattern adjacent to the first, second, and third portions of the upper-layer pattern, wherein each eighth sub-pattern comprises a pair of parallel eighth primary patterns having variable widths and having variable distances in the first direction between each two eighth primary patterns of the pair of parallel eighth primary patterns.

12 . The overlay error measurement structure of claim 11 , wherein:

the fifth plurality of fifth sub-patterns include line-and-space patterns, and

the sixth plurality of sixth sub-patterns include line-and-space patterns, and a line width of line patterns of the line-and-space patterns of the sixth plurality of sixth sub-patterns varies along the second direction.

13 . The overlay error measurement structure of claim 11 , wherein:

at least one of the fifth plurality of fifth sub-patterns and the seventh plurality of seventh sub-patterns include line-and-space patterns, the line-and-space patterns are arranged along the second direction for the fifth plurality of fifth sub-patterns, and are arranged along the first direction for the seventh plurality of seventh sub-patterns.

14 . The overlay error measurement structure of claim 9 , wherein a pattern length along the first direction within at least one of at least a part of the first plurality of first sub-patterns and at least a part of the second plurality of second sub-patterns is a constant.

15 . An overlay error measurement structure, comprising:

a lower-layer pattern disposed over a substrate and an upper-layer pattern disposed over the lower-layer pattern, wherein:

the lower-layer pattern comprises a first plurality of first sub-patterns extending a first length in a first direction and being arranged in an extent having a second length in a second direction crossing the first direction in a first portion of the lower-layer pattern,

the upper-layer pattern comprises a second plurality of second sub-patterns extending a third length in the first direction and being arranged in an extent having a fourth length in the second direction in a first portion of the upper-layer pattern,

within at least one of at least a part of the first plurality of first sub-patterns and at least a part of the second plurality of second sub-patterns, the first sub-patterns comprise three or more first primary patterns arranged along the first direction and having variable lengths along the first direction and having variable distances in the first direction between consecutive first primary patterns, and the second sub-patterns comprise three or more second primary patterns arranged along the first direction and having variable lengths along the first direction and having variable distances in the first direction between consecutive second primary patterns, and

the three or more first primary patterns include a plurality of first single-line patterns arranged along the first direction, a plurality of first double-line patterns arranged along the first direction, and a plurality of first broken-line patterns arranged along the first direction and between the plurality of first single-line patterns and the plurality of first double-line patterns along the second direction, and the three or more second primary patterns include a plurality of second single-line patterns arranged along the second direction, a plurality of second double-line patterns arranged along the second direction, and a plurality of second double-line patterns arranged along the second direction and between the plurality of second single-line patterns and the plurality of second broken-line patterns along the second direction.

16 . The overlay error measurement structure of claim 15 , wherein:

the lower-layer pattern further comprises a third plurality of third sub-patterns having substantially the second length extending in the second direction and being arranged in an extent substantially having the first length in the first direction in a second portion of the lower-layer pattern adjacent to the first portion of the lower-layer pattern,

the upper-layer pattern further comprises a fourth plurality of fourth sub-patterns having substantially the fourth length extending in the second direction and being arranged in an extent having substantially the third length in the first direction in a second portion of the upper-layer pattern adjacent to the first portion of the upper-layer pattern,

at least one pattern of the fourth plurality of fourth sub-patterns overlaps at least one pattern of the third plurality of third sub-patterns in plan view, and

within at least one of at least a part of the third plurality of third sub-patterns and at least a part of the fourth plurality of fourth sub-patterns, the third sub-patterns comprise three or more third primary patterns arranged along the second direction and having variable lengths along the second direction and having variable distances in the second direction between consecutive third primary patterns, and the fourth sub-patterns comprise three or more fourth primary patterns arranged along the second direction and having variable lengths along the second direction and having variable distances in the second direction between consecutive fourth primary patterns.

17 . The overlay error measurement structure of claim 16 , wherein:

the lower-layer pattern further comprises:

a fifth plurality of fifth sub-patterns extending in the first direction and being arranged in the second direction in a third portion of the lower-layer pattern adjacent to the first and second portions of the lower-layer pattern, wherein each fifth sub-pattern comprises a pair of parallel fifth primary patterns having variable widths and having variable distances in the second direction between each two fifth primary patterns of the pair of parallel fifth primary patterns, and

a seventh plurality of seventh sub-patterns extending in the second direction and being arranged in the first direction in a fourth portion of the lower-layer pattern adjacent to the first, second, and third portions of the lower-layer pattern, wherein each seventh sub-pattern comprises a pair of parallel seventh primary patterns having variable widths and having variable distances in the first direction between each two seventh primary patterns of the pair of parallel seventh primary patterns, and wherein the upper-layer pattern further comprises:

a sixth plurality of sixth sub-patterns extending in the first direction and being arranged in the second direction in a third portion of the upper-layer pattern adjacent to the first and second portions of the upper-layer pattern, wherein each sixth sub-pattern comprises a pair of parallel sixth primary patterns having variable widths and having variable distances in the second direction between each two sixth primary patterns of the pair of parallel sixth primary patterns, and

an eighth plurality of eighth sub-patterns extending in the second direction and being arranged in the first direction in a fourth portion of the upper-layer pattern adjacent to the first, second, and third portions of the upper-layer pattern, wherein each eighth sub-pattern comprises a pair of parallel eighth primary patterns having variable widths and having variable distances in the first direction between each two eighth primary patterns of the pair of parallel eighth primary patterns.

18 . The overlay error measurement structure of claim 17 , wherein:

the fifth plurality of fifth sub-patterns include line-and-space patterns, and

the sixth plurality of sixth sub-patterns include line-and-space patterns, and a line width of line patterns of the line-and-space patterns of the sixth plurality of sixth sub-patterns varies along the second direction.

19 . The overlay error measurement structure of claim 17 , wherein:

at least one of the fifth plurality of fifth sub-patterns and the seventh plurality of seventh sub-patterns include line-and-space patterns, the line-and-space patterns are arranged along the second direction for the fifth plurality of fifth sub-patterns, and are arranged along the first direction for the seventh plurality of seventh sub-patterns.

20 . The overlay error measurement structure of claim 15 , wherein:

a pattern pitch of the second plurality of second sub-patterns varies along the second direction, and at least a part of the second plurality of second sub-patterns has a different pattern pitch in the second direction than a pattern pitch of the first plurality of first sub-patterns in the second direction.

Assignments (1)

Continuity (3)

References Cited (34)