IP Library › Granted Patent US 12,643,812
Granted Patent B2
US 12,643,812 · App. 18/013,201 · Granted Jun 2, 2026

Method for producing fluorine-containing silica glass

Inventors: Shinji Ishikawa (Osaka, JP); Tetsuya Haruna (Osaka, JP); Keisei Morita (Osaka, JP); Tatsuro Hasegawa (Osaka, JP); Seiji Arakawa (Osaka, JP)
Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
C03B37/01453C03B2201/12
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Quick Facts
Patent No.
US 12,643,812
App. No.
18/013,201
Granted
Jun 2, 2026
Kind
B2
Abstract

A method for producing fluorine-containing silica glass is disclosed. The method includes decompression degassing which includes degassing an inside of a furnace core tube under reduced pressure while heating the inside of the furnace core tube, after inserting a porous silica glass body into the furnace core tube provided in an airtight container; fluorine adding which includes supplying a fluorine compound gas into the furnace core tube, exhausting the fluorine compound gas remaining in the furnace core tube to an outside of the furnace core tube, and first heat-treating the porous silica glass body, under reduced pressure; and second heat-treating the porous silica glass body under reduced pressure at a temperature higher than temperatures in the decompression degassing process and the fluorine adding process.

Claims (19)

1 . A method for producing fluorine-containing silica glass, comprising:

decompression degassing which includes degassing an inside of a furnace core tube under reduced pressure while heating the inside of the furnace core tube, after inserting a porous silica glass body into the furnace core tube provided in an airtight container;

fluorine adding which includes supplying a fluorine compound gas into the furnace core tube, exhausting the fluorine compound gas remaining in the furnace core tube to an outside of the furnace core tube, and first heat-treating the porous silica glass body, under reduced pressure; and

second heat-treating the porous silica glass body under reduced pressure at a temperature higher than temperatures in the decompression degassing process and the fluorine adding process, wherein

the decompression degassing, the fluorine adding, and the second heat-treating are performed within the same furnace core tube,

in the fluorine adding, the first heat-treating is performed after stopping exhaustion of the furnace core tube,

the decompression degassing process is performed at a temperature of 1100° C. or more and 1200° C. or less,

the decompression degassing process has a heating time of at least 30 minutes at the temperature, and

an ultimate pressure at an end of the decompression degassing process is less than 500 pascals.

2 . The production method according to claim 1 , wherein

in the decompression degassing process, an inert gas is supplied into the furnace core tube.

3 . The production method according to claim 1 , wherein

the fluorine compound gas used in the fluorine adding process is a compound gas of a group 14 element and fluorine, and does not contain a chlorine atom or a hydrogen atom.

4 . The production method according to claim 1 , wherein

in the fluorine adding process, the fluorine compound gas is diluted with an inert gas at a concentration of 1% or more and less than 100% and supplied, or the fluorine compound gas is supplied at a concentration of 100%.

5 . The production method according to claim 1 , wherein

in the second heat-treating process, an evacuation treatment is performed in which pressure is reduced while supplying an inert gas into the furnace core tube.

6 . The production method according to claim 1 , wherein

an ultimate pressure is less than 500 pascals at an end of the second heat-treating process.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 27, 2022
From: ISHIKAWA, SHINJI; HARUNA, TETSUYA; MORITA, KEISEI; HASEGAWA, TATSURO; ARAKAWA, SEIJI
To: SUMITOMO ELECTRIC INDUSTRIES, LTD.
Reel/Frame 062215/0237 →
Priority Claims (1)
JP 2020-162357 · Sep 28, 2020 · national
Continuity (1)
Related Publication 20230339797A1 · Oct 26, 2023
References Cited (29)
US 4586943A · Kyoto et al. · 1986 [cited by applicant]
US 5053068A · Kyoto et al. · 1991 [cited by applicant]
US 5145507A · Kyoto et al. · 1992 [cited by applicant]
US 5158587A · Kyoto et al. · 1992 [cited by applicant]
US 5203899A · Kyoto et al. · 1993 [cited by applicant]
US 5330548A · Danzuka · 1994 [cited by examiner]
US 5364428A · Kyoto et al. · 1994 [cited by applicant]
US 5713979A · Nicholson · 1998 [cited by examiner]
US 20060115913A1 · Orita et al. · 2006 [cited by applicant]
US 20120118018A1 · Orita et al. · 2012 [cited by applicant]
US 20140050450A1 · Orita et al. · 2014 [cited by applicant]
US 20150259238A1 · Trommer et al. · 2015 [cited by applicant]
US 20170362115A1 · Dawes · 2017 [cited by examiner]
CN 112266162A · 2021 [cited by examiner]
JP S56063833A · 1981 [cited by applicant]
JP S60090842A · 1985 [cited by applicant]
JP S61215224A · 1986 [cited by applicant]
JP S61247633A · 1986 [cited by applicant]
JP S62083331A · 1987 [cited by applicant]
JP S62153130A · 1987 [cited by applicant]
JP H01219034A · 1989 [cited by applicant]
JP H01275441A · 1989 [cited by applicant]
JP 2006193409A · 2006 [cited by applicant]
JP 2007076927A · 2007 [cited by examiner]
JP 2008050202A · 2008 [cited by applicant]
JP 2009154090A · 2009 [cited by applicant]
JP 2016028992A · 2016 [cited by applicant]
JP2007076927A Clarivate Analytics Machine Translation retrieved Jan. 23, 2025. (Year: 2025). [cited by examiner]
CN-112266162-A EPO Machine Translation retrieved Sep. 24, 2025. (Year: 2025). [cited by examiner]