IP Library › Granted Patent US 12,646,551
Granted Patent B2
US 12,646,551 · App. 18/633,847 · Granted Jun 2, 2026

Gain cell memory device using enhanced sensing scheme and methods for operating the same

Inventors: Wei Ting Hsieh (Hsinchu, TW); Kuen-Yi Chen (Hsinchu City, TW); Yu-Wei Ting (Taipei City, TW); Yi Ching Ong (Hsinchu, TW); Kuo-Ching Huang (Hsinchu City, TW)
Assignee: Taiwan Semiconductor Manufacturing Company Limited
G11C11/405G11C11/4091G11C11/4096H10B12/00
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Quick Facts
Patent No.
US 12,646,551
App. No.
18/633,847
Granted
Jun 2, 2026
Kind
B2
Abstract

A gain cell memory includes a write transistor located on a substrate; a read transistor located on the substrate; a capacitor having a first electrode, a node dielectric, and a second electrode, wherein the first electrode is electrically connected to a first source/drain region of the write transistor and to a gate electrode of the read transistor; and a peripheral circuit configured to electrically bias a source region of the read transistor at a normal source bias voltage while the gain cell memory device is not under a read operation, and at a current-boost source bias voltage that increases an on-current of the read transistor while the gain cell memory device is under the read operation.

Claims (67)

1 . A gain cell memory device comprising:

a write transistor located on a substrate;

a read transistor located on the substrate;

a capacitor having a first electrode, a node dielectric, and a second electrode, wherein the first electrode comprises a signal node which is electrically connected to a first source/drain region of the write transistor and to a gate electrode of the read transistor, wherein the write transistor and the read transistor are front-end-of-line field-effect transistors formed directly on semiconductor material portions of the substrate, and the capacitor is a metal-insulator-metal capacitor embedded within dielectric material layers that overlie the write transistor and the read transistor and vertically spaced from the write transistor and the read transistor;

a read bit line configured to electrically bias a drain region of the read transistor;

a source bias line that is connected to a source region of the read transistor; and

a peripheral circuit configured to electrically bias the source bias line at a normal source bias voltage while the gain cell memory device is not under a read operation, and at a current-boost source bias pulse while the gain cell memory device is under the read operation, wherein:

the current-boost source bias pulse has a pulse voltage that equals a sum of (1+α) times the normal source bias voltage plus −α times a pre-charge bias voltage applied to a read bit line, wherein a has α value in a range from 0.01 to 0.30;

a rising edge of the current-boost source bias pulse is synchronous with a rising edge of a read word line pulse applied to a gate of the read transistor or an additional read transistor connected in series with the read transistor; and

a falling edge of the current-boost source bias pulse is synchronous with a falling edge of the read word line pulse.

2 . The gain cell memory device of claim 1 , further the read bit line is configured to electrically bias a drain region of the read transistor during an initial step of the read operation.

3 . The gain cell memory device of claim 2 , further comprising an additional read transistor that is connected to the drain region of the read transistor in a series connection, wherein a drain region of the additional read transistor is electrically shorted to the read bit line.

4 . The gain cell memory device of claim 3 , wherein the peripheral circuit is configured to apply a read gate pulse to a gate electrode of the additional read transistor for a first time duration during the read operation.

5 . The gain cell memory device of claim 4 , wherein:

the first time duration and the pulsed current-boost source bias voltage are selected such that a voltage at the read bit line at a time point of termination of the first time duration is between a first voltage and a second voltage under a condition in which the gate electrode of the read transistor is at a voltage that equals a sum of 0.5 times the pre-charge bias voltage and 0.5 times the normal source bias voltage;

the first voltage equals a sum of 0.4 times the pre-charge bias voltage and 0.6 times the normal source bias voltage; and

the second voltage equals a sum of 0.6 times the pre-charge bias voltage and 0.4 times the normal source bias voltage.

6 . The gain cell memory device of claim 2 , wherein the read bit line is electrically shorted to the drain region of the read transistor.

7 . The gain cell memory device of claim 6 , wherein the peripheral circuit is configured to:

maintain the read bit line at a high impedance state while the gain cell memory device is not under a read operation;

apply a pre-charge bias voltage to the read bit line during a pre-charge step of the read operation; and

measure a voltage at the read bit line after a first time duration after the pre-charge step.

8 . The gain cell memory device of claim 1 , wherein:

the pulsed current-boost source bias voltage is applied as a pulse having a duration equal to a duration of a read gate pulse applied to an additional read transistor connected in series with the read transistor; and

the pulse is generated by the peripheral circuit in response to a read command.

9 . The gain cell memory device of claim 1 , wherein:

the gain cell memory device is a three-transistor one-capacitor (3T1C) gain cell memory device comprising a write transistor, a first read transistor, and a second read transistor;

the capacitor is located within dielectric material layers that overlie the write transistor, the first read transistor, and the second read transistor;

the pulsed current-boost source bias voltage is applied as a pulse having a same time duration as a read gate pulse applied to the first read transistor; and

the pulsed current-boost source bias voltage increases an on-current of the second read transistor during a read operation relative to an operation in which a normal source-bias voltage is applied to the source bias line.

10 . The gain cell memory device of claim 1 , wherein α has a value in a range from 0.03 to 0.15 in the relation for the current-boost source-bias pulse voltage.

11 . The gain cell memory device of claim 1 , wherein applying the current-boost source-bias voltage increases a read bit-line voltage differential relative to a read operation using the normal source-bias voltage.

12 . A gain cell memory device comprising:

a write transistor located on a substrate;

a read transistor located on the substrate;

a capacitor having a first electrode which comprises a signal node that is electrically connected to a first source/drain region of the write transistor and to a gate electrode of the read transistor, a node dielectric, and a second electrode, wherein the write transistor and the read transistor are front-end-of-line field-effect transistors formed directly on semiconductor material portions of the substrate, and the capacitor is a metal-insulator-metal capacitor embedded within dielectric material layers that overlie the write transistor and the read transistor and vertically spaced from the write transistor and the read transistor;

metal interconnect structures located within the dielectric material layers and providing electrical connection to the first electrode, a second source/drain region of the write transistor, and a source region of the read transistor;

a read bit line configured to electrically bias a drain region of the read transistor;

a source bias line electrically connected to the source region of the read transistor; and

a peripheral circuit configured to electrically bias the source bias line at a normal source bias voltage while the gain cell memory device is not under a read operation, and at a current-boost source bias pulse that increases an on-current of the read transistor while the gain cell memory device is under the read operation, wherein:

the current-boost source bias pulse has a pulse voltage that equals a sum of (1+α) times the normal source bias voltage plus −α times a pre-charge bias voltage applied to a read bit line, wherein a has α value in a range from 0.01 to 0.30;

a rising edge of the current-boost source bias pulse is synchronous with a rising edge of a read word line pulse applied to a gate of the read transistor or an additional read transistor connected in series with the read transistor; and

a falling edge of the current-boost source bias pulse is synchronous with a falling edge of the read word line pulse.

13 . The gain cell memory device of claim 12 , wherein:

the peripheral circuit comprises a sense amplifier that is electrically connected to the read bit line; and

the peripheral circuit comprises a data latch that is configured to store an output of the sense amplifier at a time point at which the read operation terminates.

14 . A method of operating a device, the method comprising:

providing a gain cell memory device which comprises a write transistor located on a substrate, a read transistor located on the substrate, a capacitor having a first electrode which comprises a signal node that is electrically connected to a first source/drain region of the write transistor and to a gate electrode of the read transistor, a node dielectric, and a second electrode, a read bit line that is configured to electrically bias a drain region of the read transistor, and a source bias line that is connected to a source region of the read transistor, wherein the write transistor and the read transistor are front-end-of-line field-effect transistors formed directly on semiconductor material portions of the substrate, and the capacitor is a metal-insulator-metal capacitor embedded within dielectric material layers that overlie the write transistor and the read transistor and vertically spaced from the write transistor and the read transistor;

performing a write operation that encodes a data bit in the signal node by applying a write read-bit-line bias voltage to a second source/drain region of the write transistor and by turning on the write transistor while the source bias line is electrically biased at a first source bias voltage; and

performing a read operation by pre-charging the read bit line at a pre-charge bias voltage, by applying to the source bias line a current-boost source bias pulse, and by sensing a voltage at a drain region of the read transistor, wherein:

the current-boost source bias pulse has a pulse voltage that equals a sum of (1+α) times the normal source bias voltage plus −α times a pre-charge bias voltage applied to a read bit line, wherein α has a value in a range from 0.01 to 0.30;

a rising edge of the current-boost source bias pulse is synchronous with a rising edge of a read word line pulse applied to a gate of the read transistor or an additional read transistor connected in series with the read transistor; and

a falling edge of the current-boost source bias pulse is synchronous with a falling edge of the read word line pulse.

15 . The method of claim 14 , wherein a magnitude of a difference between the pre-charge bias voltage and the second source bias voltage is greater than a magnitude of a difference between the pre-charge bias voltage and the first source bias voltage.

16 . The method of claim 14 , wherein:

a first one of the pre-charge bias voltage and the first source bias voltage is a circuit power supply voltage; and

a second one of the pre-charge bias voltage and the first source bias voltage is an electrical ground voltage.

17 . The method of claim 14 , wherein:

the gain cell memory device comprises an additional read transistor configured to switch an electrical connection between the read bit line and the drain region of the read transistor;

the second source bias voltage is applied to the first source bias line by applying a current-boost source bias pulse;

the additional read transistor is turned on by applying a gate voltage pulse to a gate electrode of the additional read transistor; and

the current-boost source bias pulse has a same time duration as the gate voltage pulse.

18 . The method of claim 14 , wherein:

the gain cell memory device comprises a sense amplifier that is electrically connected to the read bit line and a data latch that is electrically coupled to an output of the sense amplifier; and

the method further comprises capturing the output of the sense amplifier at a time point at which the read operation terminates using the data latch.

19 . The method of claim 14 , wherein α has a value in a range from 0.03 to 0.15.

20 . The method of claim 14 , wherein applying the current-boost source-bias voltage increases a read bit-line voltage differential relative to a read operation using the normal source-bias voltage.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 3, 2024
From: HSIEH, WEI TING; CHEN, KUEN-YI; TING, YU-WEI; ONG, YI CHING; HUANG, KUO-CHING
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
Reel/Frame 067307/0542 →
Continuity (2)
Provisional Application 63598257 · Nov 13, 2023
Related Publication 20250322865A1 · Oct 16, 2025
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