Resist composition and patterning process
The present invention is a resist composition, including: a resin (A) having: a repeating unit represented by the general formula (p-1); a repeating unit represented by the general formula (a-1); and a repeating unit represented by the general formula (b-1); a resin (B) having: a repeating unit represented by the general formula (p-2); a repeating unit represented by the general formula (a-1); and a repeating unit represented by the general formula (b-1); and a solvent (D), wherein a content of the resin (A) contained in the resist composition is smaller than a content of the resin (B). This provides a resist composition that reduces roughness and size uniformity of a hole pattern with high resolution exceeding that of conventional resist materials even with a high exposure-dose region, that has good pattern shape after exposure, and that has excellent etching resistance.
1 . A resist composition, comprising:
a resin (A) having: a repeating unit represented by the following general formula (p-1); a repeating unit represented by the following general formula (a-1) and changing in its polarity by an action of an acid to be soluble in an alkaline aqueous solution; and a repeating unit represented by the following general formula (b-1);
a resin (B) having: a repeating unit represented by the following general formula (p-2); a repeating unit represented by the following general formula (a-1) and changing in its polarity by an action of an acid to be soluble in an alkaline aqueous solution; and a repeating unit represented by the following general formula (b-1); and
a solvent (D), wherein
a content of the resin (A) contained in the resist composition is smaller than a content of the resin (B),
wherein in the general formula (p-1), R 1 represents a hydrogen atom or a methyl group;
Z 1 represents a single bond, a phenylene group, —O—Z 11 —, —C(═O)—O—Z 11 —, —C(═O)—NH—Z 11 —, —Z 12 -Ph-, —Z 12 —O-Ph-, or —Z 12 —C(═O)—O-Ph-; Z 11 represents an alkanediyl group having 1 to 6 carbon atoms, an alkenediyl group having 2 to 6 carbon atoms, or a phenylene group, Z 11 optionally having a carbonyl group, an ester bond, an ether bond, or a hydroxy group; Z 12 represents a hydrocarbon group having 1 to 15 carbon atoms; Ph represents a phenylene group;
R 2 and R 3 each independently represents a monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally having a heteroatom, or a phenyl group;
M 0− represents a non-nucleophilic counterion;
in the general formula (p-2), R 4 represents a hydrogen atom or a methyl group;
Z 2 represents a single bond, a phenylene group, —O—Z 21 —, —C(═O)—O—Z 21 —, —Z 21 —C(═O)—O—, or —C(═O)—NH—Z 21 —; Z 21 represents a single bond, an alkanediyl group having 1 to 20 carbon atoms, an alkenediyl group having 2 to 20 carbon atoms, or a phenylene group, Z 21 optionally having a carbonyl group, an ester bond, an ether bond, or a hydroxy group;
M 1+ represents a counter cation having a substituent and being a sulfonium cation, an iodonium cation, or an ammonium cation;
R 5 represents a hydrogen atom or a trifluoromethyl group;
in the general formula (a-1), R 6 represents a hydrogen atom or a methyl group;
Y represents a group having a structure changing in its polarity by an action of an acid to be soluble in an alkaline aqueous solution;
in the general formula (b-1), R 7 represents a hydrogen atom or a methyl group;
Z 3 represents a single bond, a methylene group, an ethylene group, a phenylene group, a fluorinated phenylene group, an ester bond, an amide bond, —O—Z 31 —, —C(═O)—O—Z 31 —, or —C(═O)—NH—Z 31 —; Z 31 represents an alkanediyl group having 1 to 12 carbon atoms and optionally having a carbonyl group, an ester bond, or an ether bond;
“n1” represents an integer of 1 to 3; “n2” represents an integer of 0 to 3; a total of “n1” and “n2” is 5 or less; and
R 8 represents a halogen atom, a linear hydrocarbon group having 1 to 10 carbon atoms, or a branched or cyclic hydrocarbon group having 3 to 10 carbon atoms, and —CH 2 — constituting these groups are optionally substituted with —O—, —C(═O)—O—, or —C(═O)—, or optionally substituted with a hydrogen atom, a halogen atom, or a heteroatom.
2 . The resist composition according to claim 1 , wherein the non-nucleophilic counterion M 0− in the general formula (p-1) is represented by the following general formula (e-0),
wherein R 8b and R 9 each independently represent a hydrogen atom, a fluorine atom, or a trifluoromethyl group; and
R 10 represents a hydrogen atom, a hydroxy group, a substituted or unsubstituted linear alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted branched or cyclic alkyl group having 3 to 20 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms.
3 . The resist composition according to claim 1 , wherein the resin (A) and the resin (B) have no repeating unit having a lactone structure.
4 . The resist composition according to claim 2 , wherein the resin (A) and the resin (B) have no repeating unit having a lactone structure.
5 . The resist composition according to claim 1 , further comprising a resin (C) having no repeating unit changing in its polarity by an action of an acid to be soluble in an alkaline aqueous solution.
6 . The resist composition according to claim 2 , further comprising a resin (C) having no repeating unit changing in its polarity by an action of an acid to be soluble in an alkaline aqueous solution.
7 . The resist composition according to claim 3 , further comprising a resin (C) having no repeating unit changing in its polarity by an action of an acid to be soluble in an alkaline aqueous solution.
8 . The resist composition according to claim 4 , further comprising a resin (C) having no repeating unit changing in its polarity by an action of an acid to be soluble in an alkaline aqueous solution.
9 . The resist composition according to claim 5 , wherein the resin (C) has a repeating unit represented by the following general formula (c-1),
wherein R 1 represents a hydrogen atom or a methyl group; X 1 represents a single bond or a divalent linking group selected from a divalent hydrocarbon group having 1 to 10 carbon atoms, a fluorinated phenylene group, —O—X 11 —, —C(═O)—O—X 11 —, and —C(═O)—NH—X 11 —; and X 11 represents an alkanediyl group having 1 to 20 carbon atoms and optionally having a carbonyl group, an ester bond, or an ether bond.
10 . The resist composition according to claim 6 , wherein the resin (C) has a repeating unit represented by the following general formula (c-1),
wherein R 11 represents a hydrogen atom or a methyl group; X 1 represents a single bond or a divalent linking group selected from a divalent hydrocarbon group having 1 to 10 carbon atoms, a fluorinated phenylene group, —O—X 11 —, —C(═O)—O—X 11 —, and —C(═O)—NH—X 11 —; and X 11 represents an alkanediyl group having 1 to 20 carbon atoms and optionally having a carbonyl group, an ester bond, or an ether bond.
11 . The resist composition according to claim 7 , wherein the resin (C) has a repeating unit represented by the following general formula (c-1),
wherein R 1 represents a hydrogen atom or a methyl group; X 1 represents a single bond or a divalent linking group selected from a divalent hydrocarbon group having 1 to 10 carbon atoms, a fluorinated phenylene group, —O—X 11 —, —C(═O)—O—X 11 —, and —C(═O)—NH—X 11 —; and X 11 represents an alkanediyl group having 1 to 20 carbon atoms and optionally having a carbonyl group, an ester bond, or an ether bond.
12 . The resist composition according to claim 8 , wherein the resin (C) has a repeating unit represented by the following general formula (c-1),
wherein R 11 represents a hydrogen atom or a methyl group; X 1 represents a single bond or a divalent linking group selected from a divalent hydrocarbon group having 1 to 10 carbon atoms, a fluorinated phenylene group, —O—X 11 —, —C(═O)—O—X 11 —, and —C(═O)—NH—X 11 —; and X 11 represents an alkanediyl group having 1 to 20 carbon atoms and optionally having a carbonyl group, an ester bond, or an ether bond.
13 . The resist composition according to claim 1 , further comprising an onium salt (E) represented by the following general formula (e-1),
wherein R 12 and R 13 each independently represent a hydrogen atom, a fluorine atom, a hydrocarbon group having 1 to 10 carbon atoms and optionally having a fluorine atom, or a trifluoromethyl group;
R 14 represents a hydrogen atom, a hydroxy group, a substituted or unsubstituted linear alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted branched or cyclic alkyl group having 3 to 20 carbon atoms, the alkyl group optionally having an ether bond and an ester bond, or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms; and
M 2+ represents a counter cation having a substituent and being a sulfonium cation or an iodonium cation.
14 . The resist composition according to claim 1 , wherein the solvent (D) is a mixed solvent of two or three solvents selected from propylene glycol monomethyl ether acetate, propylene glycol dimethyl ether, ethyl lactate, γ-butyrolactone, and 4-hydroxy-4-methyl-2-pentanone.
15 . A patterning process, comprising:
(i) a step of forming a resist film on a substrate by using the resist composition according to claim 1 ;
(ii) a step of exposing the resist film to KrF excimer laser with a wavelength of 248 nm, ArF excimer laser with a wavelength of 193 nm, EUV lithography with a wavelength of 13.5 nm, or electron beam; and
(iii) a step of developing the exposed resist film with an alkaline developer.