IP Library Granted Patent US 12,717,233
Granted Patent B2
US 12,717,233 · App. 18/019,181 · Granted Aug 25, 2026

Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,717,233
App. No.
18/019,181
Filed
Feb 1, 2023
Granted
Aug 25, 2026
Kind
B2
Art Unit
1737
USPC
430/287.1
Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 14, 2025
From: KATO, TETSUYA; TAKEDA, AKIKO
To: RESONAC CORPORATION
Reel/Frame 069853/0264 →
CHANGE OF ADDRESS Recorded Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →
Priority Claims (1)
JP 2020-134944 · Aug 7, 2020 · national
Continuity (1)
Related Publication 20230273518A1 · Aug 31, 2023
References Cited (20)
US 20080268374A1 · Tashiro · 2008 [cited by examiner]
US 20160330845A1 · Okade · 2016 [cited by examiner]
US 20180237549A1 · Takeuchi · 2018 [cited by examiner]
US 20200174368A1 · Kim · 2020 [cited by examiner]
CN 102636956A · 2012 [cited by applicant]
CN 103091985A · 2013 [cited by applicant]
CN 103988154A · 2014 [cited by applicant]
CN 110121679A · 2019 [cited by applicant]
CN 111051983A · 2020 [cited by applicant]
CN 113412289A · 2021 [cited by applicant]
JP 2001290265A · 2001 [cited by applicant]
JP 2008275822A · 2008 [cited by applicant]
JP 2013195712A · 2013 [cited by applicant]
JP 2016143064A · 2016 [cited by applicant]
JP 2018204011A · 2018 [cited by examiner]
TW 201627758A · 2016 [cited by applicant]
TW 202040272A · 2020 [cited by applicant]
WO 2016104585A1 · 2016 [cited by applicant]
WO 2020162464A1 · 2020 [cited by applicant]
Translated Description of Anabuki (Year: 2018). [cited by examiner]