Granted Patent
B2
US 12,717,233 · App. 18/019,181 · Granted Aug 25, 2026
Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board
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Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded Jan 14, 2025
From: KATO, TETSUYA; TAKEDA, AKIKO
To: RESONAC CORPORATION
Reel/Frame 069853/0264 →
CHANGE OF ADDRESS
Recorded Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →
Priority Claims (1)
JP 2020-134944
· Aug 7, 2020
· national
Continuity (1)
References Cited (20)
US 20080268374A1
· Tashiro
· 2008
[cited by examiner]
US 20180237549A1
· Takeuchi
· 2018
[cited by examiner]
US 20200174368A1
· Kim
· 2020
[cited by examiner]
CN 102636956A
· 2012
[cited by applicant]
CN 103091985A
· 2013
[cited by applicant]
CN 103988154A
· 2014
[cited by applicant]
CN 110121679A
· 2019
[cited by applicant]
CN 111051983A
· 2020
[cited by applicant]
CN 113412289A
· 2021
[cited by applicant]
JP 2001290265A
· 2001
[cited by applicant]
JP 2008275822A
· 2008
[cited by applicant]
JP 2013195712A
· 2013
[cited by applicant]
JP 2016143064A
· 2016
[cited by applicant]
JP 2018204011A
· 2018
[cited by examiner]
TW 201627758A
· 2016
[cited by applicant]
TW 202040272A
· 2020
[cited by applicant]
WO 2016104585A1
· 2016
[cited by applicant]
WO 2020162464A1
· 2020
[cited by applicant]
Translated Description of Anabuki (Year: 2018).
[cited by examiner]