Extreme ultraviolet inner pod seal gap
An apparatus includes a reticle pod. The reticle pod includes a baseplate having a first surface, a cover having a second surface, and a stand-off mechanism on at least one of the cover and the baseplate. The first surface includes a first sealing surface on a periphery of the baseplate. The second surface includes a second sealing surface on a periphery of the cover. The stand-off mechanism is configured to create a linear gap between the first sealing surface and the second sealing surface when the cover is attached to the baseplate.
1 . An apparatus comprising a reticle pod, the reticle pod having:
a baseplate having a first surface, the first surface including a first sealing surface on a periphery of the baseplate;
a cover having a second surface, the second surface including a second sealing surface on a periphery of the cover; and
a stand-off mechanism on at least one of the cover and the baseplate,
wherein the stand-off mechanism is configured to prevent contact between the first sealing surface and the second sealing surface and to create sealing via a linear gap between the first sealing surface and the second sealing surface when the cover is attached to the baseplate.
2 . The apparatus of claim 1 , wherein the linear gap extends from the periphery of the cover and the periphery of the baseplate to an interior space within the reticle pod.
3 . The apparatus of claim 1 , wherein the reticle pod is an Extreme Ultraviolet (EUV) reticle pod,
the baseplate and the cover are configured to accommodate a reticle when the cover is attached to the baseplate.
4 . The apparatus of claim 1 , wherein a minimum size of the linear gap is at or about 2 microns.
5 . The apparatus of claim 1 , wherein a maximum size of the linear gap is at or about 40 microns.
6 . The apparatus of claim 1 , wherein the stand-off mechanism includes a plurality of projections from one of the cover or the baseplate, the other of the cover or the baseplate including a surface configured to contact the plurality of projections.
7 . The apparatus of claim 1 , wherein the stand-off mechanism includes a plurality of stand-off pads,
one of the first sealing surface and the second sealing surface includes a plurality of retention openings,
the other of the first sealing surface and the second sealing surface includes a plurality of recesses,
each pad of the plurality of pads extends into one retention opening of the plurality of retention openings and is partially received in one recess of the plurality of recesses, respectively.
8 . The apparatus of claim 7 , wherein the plurality of pads includes at least three pads.
9 . The apparatus of claim 7 , wherein the plurality of pads is made of polymer.
10 . The apparatus of claim 7 , wherein the plurality of pads is made of metal.
11 . The apparatus of claim 7 , wherein the plurality of retention openings is a plurality of through holes.
12 . The apparatus of claim 7 , wherein the plurality of pads is pressed in the plurality of retention openings, respectively, and extends a fixed height from the one of the first sealing surface and the second sealing surface to create the linear gap.
13 . The apparatus of claim 7 , wherein the plurality of pads is molded or machined in the plurality of retention openings, respectively, and extends a fixed height from the one of the first sealing surface and the second sealing surface to create the linear gap.
14 . The apparatus of claim 7 , wherein a top surface of each pad of the plurality of pads is flush with or is slightly below flush with a top surface of the cover or a bottom surface of the baseplate.
15 . The apparatus of claim 1 , wherein the reticle pod further includes a filter, and the sealing is configured such that the reticle pod has a conductance of at least 90%.
16 . A method of assembling a reticle pod, the reticle pod including a baseplate having a first surface, a cover having a second surface, and a stand-off mechanism on at least one of the cover and the baseplate, wherein the first surface includes a first sealing surface on a periphery of the baseplate, the second surface includes a second sealing surface on a periphery of the cover, the stand-off mechanism is configured to prevent contact between the first sealing surface and the second sealing surface and to create sealing via a linear gap between the first sealing surface and the second sealing surface when the cover is attached to the baseplate, the method comprising providing the stand-off mechanism on the at least one of the cover and the baseplate.
17 . The method of claim 16 , further comprising:
inserting a plurality of stand-off pads of the stand-off mechanism into a plurality of retention openings, respectively; and
adjusting a height of each pad of the plurality of pads to a fixed height,
wherein the plurality of retention openings is on one of the first sealing surface and the second sealing surface, and
a plurality of recesses is on the other of the first sealing surface and the second sealing surface.
18 . The method of claim 17 , wherein adjusting the height of each pad of the plurality of pads to the fixed height includes machining the plurality of pads such that the height of each pad of the plurality of pads is the fixed height.
19 . The method of claim 17 , wherein adjusting the height of each pad of the plurality of pads to the fixed height includes pressing the plurality of pads such that the height of each pad of the plurality of pads is the fixed height.
20 . The method of claim 16 , wherein a minimum distance between each pad of the plurality of pads and an inner boundary of the first sealing surface or the second sealing surface is at or about 4 mm.