IP Library › Granted Patent US 12,742,928
Granted Patent B2
US 12,742,928 · App. 18/352,727 · Granted Sep 22, 2026

Photonic device

Inventors: Sui-Ying Hsu (New Taipei City, TW); Yueh-Ying Lee (Hsinchu City, TW); Chien-Ying Wu (Hsinchu City, TW); Chen-Hao Huang (Taoyuan, TW); Chien-Chang Lee (Miaoli County, TW); Chia-Ping Lai (Hsinchu City, TW)
Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
G02B6/12002G02B6/12004G02B6/136G02B6/30
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Quick Facts
Patent No.
US 12,742,928
App. No.
18/352,727
Granted
Sep 22, 2026
Kind
B2
Abstract

A photonic device includes an optical coupler, a photodetector, a waveguide structure, a metal-dielectric stack, a contact, an interlayer dielectric layer, and a protection layer. The optical coupler, the photodetector, and the waveguide structure are over a substrate. The waveguide structure is laterally connected to the optical coupler. A top of the waveguide structure is lower than a top of the optical coupler. The metal-dielectric stack is over the optical coupler, the photodetector, and the waveguide structure. The metal-dielectric stack has a hole above the optical coupler. The contact connects the photodetector to the metal-dielectric stack. The interlayer dielectric layer is below the metal-dielectric stack and surrounds the contact. The protection layer lines the hole of the metal-dielectric stack. A bottom surface of the protection layer is lower than a top surface of the contact.

Claims (46)

1 . A photonic device, comprising:

a semiconductor substrate;

an optical coupler over the semiconductor substrate;

a photodetector over the semiconductor substrate;

a waveguide structure over the semiconductor substrate and laterally connected to the optical coupler, wherein a top of the waveguide structure is lower than a top of the optical coupler;

a metal-dielectric stack over the optical coupler, the photodetector, and the waveguide structure, wherein the metal-dielectric stack has a hole above the optical coupler;

a contact over the semiconductor substrate and connecting the photodetector to the metal-dielectric stack;

an interlayer dielectric layer below the metal-dielectric stack and surrounding the contact; and

a protection layer lining the hole of the metal-dielectric stack, wherein a bottom surface of the protection layer is lower than a top surface of the contact.

2 . The photonic device of claim 1 , wherein the bottom surface of the protection layer is in contact with the interlayer dielectric layer.

3 . The photonic device of claim 1 , wherein the interlayer dielectric layer spaces the bottom surface of the protection layer from the optical coupler.

4 . The photonic device of claim 1 , wherein the bottom surface of the protection layer is higher than a bottom surface of the contact.

5 . The photonic device of claim 1 , further comprising:

a passivation layer over the metal-dielectric stack, wherein the passivation layer has an opening communicated with the hole of the metal-dielectric stack, and the protection layer further lines the opening of the passivation layer.

6 . The photonic device of claim 5 , further comprising:

a conductive feature in the passivation layer and electrically connected to a metal layer of the metal-dielectric stack.

7 . The photonic device of claim 1 , wherein an entirety of the bottom surface of the protection layer vertically overlaps the optical coupler.

8 . A photonic device, comprising:

a semiconductor substrate;

an optical coupler over the semiconductor substrate;

a waveguide structure over the semiconductor substrate and laterally connected to the optical coupler; and

a metal-dielectric stack over the optical coupler and the waveguide structure, wherein the metal-dielectric stack has a hole above the optical coupler, wherein a portion of the metal-dielectric stack below the hole has a convex top surface, wherein the convex top surface of the metal-dielectric stack is laterally aligned with a bottommost one of a plurality of metal layers of the metal-dielectric stack.

9 . The photonic device of claim 8 , further comprising:

a protection layer in contact with the convex top surface of the portion of the metal-dielectric stack.

10 . The photonic device of claim 9 , wherein the protection layer has a convex top surface.

11 . The photonic device of claim 9 , wherein the protection layer has a substantially planar top surface.

12 . A photonic device, comprising:

a semiconductor substrate;

an optical coupler over the semiconductor substrate;

a waveguide structure over the semiconductor substrate and laterally connected to the optical coupler;

an interlayer dielectric layer over the optical coupler and the waveguide structure;

a metal-dielectric stack over the interlayer dielectric layer, wherein the metal-dielectric stack has a hole above the optical coupler; and

a protection layer extending in the interlayer dielectric layer and directly above the optical coupler, wherein the protection layer comprises a side portion in contact with a sidewall of the interlayer dielectric layer and a bottom portion extending laterally from a bottom end of the side portion of the protection layer and in contact with the interlayer dielectric layer, wherein the protection layer and the interlayer dielectric layer comprise a same material.

13 . The photonic device of claim 12 , wherein the optical coupler comprises a plurality of protruding portions and a plurality of trenches spacing the protruding portions apart from each other, and an entirety of the bottom portion of the protection layer vertically overlaps the protruding portions and the trenches of the optical coupler.

14 . The photonic device of claim 12 , wherein the protection layer lines the hole of the metal-dielectric stack.

15 . The photonic device of claim 12 , further comprising a passivation layer over the metal-dielectric stack, wherein the passivation layer has an opening communicated with the hole of the metal-dielectric stack, and the protection layer lines the opening of the passivation layer.

16 . The photonic device of claim 12 , wherein a difference between a refractive index of the protection layer and a refractive index of the interlayer dielectric layer is less than 0.1.

17 . The photonic device of claim 12 , wherein the protection layer comprises silicon nitride.

18 . The photonic device of claim 8 , wherein a top of the waveguide structure is lower than a top surface of the optical coupler.

19 . The photonic device of claim 8 , further comprising:

an interlayer dielectric layer below the metal-dielectric stack;

a photodetector; and

a contact connecting the photodetector to the metal-dielectric stack, wherein the interlayer dielectric layer surrounds the contact.

20 . The photonic device of claim 12 , further comprising:

a photodetector; and

a contact connecting the photodetector to the metal-dielectric stack, wherein a bottom surface of the protection layer is lower than a top surface of the contact.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 17, 2023
From: HSU, SUI-YING; LEE, YUEH-YING; WU, CHIEN-YING; HUANG, CHEN-HAO; LEE, CHIEN-CHANG; LAI, CHIA-PING
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 064283/0829 →
Continuity (3)
Continuation 17740213 · May 9, 2022
Continuation 16925273 · Jul 9, 2020
Related Publication 20230358959A1 · Nov 9, 2023
References Cited (18)
US 5195150A · Stegmueller · 1993 [cited by examiner]
US 5400419A · Heinen · 1995 [cited by examiner]
US 8903210B2 · Ellis-Monaghan et al. · 2014 [cited by applicant]
US 10267988B2 · Huang et al. · 2019 [cited by applicant]
US 10509169B2 · Chang et al. · 2019 [cited by applicant]
US 10861829B2 · Fung et al. · 2020 [cited by applicant]
US 20030190772A1 · Toyota et al. · 2003 [cited by applicant]
US 20100265983A1 · Adachi · 2010 [cited by examiner]
US 20140321801A1 · Ellis-Monaghan et al. · 2014 [cited by applicant]
US 20150097257A1 · Gambino · 2015 [cited by examiner]
US 20190081067A1 · Eom et al. · 2019 [cited by applicant]
US 20190088759A1 · Sung et al. · 2019 [cited by applicant]
US 20190195797A1 · Cai et al. · 2019 [cited by applicant]
US 20190265408A1 · Ji et al. · 2019 [cited by applicant]
US 20190369329A1 · Huang et al. · 2019 [cited by applicant]
US 20200057201A1 · Chang · 2020 [cited by examiner]
US 20200310027A1 · Boeuf · 2020 [cited by examiner]
US 20210302654A1 · Chen · 2021 [cited by examiner]