Semiconductor memory device
A semiconductor memory device includes a plurality of transistors arranged in a first direction, and arranged in a second direction and a first wiring layer disposed between a semiconductor substrate and a plurality of voltage supply wirings. Each of the plurality of transistors includes a source region and a drain region. The first wiring layer includes a plurality of first connecting portions disposed at positions overlapping with the plurality of source regions when viewed in a third direction and electrically connected to the plurality of source regions and the plurality of voltage supply wirings, a plurality of second connecting portions disposed at positions overlapping with the plurality of source regions when viewed in the third direction and electrically connected to a plurality of the drain regions and a plurality of conductive layers, and a passing wiring region disposed between a pair of the second connecting portions.
1 . A semiconductor memory device comprising:
a semiconductor substrate;
a plurality of voltage supply wirings;
a plurality of transistors disposed on the semiconductor substrate, arranged in a first direction, and arranged in a second direction intersecting with the first direction; and
a first wiring layer disposed between the semiconductor substrate and the plurality of voltage supply wirings, wherein
each of the plurality of transistors includes a source region and a drain region arranged with the source region in the second direction,
the first wiring layer includes:
a plurality of first connecting portions disposed at positions overlapping with the plurality of source regions when viewed in a third direction intersecting with the first direction and the second direction and electrically connected to the plurality of source regions and the plurality of voltage supply wirings;
a plurality of second connecting portions disposed at positions overlapping with the plurality of source regions when viewed in the third direction and electrically connected to the plurality of drain regions and a plurality of conductive layers; and
a passing wiring region disposed between a pair of the second connecting portions arranged in the second direction, and
the passing wiring region includes one or a plurality of passing wirings extending in the first direction.
2 . The semiconductor memory device according to claim 1 , comprising
a second wiring layer disposed between the semiconductor substrate and the first wiring layer, wherein
the second wiring layer includes:
a plurality of third connecting portions disposed at positions overlapping with the plurality of source regions when viewed in the third direction and electrically connected to the plurality of first connecting portions and the plurality of source regions:
a plurality of fourth connecting portions disposed at positions overlapping with the plurality of source regions when viewed in the third direction and electrically connected to the plurality of second connecting portions; and
a plurality of fifth connecting portions disposed at positions overlapping with the plurality of drain regions when viewed in the third direction and electrically connected to the plurality of fourth connecting portions and the plurality of drain regions.
3 . The semiconductor memory device according to claim 2 , wherein
positions in the first direction of the plurality of fourth connecting portions and positions in the first direction of the plurality of fifth connecting portions are same or different.
4 . The semiconductor memory device according to claim 2 , wherein
the respective plurality of first connecting portions and plurality of third connecting portions are overlapped when viewed in the third direction, and
the respective plurality of second connecting portions and plurality of fourth connecting portions are overlapped when viewed in the third direction.
5 . The semiconductor memory device according to claim 1 , wherein
a shield wiring extending in the first direction is disposed between the second connecting portion and the passing wiring region.
6 . The semiconductor memory device according to claim 5 , comprising
a hook-up wiring region disposed between the second connecting portion and the shield wiring, wherein
a plurality of hook-up wirings that connect two of the second connecting portions spaced in the first direction are disposed in the hook-up wiring region.
7 . The semiconductor memory device according to claim 6 , wherein
a width in the second direction of the hook-up wiring close to the shield wiring is larger than a width in the second direction of the hook-up wiring close to the second connecting portion.
8 . The semiconductor memory device according to claim 6 , wherein
a number of hook-up wirings across a straight line extending in the second direction at a first position in the first direction is configured to be larger than a number of the hook-up wirings across the straight line at a second position in the first direction, and a width in the second direction at a first part of the hook-up wiring including the first position is configured to be smaller than a width in the second direction at a second part other than the first part.
9 . The semiconductor memory device according to claim 1 , comprising:
a plurality of stacked structures that include the plurality of conductive layers arranged in the third direction, the plurality of conductive layers being arranged in the second direction;
a memory region that includes a plurality of semiconductor columns disposed corresponding to the plurality of stacked structures, extending in the third direction, and opposed to the plurality of conductive layers; and
a hook-up region that includes a plurality of first via-contact electrodes disposed corresponding to the plurality of stacked structures, extending in the third direction, and electrically connected to the plurality of conductive layers.
10 . The semiconductor memory device according to claim 9 , wherein
the plurality of transistors are disposed at positions overlapping with the hook-up region and a part of the memory region when viewed in the third direction.
11 . The semiconductor memory device according to claim 9 , wherein
a pitch in the second direction of the transistors is a same as a pitch in the second direction of the stacked structures.
12 . The semiconductor memory device according to claim 1 , wherein
the plurality of voltage supply wirings extend in the second direction and are arranged in the first direction.
13 . The semiconductor memory device according to claim 1 , wherein
the passing wiring includes a first passing wiring that transmits a voltage and a second passing wiring that transmits a control signal, and
a width in the second direction of the first passing wiring is larger than a width in the second direction of the second passing wiring.
14 . The semiconductor memory device according to claim 1 , wherein
the plurality of first connecting portions are arranged in the first direction in a first region overlapping with a region across the plurality of source regions arranged in the first direction when viewed in the third direction, and
the plurality of second connecting portions are arranged in the first direction in a second region close to both sides in the second direction of the first region.
15 . The semiconductor memory device according to claim 1 , comprising
a first chip and a second chip arranged in the third direction and bonded via a plurality of bonding electrodes, wherein
the first chip includes:
a plurality of stacked structure that includes the plurality of conductive layers arranged in the third direction and are arranged in the second direction;
a memory region that includes a plurality of semiconductor columns disposed corresponding to the plurality of stacked structures, extending in the third direction, and opposed to the plurality of conductive layers; and
a hook-up region that includes a plurality of first via-contact electrodes disposed corresponding to the plurality of stacked structures, extending in the third direction, and electrically connected to the plurality of conductive layers and the plurality of bonding electrodes, and
the second chip includes:
the semiconductor substrate;
the plurality of voltage supply wirings;
the plurality of transistors; and
the first wiring layer.
16 . The semiconductor memory device according to claim 1 , comprising:
a plurality of stacked structure that includes the plurality of conductive layers arranged in the third direction and are arranged in the second direction;
a memory region that includes a plurality of semiconductor columns disposed corresponding to the plurality of stacked structures, extending in the third direction, and opposed to the plurality of conductive layers; and
a hook-up region that includes a plurality of first via-contact electrodes disposed corresponding to the plurality of stacked structures, extending in the third direction, and electrically connected to the plurality of conductive layers, wherein
the plurality of stacked structures and the semiconductor substrate are arranged in the third direction, and
the plurality of transistors, the first wiring layer, and the plurality of voltage supply wirings are disposed between the plurality of stacked structures and the semiconductor substrate.
17 . The semiconductor memory device according to claim 1 , comprising
two wiring layers arranged adjacent in the third direction and disposed between the semiconductor substrate and the plurality of voltage supply wirings, wherein
in a plurality of wirings disposed in the two wiring layers, a number of wirings having a longitudinal direction in the first direction is larger than a number of wirings having a longitudinal direction in the second direction.
18 . The semiconductor memory device according to claim 1 , comprising
a plurality of wiring layers arranged adjacent in the third direction and disposed between the semiconductor substrate and the plurality of voltage supply wirings, wherein
each of the plurality of wiring layers includes a plurality of connecting portions disposed at positions overlapping with the plurality of source regions when viewed in the third direction and electrically connected to the plurality of drain regions and the plurality of conductive layers,
the respective plurality of connecting portions in the plurality of wiring layers are disposed at positions to be overlapped when viewed in the third direction,
among the plurality of connecting portions, the connecting portion to which a hook-up wiring is connected is connected to the adjacent connecting portion in a wiring layer on a side of the voltage supply wiring via a via-contact electrode, and
among the plurality of connecting portions, the connecting portion in a wiring layer on a side of the semiconductor substrate adjacent to the connecting portion to which the hook-up wiring is connected is electrically insulated.
19 . The semiconductor memory device according to claim 9 , wherein
three times of a pitch in the second direction of the transistors is a same as twice of a pitch in the second direction of the stacked structures.
20 . The semiconductor memory device according to claim 1 , wherein
the plurality of first connecting portions and the plurality of second connecting portions are arranged in the first direction in a first region overlapping with a region across the plurality of source regions arranged in the first direction when viewed in the third direction, and
the first connecting portion is disposed between two of the second connecting portions.