Semiconductor die including diffusion barrier layers embedding bonding pads and methods of forming the same

1. A structure comprising a first semiconductor die, wherein the first semiconductor die comprises:

first semiconductor devices located over a first substrate;

first interconnect-level dielectric material layers embedding first metal interconnect structures that are electrically connected to the first semiconductor devices and overlie the first semiconductor devices;

a layer stack of a first pad-connection-via-level dielectric material layer and a first proximal dielectric diffusion barrier layer overlying the first interconnect-level dielectric material layers and embedding first pad-connection via structures; and

a first pad-level dielectric material layer including first pad cavities that are filled with a respective combination of a first bonding pad and a respective first dielectric diffusion barrier portion, wherein each of the first bonding pads contacts a respective subset of the first pad-connection via structures;

wherein each of the first dielectric diffusion barrier portions comprises sidewall segments in contact with the first pad-level dielectric material layer and extending from a bottom surface of the first pad-level dielectric material layer to a top surface of the first pad-level dielectric material layer; and

wherein each of the first dielectric diffusion barrier portions further comprises a horizontal segment having a bottom surface that contacts the first proximal dielectric diffusion barrier layer, wherein the bottom surface comprises an outer periphery that is adjoined to bottom edges of the sidewall segments and an inner periphery that is laterally offset inward from the outer periphery by an offset distance that is greater than a thickness of the sidewall segments of the first dielectric diffusion barrier portions.

2. The structure of claim 1 , further comprising a second semiconductor die comprising:

second semiconductor devices located over a second substrate;

second interconnect-level dielectric material layers embedding second metal interconnect structures that are electrically connected to the second semiconductor devices; and

second bonding pads that are electrically connected to the second metal interconnect structures and bonded to a respective one of the first bonding pads.

3. The structure of claim 2 , wherein:

the first semiconductor devices comprise either three-dimensional memory devices or driver circuit devices for the three-dimensional memory devices;

the second semiconductor devices comprise another one of the three-dimensional memory devices or the driver circuit devices for the three-dimensional memory devices;

each of the second bonding pads contacts, and is laterally surrounded by, a respective second dielectric diffusion barrier portion;

the second bonding pads and the second dielectric diffusion barrier portions are embedded in a second pad-level dielectric material layer;

the second semiconductor die comprises a layer stack of a second pad-connection-via-level dielectric material layer and a second proximal dielectric diffusion barrier layer located between the second interconnect-level dielectric material layers and the second pad-level dielectric material layer and embedding second pad-connection via structures, and

each of the second bonding pads contacts a respective subset of the second pad-connection via structures.

4. A structure comprising a first semiconductor die, wherein the first semiconductor die comprises:

first semiconductor devices located over a first substrate;

first interconnect-level dielectric material layers embedding first metal interconnect structures that are electrically connected to the first semiconductor devices and overlie the first semiconductor devices;

a layer stack of a first pad-connection-via-level dielectric material layer and a first proximal dielectric diffusion barrier layer overlying the first interconnect-level dielectric material layers and embedding first pad-connection via structures; and

a first pad-level dielectric material layer including first pad cavities that are filled with a respective combination of a first bonding pad and a respective first dielectric diffusion barrier portion, wherein each of the first bonding pads contacts a respective subset of the first pad-connection via structures;

wherein the first semiconductor die comprises:

an additional planar diffusion barrier layer located between the first interconnect-level dielectric material layers and the first pad-connection-via-level dielectric material layer; and

at least one edge seal structure comprising a respective subset of the first metal interconnect structures that provides a respective continuous barrier laterally surrounding the first semiconductor devices without any lateral opening and vertically extends from the first substrate to the additional planar diffusion barrier layer.

5. The structure of claim 4 , wherein the at least one edge seal structure is electrically grounded.

6. The structure of claim 4 , further comprising a second semiconductor die comprising:

second semiconductor devices located over a second substrate;

second interconnect-level dielectric material layers embedding second metal interconnect structures that are electrically connected to the second semiconductor devices; and

second bonding pads that are electrically connected to the second metal interconnect structures and bonded to a respective one of the first bonding pads.

7. The structure of claim 6 , wherein:

the first semiconductor devices comprise either three-dimensional memory devices or driver circuit devices for the three-dimensional memory devices;

the second semiconductor devices comprise another one of the three-dimensional memory devices or the driver circuit devices for the three-dimensional memory devices;

each of the second bonding pads contacts, and is laterally surrounded by, a respective second dielectric diffusion barrier portion;

the second bonding pads and the second dielectric diffusion barrier portions are embedded in a second pad-level dielectric material layer;

the second semiconductor die comprises a layer stack of a second pad-connection-via-level dielectric material layer and a second proximal dielectric diffusion barrier layer located between the second interconnect-level dielectric material layers and the second pad-level dielectric material layer and embedding second pad-connection via structures, and

each of the second bonding pads contacts a respective subset of the second pad-connection via structures.