Method for supplying a laser or plasma with power, and plasma or laser system
A method includes providing a first power from an output terminal of a balanced amplifier to a discharge chamber. The balanced amplifier includes two amplifier paths, each of which supplies a signal to a coupler. The coupler is configured to combine the signals as a function of their phase relationship and supply a power as the first power to the output terminal and/or as a second power to an isolation terminal. The method further includes setting a first phase relationship between the signals for a predefined time in order to ignite the plasma, and setting a second phase relationship in order to maintain the plasma. Under the second phase relationship, substantially an entirety of the power is supplied to the output terminal. Under the first phase relationship, a third power reflected from the discharge chamber is reflected back to the discharge chamber in a proportion large enough for the ignition.
1 . A method for supplying a laser or a processing plasma in a discharge chamber with electrical power, the method comprising:
providing a first power from an output terminal of a balanced amplifier to the discharge chamber, wherein the balanced amplifier comprises at least two amplifier paths, each respective amplifier path supplies a respective signal to a coupler, wherein the coupler has the output terminal and an isolation terminal and is configured such that the coupler combines the signals of the at least two amplifier paths as a function of a phase relationship between the signals and supplies a power as the first power to the output terminal and/or as a second power to the isolation terminal as a function of the phase relationship between the signals,
setting a first phase relationship between the signals for a predefined time in order to carry out an ignition of the laser or of the plasma, and
setting a second phase relationship different than the first phase relationship in order to operate the laser or to maintain the plasma in the discharge chamber, wherein
the second phase relationship is set such that the coupler supplies substantially an entirety of the power to the output terminal as the first power and supplies substantially no power to the isolation terminal, and
the first phase relationship is set such that the coupler supplies a portion of the power to the isolation terminal as the second power, and a third power reflected from the discharge chamber to the balanced amplifier is reflected back from the balanced amplifier to the discharge chamber in a proportion large enough for the ignition.
2 . The method as claimed in claim 1 , wherein the first phase relationship is chosen such that there is a mismatch from the balanced amplifier to the discharge chamber.
3 . The method as claimed in claim 1 , wherein the predefined time is in a range of 0.1-10,000 microseconds.
4 . The method as claimed in claim 1 , wherein the coupler comprises a 3 dB coupler.
5 . The method as claimed in claim 1 , wherein a phase angle of 90° between the signals is set in order to maintain the plasma.
6 . The method as claimed in claim 1 , wherein a phase angle of not equal to 90° between the signals is set in order to ignite the plasma.
7 . A plasma system comprising
a discharge chamber,
a balanced amplifier connected to the discharge chamber, the balanced amplifier comprising a coupler and at least two amplifier paths, each respective amplifier path supplies a respective signal to the coupler, wherein the coupler has an output terminal and an isolation terminal and is configured such that the coupler combines the signals of the at least two amplifier paths as a function of a phase relationship between the signals and supplies a power as a first power to the output terminal and/or as a second power to the isolation terminal,
a controller configured to control the at least two amplifier paths for setting a first phase relationship between the signals for igniting a plasma in the discharge chamber and for setting a second phase relationship between the signals for maintaining the plasma,
wherein the second phase relationship is set such that the coupler supplies substantially an entirety of the power to the output terminal as the first power and supplies substantially no power to the isolation terminal, and
wherein the first phase relationship is set such that the coupler supplies a portion of the power to the isolation terminal as the second power, and a third power reflected from the discharge chamber to the balanced amplifier is reflected back from the balanced amplifier to the discharge chamber in a proportion large enough for the ignition.
8 . The plasma system as claimed in claim 7 , wherein the coupler comprises a 3 dB coupler.
9 . The plasma system as claimed in claim 7 , wherein at least one amplifier path of the at least two amplifier paths comprises a phase setting device for setting the phase relationship between the signals of the at least two amplifier paths.
10 . The method as claimed in claim 1 , wherein the coupler comprises a 90° hybrid coupler.
11 . The method as claimed in claim 6 , wherein the phase angle between the signals is in a range of 5°-85° or in a range of 95°-175°.
12 . The method as claimed in claim 6 , wherein the phase angle between the signals is in a range of 40°-50° or in a range of 130°-140°.
13 . The plasma system as claimed in claim 7 , wherein the coupler comprises a 90° hybrid coupler.
14 . The plasma system as claimed in claim 9 , wherein the phase setting device comprises a direct digital synthesis (DDS) component or a field programmable gate array (FPGA) with a digital-to-analog converter (DAC).