IP Library Granted Patent US 6,838,721
Granted Patent B2
US 6,838,721 · App. 10/423,589 · Granted Jan 4, 2005

Integrated circuit with a transitor over an interconnect layer

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Quick Facts
Patent No.
US 6,838,721
App. No.
10/423,589
Granted
Jan 4, 2005
Kind
B2
Abstract

An integrated circuit ( 101 ) includes electrical circuitry ( 105 ) formed on a substrate ( 103 ). An interconnect layer ( 109, 117 ) is formed over the electrical circuitry ( 105 ). In one example, a plurality of magneto-resistive random access memory cells (MRAM) ( 161, 171 ) is implemented above the interconnect layer. Each of the MRAM cells comprises a magneto-resistive tunnel junction (MTJ) storage element. A transistor ( 130 ) is formed-over the interconnect layer ( 109, 117 ). In one embodiment, the transistor is implemented as a thin film transistor (TFT). In one embodiment the transistor is a select transistor and may be coupled to one or more of the MTJ storage elements. Access circuitry ( 203, 205, 207, 209 ) is formed on the substrate ( 103 ) under the plurality of MRAM cells ( 161, 171 ).

Claims (38)

1. An integrated circuit comprising:

a substrate having an electrical circuit formed thereon;

an interconnect layer formed over the electrical circuit; and

a thin film transistor (TFT) formed over the interconnect layer;

wherein the integrated circuit includes a memory having a plurality of memory cells and the electrical circuit is an access circuit for accessing the plurality of memory cells.

2. The integrated circuit of claim 1 , wherein the thin film transistor is for coupling at least one of the plurality of memory cells to a data path in response to receiving a select signal from the access circuit.

3. The integrated circuit of claim 1 , wherein the plurality of memory cells is characterized as being a plurality of magneto-resistive random access memory (MRAM) cells, each of the plurality of MRAM cells comprising a magneto tunnel junction (MTJ) storage element.

4. The integrated circuit of claim 3 , wherein a group of the plurality of MRAM cells is coupled to the thin film transistor.

5. The integrated circuit of claim 3 , wherein:

the thin film transistor is for coupling at least one of the plurality of memory cells to a data path in response to receiving a select signal from the access circuit;

the thin film transistor has a first current electrode coupled to an MTJ storage element of the at least one of the plurality of memory cells, a second current electrode coupled to a bitline, and a control electrode coupled to a wordline for receiving the select signal.

6. The integrated circuit of claim 5 , wherein the thin film transistor is coupled to an MTJ storage element of more ta one of the plurality of memory cells.

7. The integrated circuit of claim 6 , wherein the MTJ storage elements of the more than one of the plurality of memory cells are coupled together in parallel.

8. The integrated circuit of claim 1 , wherein the interconnect layer is one of a plurality of metal interconnect layers formed over the electrical circuit.

9. The integrated circuit of claim 8 , further, comprising a top metal interconnect layer formed over the thin film transistor.

10. An integrated circuit comprising:

a substrate having active circuitry formed thereon;

an interconnect layer formed over the substrate;

a plurality of memory cells formed over the interconnect layer; and

a transistor formed over the interconnect layer, the transistor for selectively coupling a memory cell of the plurality of memory cells to the active circuitry.

11. The integrated circuit of claim 10 , wherein the transistor is a thin film transistor (TFT).

12. The integrated circuit of claim 10 , wherein the active circuitry comprises an access circuit for coupling the plurality of memory cells to a data path.

13. The integrated circuit of claim 12 wherein the transistor is for coupling at least one of the plurality of memory cells to a data path in response to receiving a select signal from the access circuit.

14. The integrated circuit of claim 10 , wherein the plurality of memory cells is characterized as being a plurality of magneto-resistive random access memory (MRAM) cells, each of the plurality of MRAM cells comprising a magneto tunnel junction (MTJ) storage element.

15. The integrated circuit of claim 14 , wherein:

the active circuitry comprises an access circuit for coupling the plurality of memory cells to a data path;

the transistor is for coupling at least one of the plurality of memory cells to a data path in response to receiving a select signal from the access circuit;

the transistor has a first current electrode coupled to an MTJ storage element of at least one of the plurality of memory cells, a second current electrode coupled to a bitline, and a control electrode coupled to a wordline for receiving the select signal.

16. The integrated circuit of claim 14 , wherein the transistor coupled to MTJ storage elements or more than one cells of the plurality of memory cells, the more than one cells are coupled together in parallel.

17. The integrated circuit of claim 10 , wherein the interconnect layer is one of a plurality of metal interconnect layers formed over the substrate.

18. The integrated circuit of claim 17 , further comprising a top metal interconnect layer formed over the transistor.

19. An integrated circuit comprising:

a substrate having active circuitry formed thereon, wherein the active circuitry includes a plurality of transistors;

an interconnect layer formed over the substrate including over the active circuitry; and

a transistor formed over the interconnect layer.

20. The integrated circuit of claim 19 , wherein the transistor is a thin film resistor (TFT).

21. The integrated circuit of claim 19 wherein the plurality of transistor are CMOS transistors.

22. The integrated circuit of claim 19 wherein each of the plurality of transistors includes a source/drain region formed by doping material or the substrate.

Assignments (19)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
RELEASE OF SECURITY INTEREST Recorded May 29, 2017
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP USA, INC. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 042610/0451 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 29, 2017
From: NXP USA, INC.
To: VLSI TECHNOLOGY LLC
Reel/Frame 042374/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE LISTED CHANGE OF NAME SHOULD BE MERGER AND CHANGE PREVIOUSLY RECORDED AT REEL: 040652 FRAME: 0180. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Jan 12, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 041354/0148 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 040652/0180 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037518/0292 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037486/0517 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0143 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037354/0225 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0553 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →