Method of managing electro migration in logic designs and design structure thereof
View Patent ↗A method of designing an integrated circuit includes modifying a design attribute-variable electromigration (EM) limit for each pre-defined circuit based on at least one reliability constraint in order to avoid EM violations of an integrated circuit. The method further includes synthesizing the integrated circuit from a high level description to at least a subset of the pre-defined circuit devices using the modified design-variable EM limit of each pre-defined circuit.
1. A method of designing an integrated circuit, comprising:
modifying a design-variable electromigration (EM) limit for each pre-defined circuit based on at least one reliability constraint in order to avoid EM violations of an integrated circuit; and
synthesizing the integrated circuit from a high level description to at least a subset of the pre-defined circuit devices using the modified design-variable EM limit of each pre-defined circuit, wherein:
the modifying the design-variable EM limit includes, at design start, calculating a maximum output slew or output capacitance; and
the modifying the design-variable EM limit is calculated by:
MTTF=A ( J−n ) e Ea/kT
where, A=Constant; J=Current Density; Ea=Energy Activation; K=Boltzmans Constant; and T=temperature in Kelvin wherein at least the step of the synthesizing the integrated circuit is performed by a processor.
2. The method of claim 1 , wherein a current density through a fixed size wire is increased by: increasing load capacitance (Q=CV); increasing voltage (Q=CV); or increasing frequency (decreasing period Tp) to limit either an allowable capacitance or output transition rate Ts (dv/dt) for each pre-defined circuit.