Rare-earth oxide isolated semiconductor fin
A dielectric template layer is deposited on a substrate. Line trenches are formed within the dielectric template layer by an anisotropic etch that employs a patterned mask layer. The patterned mask layer can be a patterned photoresist layer, or a patterned hard mask layer that is formed by other image transfer methods. A lower portion of each line trench is filled with an epitaxial rare-earth oxide material by a selective rare-earth oxide epitaxy process. An upper portion of each line trench is filled with an epitaxial semiconductor material by a selective semiconductor epitaxy process. The dielectric template layer is recessed to form a dielectric material layer that provides lateral electrical isolation among fin structures, each of which includes a stack of a rare-earth oxide fin portion and a semiconductor fin portion.
1. A method of forming a semiconductor structure, said method comprising:
forming a dielectric template layer on a substrate;
patterning said dielectric template layer to form at least one trench therein, wherein a top surface of said substrate is physically exposed within each of said at least one trench;
forming a rare-earth oxide fin portion at a lower portion of each of said at least one trench by depositing a rare-earth oxide material;
forming a semiconductor fin portion at an upper portion of each of said at least one trench by depositing a semiconductor material; and
recessing said dielectric template layer selective to said semiconductor fin portion and said rare-earth oxide fin portion, wherein a remaining portion of said dielectric template layer constitutes a dielectric material layer having a top surface that is recessed relative to a top surface of said semiconductor fin portion.
2. The method of claim 1 , wherein at least one of said at least one trench is a line trench located between a pair of vertical sidewalls of said patterned dielectric template layer and having a uniform spacing between said pair of vertical sidewalls, and a stack of a rare-earth oxide fin portion and a semiconductor fin portion within each of said at least one trench constitutes a fin structure.
3. The method of claim 1 , wherein said deposited rare-earth oxide material is a single crystalline rare-earth oxide material that is epitaxially aligned to a single crystalline material in said substrate.
4. The method of claim 3 , wherein said deposited semiconductor material is a single crystalline semiconductor material that is epitaxially aligned to said single crystalline rare-earth oxide material.
5. The method of claim 3 , wherein said single crystalline material in said substrate is a single crystalline semiconductor material.
6. The method of claim 1 , wherein said top surface of said dielectric material layer is located below a level of an interface between said rare-earth oxide fin portion and said semiconductor fin portion.
7. The method of claim 1 , further comprising:
forming a gate dielectric layer directly on sidewalls of said semiconductor fin portion; and
forming a gate electrode on said gate dielectric layer, wherein said gate electrode is spaced from a top surface and sidewall surfaces of said semiconductor fin portion by said gate dielectric layer.
8. The method of claim 7 , further comprising forming at least one contact via structure, wherein said at least one contact via structure is in direct contact with said gate electrode.
9. The method of claim 1 , wherein said dielectric template layer comprises silicon oxide.
10. A method of forming a semiconductor structure, said method comprising:
forming a dielectric template layer on a substrate;
patterning said dielectric template layer to form at least one trench therein, wherein a top surface of said substrate is physically exposed within each of said at least one trench;
forming a rare-earth oxide fin portion at a lower portion of each of said at least one trench by depositing a rare-earth oxide material; and
forming a semiconductor fin portion at an upper portion of each of said at least one trench by depositing a semiconductor material, wherein a horizontal topmost surface of said semiconductor fin portion is coplanar with a topmost horizontal surface of said dielectric template layer.
11. The method of claim 10 , wherein at least one of said at least one trench is a line trench located between a pair of vertical sidewalls of said patterned dielectric template layer and having a uniform spacing between said pair of vertical sidewalls, and a stack of a rare-earth oxide fin portion and a semiconductor fin portion within each of said at least one trench constitutes a fin structure.
12. The method of claim 10 , wherein said deposited rare-earth oxide material is a single crystalline rare-earth oxide material that is epitaxially aligned to a single crystalline material in said substrate.
13. The method of claim 12 , wherein said deposited semiconductor material is a single crystalline semiconductor material that is epitaxially aligned to said single crystalline rare-earth oxide material.
14. The method of claim 12 , wherein said single crystalline material in said substrate is a single crystalline semiconductor material.
15. The method of claim 10 , further comprising:
forming a gate dielectric layer directly on sidewalls of said semiconductor fin portion; and
forming a gate electrode on said gate dielectric layer, wherein said gate electrode is spaced from a top surface and sidewall surfaces of said semiconductor fin portion by said gate dielectric layer.
16. The method of claim 15 , further comprising forming at least one contact via structure, wherein said at least one contact via structure is in direct contact with said gate electrode.
17. The method of claim 10 , wherein said dielectric template layer comprises silicon oxide.