Manufacturing method of metal structure of flexible multi-layer substrate
A metal structure manufacture method for a multi-layer substrate comprises coating a photoresist layer on a first dielectric layer; proceeding a photolithography process to the photoresist layer to define a specific position for a first metal layer; removing the photoresist layer at the specific position; and forming the first metal layer at the specific position, wherein a base area of the first metal layer is larger than a top area thereof, and wherein the embedded base and the main body are formed in a same process and are monolithic formed. Said manufacturing method can be employed to manufacture a pad or a metal line of the flexible multi-layer substrate, and the manufactured metal structure cannot easily be delaminated or separated from the contacted dielectric layer.
1. A manufacturing method of a metal structure of a multi-layer substrate, comprising:
coating at least one photoresist layer on a first dielectric layer;
proceeding a photolithography process to the at least one photoresist layer to define a specific position for a first metal layer;
removing the at least one photoresist layer at the specific position;
forming the first metal layer at the specific position, wherein a base area of the first metal layer is larger than a top area thereof to form the metal structure having an embedded base and a main body positioned thereon, and wherein the embedded base and the main body are formed in a same process and are monolithic formed; and
forming a second dielectric layer to cover the main body and the embedded base of the first metal layer after the step of forming the first metal layer, wherein the step of forming the second dielectric layer comprises clamping the embedded base by the first dielectric layer and the second dielectric layer.
2. The manufacturing method of claim 1 , further comprising a step of opening a hole on the specific position of the first metal layer for connecting with a second metal layer above the second dielectric layer after the step of forming the second dielectric layer.
3. The manufacturing method of claim 2 , wherein a material of the second metal layer is copper.
4. The manufacturing method of claim 2 , wherein a material of the second metal layer is solder.
5. The manufacturing method of claim 4 , wherein the second metal layer is a solder ball mount for package.
6. The manufacturing method of claim 1 , wherein the multi-layer substrate is flexible.
7. The manufacturing method of claim 1 , wherein a material of the first dielectric layer and the second dielectric layer is polyimide.
8. The manufacturing method of claim 1 , wherein a material of the first metal layer is copper.
9. The manufacturing method of claim 1 , wherein the step of coating the at least one photoresist layer comprises coating a negative photoresist layer.
10. The manufacturing method of claim 1 , wherein the at least one photoresist layer comprises top and bottom photoresist layers with different development rates, and the step of coating the at least one photoresist layer on the first dielectric layer comprises coating the top and bottom photoresist layers with different development rates sequentially on the first dielectric layer, and wherein the development rate of the top photoresist layer is smaller than that of the bottom photoresist layer.