Semiconductor device and manufacturing method thereof
Provided are a semiconductor device including an interposer having a relatively thin thickness without a through silicon via and a method of manufacturing the same. The method of manufacturing a semiconductor device includes forming an interposer including a redistribution layer and a dielectric layer on a dummy substrate, connecting a semiconductor die to the redistribution layer facing an upper portion of the interposer, encapsulating the semiconductor die by using an encapsulation, removing the dummy substrate from the interposer, and connecting a bump to the redistribution layer facing a lower portion of the interposer.
1. A method of manufacturing a semiconductor device, the method comprising:
connecting a semiconductor die to an interposer, the interposer comprising a redistribution layer and an inorganic dielectric layer on a semiconductor substrate;
encapsulating the semiconductor die in an encapsulant; and
removing the semiconductor substrate from the interposer.
2. The method of claim 1 , wherein the semiconductor substrate comprises a silicon substrate.
3. The method of claim 1 , wherein said removing the semiconductor substrate comprises abrading the semiconductor substrate.
4. The method of claim 3 , wherein said abrading the semiconductor substrate comprises grinding the semiconductor substrate.
5. The method of claim 1 , comprising soldering the interposer to a package substrate.
6. The method of claim 5 , comprising forming underfill between the semiconductor die and the interposer and between the interposer and the package substrate.
7. The method of claim 5 , comprising completely covering at least respective top sides of the semiconductor die, the interposer, and the package substrate with a same cover material.
8. The method of claim 1 , wherein the dielectric layer comprises at least one of: silicon oxide and/or silicon nitride.
9. The method of claim 1 , where said connecting a semiconductor die to an interposer comprises directly connecting a first conductive bump on the semiconductor die to a second conductive bump on the interposer.
10. The method of claim 1 , wherein the redistribution layer comprises conductors characterized by a submicron pitch.
11. A method of manufacturing a semiconductor device, the method comprising:
receiving an interposer comprising a redistribution layer and a dielectric layer on a substrate;
attaching a semiconductor die to the received interposer; and
after said attaching the semiconductor die, removing the substrate from the interposer, wherein said removing the substrate comprises abrading the substrate.
12. The method of claim 11 , wherein:
said abrading the substrate comprises grinding the substrate; and
said removing the substrate further comprises etching the substrate to expose at least a portion of the redistribution layer.
13. The method of claim 11 , wherein the substrate comprises a semiconductor substrate.
14. The method of claim 13 , wherein the semiconductor substrate comprise a silicon substrate.
15. The method of claim 11 , wherein the dielectric layer comprises one or both of: silicon oxide and/or silicon nitride.
16. The method of claim 11 , wherein the redistribution layer comprises conductors characterized by a submicron pitch.
17. A method of manufacturing a semiconductor device, the method comprising:
receiving an interposer, the interposer comprising:
one or both of: a semiconductor material and/or a glass;
an under bump metal;
a redistribution layer on at least a portion of the under bump metal; and
a dielectric layer;
after said receiving the interposer, coupling a semiconductor die directly to the received interposer;
encapsulating the semiconductor die with an encapsulant; and
connecting a bump to the under bump metal.
18. The method as claimed in claim 17 , wherein the redistribution layer and the dielectric layer are on a substrate, the method comprising removing the substrate from the interposer by, at least in part, abrading the substrate.
19. The method of claim 18 , wherein the substrate comprises a semiconductor material.
20. The method of claim 19 , wherein the semiconductor material comprises silicon.