IP Library Patent Application 10126326
Patent Application Utility
App. No. 10/126,326 · Confirmation No. 3157

RELACS SHRINK METHOD APPLIED FOR SINGLE PRINT RESIST MASK FOR LDD OR BURIED BITLINE IMPLANTS USING CHEMICALLY AMPLIFIED DUV TYPE PHOTORESIST

Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗
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2013-04-26 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2013-04-26 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2013-03-21 PA.. Power of Attorney 1 View
2013-03-21 R3.73 Assignee showing of ownership per 37 CFR 3.73 3 View
2013-03-21 LET. Miscellaneous Incoming Letter 1 View
2013-03-21 N417 Electronic Filing System Acknowledgment Receipt 2 View
2013-03-21 TRAN.LET Transmittal Letter 1 View
2009-08-18 EBCC.AD Notice of Change of Address Place in File Wrapper Due to Electronic Business Center(EBC) Customer Number Update 1 View
2003-08-21 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-04-19 TRNA Transmittal of New Application 3 View
2002-04-19 SPEC Specification 11 View
2002-04-19 CLM Claims 5 View
2002-04-19 ABST Abstract 1 View
2002-04-19 DRW Drawings-only black and white line drawings 7 View
2002-04-19 OATH Oath or Declaration filed 3 View
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Quick Facts
App. No.
10/126,326
Filed
2002-04-19
Granted
2003-11-04
Examiner
TRAN, BINH X
Art Unit
1765
PTA
0 days