Method of forming a spiral inductor in a semiconductor substrate
View Patent ↗An inductor formed on a semiconductor substrate, comprising active device regions. The inductor comprises conductive lines formed on a dielectric layer overlying the semiconductor substrate. The conductive lines are patterned and etched into the desired shape, in one embodiment a planar spiral. A region of the substrate below the inductor are removed to lower the inductive Q factor.
1. A method for forming an inductor, comprising;
forming one or more dielectric layers overlying a semiconductor substrate, wherein an upper layer of the one or more dielectric layers comprises an upper surface;
forming conductive lines on the upper surface, wherein the conductive lines exhibit an inductive effect;
defining an aperture by removing a region of one or more of the dielectric layers underlying at least a portion of the conductive lines, wherein the aperture terminates at a top surface of the semiconductor substrate; and
depositing a dielectric material in the aperture.