Semiconductor device and method for manufacturing thereof
View Patent ↗A semiconductor device 100 includes a semiconductor substrate 14 , a connection electrode 12 disposed on an upper surface of the semiconductor substrate 14 and connected to an integrated circuit thereon, a through electrode 20 which penetrates the semiconductor substrate 14 and the connection electrode 20 , and an insulation portion 30 interposed between the semiconductor substrate 14 and the through electrode 20 . The through electrode 20 is integrally formed to protrude outward from upper surfaces of the semiconductor substrate 14 and the connection electrode 12 , and connected to the connection electrode 12 in a region where the through electrode 20 penetrates the connection electrode 12.
1. A semiconductor device comprising:
a semiconductor substrate;
a connection electrode disposed on an upper surface of the semiconductor substrate and connected to an integrated circuit on the semiconductor substrate;
a through electrode which penetrates the semiconductor substrate and the connection electrode; and
an insulation portion interposed between the semiconductor substrate and the through electrode, wherein
the through electrode is integrally formed to protrude outward from upper surfaces of the semiconductor substrate and the connection electrode, and connected to the connection electrode in a region where the through electrode penetrates the connection electrode.
2. The semiconductor device according to claim 1 , wherein:
the semiconductor substrate includes a first through hole which penetrates the semiconductor substrate, and a second through hole which vertically penetrates the insulation portion inside the first through hole;
the insulation portion is disposed inside the first through hole; and
the through electrode is disposed inside the second through hole.
3. The semiconductor device according to claim 2 , wherein:
the first through hole is tapered in a direction from the upper surface to a lower surface of the semiconductor substrate;
the insulation portion is formed to fill the first through hole; and
the second through hole is tapered from the lower surface to the upper surface of the semiconductor substrate.
4. The semiconductor device according to claim 1 , further comprising at least one of a first bonding bump formed on an upper surface of the through electrode and a second bonding bump formed on a lower surface of the through electrode.
5. A method for manufacturing a semiconductor device comprising:
bonding a first support member formed of a support base material and a support adhesive agent on an upper surface of a semiconductor substrate provided with a connection electrode by directing the support adhesive agent downward;
forming a first through hole which penetrates the semiconductor substrate;
forming an insulation portion inside the first through hole;
forming a second through hole which vertically penetrates the insulation portion and the connection electrode, and further penetrates the support adhesive agent inside the first through hole; and
integrally forming a through electrode in a region corresponding to the semiconductor substrate, the connection electrode and the support adhesive agent inside the second through hole.
6. The method for manufacturing the semiconductor device according to claim 5 , wherein:
the first support member is provided with a stopper layer interposed between the support base material and the support adhesive agent; and
forming the second through hole includes forming the second through hole which penetrates the insulation portion, the connection electrode and the support adhesive agent from a lower surface of the semiconductor substrate to reach the stopper layer.
7. The method for manufacturing the semiconductor device according to claim 5 , further comprising forming a first bonding bump in a region corresponding to the support adhesive agent inside the second through hole.
8. The method for manufacturing the semiconductor device according to claim 5 , further comprising:
bonding a second support member to a lower surface of the semiconductor substrate; and
forming a second bonding bump to a lower surface of the through electrode using the second support member as a mask after eliminating the support adhesive agent and the support base material, wherein:
forming the second through hole includes forming the second through hole which penetrates the second support member, the insulation portion, the connection electrode, and the support adhesive agent inside the first through hole; and
forming the through electrode includes forming the through electrode using the second support member as the mask.
9. The method for manufacturing the semiconductor device according to claim 5 , wherein:
forming the first through hole includes eliminating the semiconductor substrate in a direction from an upper surface to a lower surface thereof; and
forming the second through hole includes eliminating the insulation portion, the connection electrode and the support adhesive agent in the direction from the lower surface to the upper surface of the semiconductor substrate.
10. A semiconductor device wherein:
a plurality of the semiconductor devices according to claim 1 are stacked; and
vertically stacked semiconductor devices among the plurality of the semiconductor devices are connected with each other via the through electrode.