Method and apparatus for reducing semiconductor package tensile stress

1. A semiconductor package comprising:

a package substrate; and

a semiconductor die coupled electrically and physically to the package substrate, wherein the semiconductor die includes a stress relieving layer incorporated therein, the stress relieving layer having a predetermined structure and a predetermined location within the semiconductor die for reducing tensile stress of the semiconductor package, wherein the semiconductor die includes a first side portion that has a first side that is physically attached to the package substrate, wherein the stress relieving layer has a first Coefficient of Thermal Expansion (CTE) determined in response to the predetermined structure, the first CTE of the stress relieving layer is different than a die portion CTE of the first side portion of the semiconductor die and is defined within a predetermined CTE range for reducing the tensile stress of the semiconductor package during heating and cooling of the semiconductor package, and wherein the predetermined location of the stress relieving layer is located proximate to a second side of the semiconductor die opposite to the first side, wherein the semiconductor die has a silicon substrate, and wherein the stress relieving layer is a layer formed within the silicon substrate.

2. The semiconductor package in accordance with claim 1 , wherein the package substrate has a second CTE, and wherein the predetermined CTE range consists of CTE values greater than the second CTE.

3. The semiconductor package in accordance with claim 1 , wherein the package substrate has a second CTE, and wherein the predetermined CTE range consists of CTE values less than the second CTE.

4. The semiconductor package in accordance with claim 1 , wherein the predetermined structure of the stress relieving layer comprises a buried oxide layer.

5. The semiconductor package in accordance with claim 1 , wherein the predetermined structure of the stress relieving layer comprises a predetermined material having a predetermined thickness, and wherein the predetermined material is an insulative material.

6. The semiconductor package in accordance with claim 5 , wherein the insulative material is silicon nitride.

7. A semiconductor die comprising:

one or more semiconductor device structures; and

a stress relieving layer, the stress relieving layer having a predetermined structure and a predetermined location within the semiconductor die for reducing tensile stress of the semiconductor die during heating and cooling of a semiconductor package including the semiconductor die, wherein the semiconductor die includes a first side portion that has a first side for physically attaching to the package substrate, wherein the stress relieving layer has a first Coefficient of Thermal Expansion (CTE) determined in response to the predetermined structure thereof, the first CTE of the stress relieving layer is different than a die portion CTE of the first side portion of the semiconductor die and is defined within a predetermined CTE range for reducing the tensile stress, and wherein the predetermined location of the stress relieving layer is located proximate to a second side of the semiconductor die opposite to the first side, wherein the semiconductor die further comprises a silicon substrate, and wherein the stress relieving layer is formed in the silicon substrate.

8. The semiconductor die in accordance with claim 7 , wherein the stress relieving layer has the first Coefficient of Thermal Expansion (CTE) having a CTE value within the predetermined CTE range, and wherein the predetermined CTE range comprises CTE values greater than a CTE of the package substrate.

9. The semiconductor die in accordance with claim 7 , wherein the stress relieving layer has the first Coefficient of Thermal Expansion (CTE) having a CTE value within the predetermined CTE range, and wherein the predetermined CTE range comprises CTE values less than a CTE of a package substrate coupleable to the semiconductor die for packaging thereof.