Semiconductor device and method of forming uniform height insulating layer over interposer frame as standoff for semiconductor die
View Patent ↗A semiconductor device has an interposer frame having a die attach area. A uniform height insulating layer is formed over the interposer frame at corners of the die attach area. The insulating layer can be formed as rectangular or circular pillars at the corners of the die attach area. The insulating layer can also be formed in a central region of the die attach area. A semiconductor die has a plurality of bumps formed over an active surface of the semiconductor die. The bumps can have a non-fusible portion and fusible portion. The semiconductor die is mounted over the insulating layer which provides a uniform standoff distance between the semiconductor die and interposer frame. The bumps of the semiconductor die are bonded to the interposer frame. An encapsulant is deposited over the semiconductor die and interposer frame and between the semiconductor die and interposer frame.
1. A method of making a semiconductor device, comprising:
providing an interposer frame including,
(a) providing a substrate,
(b) forming a conductive via in the substrate, and
(c) forming a first conductive layer over the conductive via;
forming a first insulating layer over the first conductive layer;
forming a second conductive layer over the substrate opposite the first conductive layer, the second conductive layer being electrically connected to the conductive via;
forming a second insulating layer over the second conductive layer;
forming a third conductive layer over the second insulating layer electrically connected to the second conductive layer;
providing a die attach area on the substrate;
forming a plurality of discrete uniform height pillars over the interposer frame at corners of the die attach area with physical space extending to the interposer frame between the discrete uniform height pillars;
providing a semiconductor die including a plurality of bumps;
disposing the semiconductor die over the discrete uniform height pillars which provides a fixed uniform standoff distance between the semiconductor die and the interposer frame;
bonding the bumps of the semiconductor die to the first conductive layer of the interposer frame while the discrete uniform height pillars maintain the fixed uniform standoff distance; and
depositing an encapsulant between the semiconductor die and interposer frame by injecting the encapsulant through the physical space between the discrete uniform height pillars.
2. The method of claim 1 , further including forming the discrete uniform height pillars as rectangular or circular pillars at the corners of the die attach area.
3. The method of claim 1 , further including forming a portion of the discrete uniform height pillars in a central region of the die attach area.
4. A method of making a semiconductor device, comprising:
providing a substrate;
forming a plurality of conductive vias through the substrate;
forming a first conductive layer over a first surface of the substrate, the first conductive layer being electrically connected to the conductive vias;
forming a first insulating layer over the first conductive layer;
forming a second conductive layer over a second surface of the substrate opposite the first surface of the substrate, the second conductive layer being electrically connected to the conductive vias;
forming a second insulating layer over the second conductive layer;
forming a third conductive layer over the second insulating layer electrically connected to the second conductive layer;
providing a die attach area on the substrate;
forming a plurality of discrete uniform height pillars over the substrate at select points around a perimeter of the die attach area;
disposing a semiconductor die over the discrete uniform height pillars which provides a fixed region of physical space between the semiconductor die and the substrate;
bonding the semiconductor die to the substrate; and
depositing an encapsulant in the fixed region of physical space between the semiconductor die and the substrate by injecting the encapsulant between the discrete uniform height pillars sufficient to fill the fixed region of physical space between the semiconductor die and substrate.
5. The method of claim 4 , further including forming the discrete uniform height pillars as rectangular or circular pillars at corners of the die attach area.
6. The method of claim 4 , further including forming the discrete uniform height pillars with a 90 degree turn at corners of the die attach area.
7. The method of claim 4 , further including forming a portion of the discrete uniform height pillars in a central region of the die attach area.
8. The method of claim 4 , further including forming a composite bump over the semiconductor die, the composite bump including a non-fusible portion over a contact pad of the semiconductor die and a fusible portion over the non-fusible portion.
9. The method of claim 4 , further including:
forming a conductive pillar over a contact pad of the semiconductor die; and
forming a fusible bump over the conductive pillar.
10. The method of claim 4 , further including drawing a vacuum between the discrete uniform height pillars to deposit the encapsulant in the fixed spacing between the semiconductor die and the substrate.
11. A method of making a semiconductor device, comprising:
providing a substrate having a die attach area;
forming a first insulating layer over the substrate;
mounting a semiconductor die over the first insulating layer which provides a standoff distance between the semiconductor die and the substrate;
bonding the semiconductor die to the substrate;
forming a plurality of conductive vias through the substrate;
forming a first conductive layer over a first surface of the substrate, the first conductive layer being electrically connected to the conductive vias;
forming a second insulating layer over the first conductive layer;
forming a second conductive layer over a second surface of the substrate opposite the first surface of the substrate, the second conductive layer being electrically connected to the conductive vias;
forming a third insulating layer over the second conductive layer; and
forming a third conductive layer over the third insulating layer electrically connected to the second conductive layer.
12. A method of making a semiconductor device, comprising:
providing a substrate;
forming a plurality of conductive vias through the substrate;
forming a first conductive layer over a first surface of the substrate, the first conductive layer being electrically connected to the conductive vias;
forming a first insulating layer over the first conductive layer;
forming a second conductive layer over a second surface of the substrate opposite the first surface of the substrate, the second conductive layer being electrically connected to the conductive vias;
forming a second insulating layer over the second conductive layer;
forming a third conductive layer over the second insulating layer electrically connected to the second conductive layer;
forming a third insulating layer including a standoff height over the substrate;
providing a semiconductor die;
disposing the semiconductor die over the third insulating layer; and
depositing an underfill material between the semiconductor die and the substrate by injecting the underfill material through a first opening in the third insulating layer.
13. The method of claim 12 , further including depositing an encapsulant over the semiconductor die and the substrate.
14. The method of claim 12 , further including:
forming a die attach area over the substrate; and
forming the third insulating layer in a central region of the die attach area.
15. The method of claim 12 , further including forming a composite bump over the semiconductor die, the composite bump including a non-fusible portion over a contact pad of the semiconductor die and a fusible portion over the non-fusible portion.
16. The method of claim 12 , further including:
forming a conductive pillar over a contact pad of the semiconductor die; and
forming a bump over the conductive pillar.
17. The method of claim 12 , further including drawing a vacuum from a second opening in the third insulating layer to deposit the underfill material between the semiconductor die and substrate.