Semiconductor device and method of forming POP with stacked semiconductor die and bumps formed directly on the lower die
A semiconductor device has a first semiconductor wafer mounted to a carrier. A second semiconductor wafer is mounted to the first semiconductor wafer. The first and second semiconductor wafers are singulated to separate stacked first and second semiconductor die. A peripheral region between the stacked semiconductor die is expanded. A conductive layer is formed over the carrier between the stacked semiconductor die. Alternatively, a conductive via is formed partially through the carrier. A bond wire is formed between contact pads on the second semiconductor die and the conductive layer or conductive via. An encapsulant is deposited over the stacked semiconductor die, bond wire, and carrier. The carrier is removed to expose the conductive layer or conductive via and contact pads on the first semiconductor die. Bumps are formed directly on the conductive layer and contact pads on the first semiconductor die.
1. A method of making a semiconductor device, comprising:
providing a carrier;
mounting a first semiconductor wafer including a plurality of first semiconductor die to the carrier;
mounting a second semiconductor wafer including a plurality of second semiconductor die to a non-active surface of the first semiconductor wafer;
singulating the first and second semiconductor wafers to separate a plurality of stacked first and second semiconductor die;
forming a conductive layer over the carrier and coplanar with an active surface of the plurality of first semiconductor die;
forming a bond wire electrically coupling contact pads formed on the second semiconductor die and the conductive layer;
depositing an encapsulant over the stacked first and second semiconductor die, bond wire, and carrier;
removing the carrier from over the conductive layer and contact pads formed on the active surface of the first semiconductor die; and
forming a plurality of bumps directly on the conductive layer and contact pads on the first semiconductor die.
2. The method of claim 1 , further including expanding a peripheral region between the stacked first and second semiconductor die.
3. The method of claim 1 , wherein the bumps formed directly on the conductive layer are coplanar with the bumps formed directly on the contact pads of the first semiconductor die.
4. The method of claim 1 , further including removing a portion of the encapsulant over the second semiconductor die.
5. The method of claim 1 , further including forming a plurality of conductive vias through the encapsulant between the stacked first and second semiconductor die.
6. A method of making a semiconductor device, comprising:
providing a first wafer including a plurality of first semiconductor components;
disposing a second wafer including a plurality of second semiconductor components over the first wafer;
singulating the first and second wafers to separate a plurality of stacked first and second semiconductor components;
forming a conductive layer coplanar with a contact pad on an active surface of the first semiconductor components;
depositing a first encapsulant over the stacked first and second semiconductor components; and
forming an interconnect structure directly on the contact pad on the active surface of the first semiconductor components with a portion of the active surface remaining uncovered with respect to the interconnect structure.
7. The method of claim 6 , further including:
forming a bond wire between the second component and the conductive layer; and
forming the interconnect structure directly on the conductive layer.
8. The method of claim 6 , further including:
providing a carrier with the first and second components disposed over the carrier;
forming a via partially through the carrier;
forming the conductive layer within the via;
forming a bond wire between the second component and the conductive layer in the via; and
removing the carrier to leave the conductive layer extending beyond a level of the first component.
9. The method of claim 8 , wherein the interconnect structure formed directly on the first component is coplanar with the conductive layer.
10. The method of claim 6 , further including expanding a peripheral region between the stacked first and second components.
11. The method of claim 6 , further including removing a portion of the encapsulant over the second component.
12. The method of claim 6 , wherein the first component includes a first semiconductor die and the second component includes a second semiconductor die or interposer.
13. The method of claim 6 , wherein the second component includes:
providing an interposer;
mounting a semiconductor die to the interposer; and
depositing a second encapsulant over the semiconductor die and interposer.
14. A method of making a semiconductor device, comprising:
providing a first component;
disposing a second component over the first component;
forming a conductive layer in a peripheral region around the first component;
forming a first interconnect structure over a first surface of the conductive layer and electrically coupling the second component to the conductive layer;
depositing an encapsulant over the first and second components and the conductive layer; and
forming a second interconnect structure directly on an active surface of the first component and a second surface of the conductive layer opposite the first surface and without covering a portion of the active surface of the first component.
15. The method of claim 14 , wherein the first interconnect structure includes a bond wire.
16. The method of claim 15 , wherein the second interconnect structure formed directly on the active surface of the first component is coplanar with the second interconnect structure formed over the conductive layer.
17. The method of claim 14 , further including:
providing a carrier with the first and second components disposed over the carrier;
forming a via partially through the carrier;
forming the conductive layer within the via;
forming the first interconnect structure between the second component and the conductive layer in the via; and
removing the carrier to leave the conductive layer extending beyond a level of the first component.
18. The method of claim 17 , wherein the second interconnect structure formed directly on the active surface of the first component is coplanar with the conductive layer.
19. The method of claim 14 , further including expanding the peripheral region between the first and second components.
20. The method of claim 14 , wherein the first component includes a first semiconductor die and the second component includes a second semiconductor die or interposer.
21. A method of making a semiconductor device, comprising:
providing a first component and a second component stacked over the first component;
forming a conductive layer coplanar with a contact pad of the first component;
forming an interconnect structure electrically coupled to the second component and conductive layer; and
forming a bump directly on the contact pad of the first component.
22. The method of claim 21 , wherein the first component includes a first semiconductor die and the second component includes a second semiconductor die or interposer.
23. The method of claim 21 , further including:
depositing an encapsulant over the first and second components; and
removing a portion of the encapsulant to expose a surface of the second component.