Semiconductor device and method of forming dam material around periphery of die to reduce warpage
View Patent ↗A semiconductor device has a carrier. A first semiconductor die is mounted to the carrier with an active surface of the first semiconductor die oriented toward the carrier. A dam structure is formed on the carrier and around the first semiconductor die by depositing dam material on the carrier with screen printing, electrolytic plating, electroless plating, or spray coating. An encapsulant is deposited over the carrier and around the first semiconductor die. The encapsulant has a coefficient of thermal expansion (CTE) that corresponds to a CTE of the dam material. The CTE of the dam material is equal to or less than the CTE of the encapsulant. The carrier is removed to expose the active surface of the first semiconductor die with the dam structure stiffening a periphery of the first semiconductor die. The semiconductor device is singulated through the dam structure.
1. A method of making a semiconductor device, comprising:
providing a carrier;
disposing a first semiconductor die including an active surface oriented toward the carrier;
forming a dam structure on the carrier and around the first semiconductor die by depositing dam material on the carrier;
depositing an encapsulant over the dam structure and around the first semiconductor die with the encapsulant including a warpage characteristic opposite a warpage characteristic of the dam structure to stiffen a periphery of the first semiconductor die;
removing the carrier to expose the active surface of the first semiconductor die; and
singulating the semiconductor device through the dam structure.
2. The method of claim 1 , further including selecting a coefficient of thermal expansion (CTE) of the dam material to be equal to or less than a CTE of the encapsulant.
3. The method of claim 1 , further including disposing a heat sink or shielding layer over the encapsulant and first semiconductor die.
4. The method of claim 1 , further including forming the dam structure with a height equal to a height of the encapsulant.
5. The method of claim 1 , further including:
supporting the first semiconductor die by the dam structure; and
forming a bump over the active surface of the first semiconductor die.
6. The method of claim 1 , further including:
forming a first interconnect structure over the active surface of the first semiconductor die;
forming a second interconnect structure over a back surface of the first semiconductor die opposite the active surface of the first semiconductor die; and
forming a conductive pillar between the first and second interconnect structures.
7. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming a dam structure around the semiconductor die by depositing dam material; and
depositing an encapsulant over the dam structure and around the semiconductor die with the encapsulant including a warpage characteristic opposite a warpage characteristic of the dam structure.
8. The method of claim 7 , further including selecting a coefficient of thermal expansion (CTE) of the dam material to be equal to or less than a CTE of the encapsulant.
9. The method of claim 7 , further including disposing a heat sink or shielding layer over the encapsulant and semiconductor die.
10. The method of claim 7 , further including forming the dam structure with a height equal to a height of the encapsulant.
11. The method of claim 7 , further including singulating the semiconductor device through the dam structure.
12. The method of claim 7 , further including supporting the semiconductor die by the dam structure.
13. The method of claim 7 , further including:
forming a first interconnect structure over a first surface of the semiconductor die;
forming a second interconnect structure over a second surface of the semiconductor die opposite the first surface of the semiconductor die; and
forming a conductive pillar between the first and second interconnect structures.
14. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming a dam structure around the semiconductor die; and
depositing an encapsulant over the dam structure and around the semiconductor die with the encapsulant including a warpage characteristic opposite a warpage characteristic of the dam structure.
15. The method of claim 14 , further including selecting a coefficient of thermal expansion (CTE) of the dam structure to be equal to or less than a CTE of the encapsulant.
16. The method of claim 14 , further including disposing a heat sink or shielding layer over the encapsulant and semiconductor die.
17. The method of claim 14 , further including forming the dam structure with a height equal to a height of the encapsulant.
18. The method of claim 14 , further including singulating the semiconductor device through the dam structure.
19. The method of claim 14 , further including disposing the semiconductor die over a portion of the dam structure.
20. A method of making a semiconductor device, comprising:
providing a first semiconductor die;
depositing a dam material around the first semiconductor die to form forming a dam structure including a first warpage characteristic; and
depositing an encapsulant around the first semiconductor die with the encapsulant including a second warpage characteristic opposite a first warpage characteristic.
21. The method of claim 20 , wherein a coefficient of thermal expansion (CTE) of the dam material is equal to or less than a CTE of the encapsulant.
22. The method of claim 20 , further including disposing a heat sink or shielding layer over the encapsulant and first semiconductor die.
23. The method of claim 20 , further including forming the dam structure with a height equal to a height of the encapsulant.
24. The method of claim 20 , further including:
supporting the first semiconductor die by the dam structure; and
forming a bump over the active surface of the first semiconductor die.
25. The method of claim 20 , further including:
forming a first interconnect structure over a first the first semiconductor die;
forming a second interconnect structure over a second surface of the first semiconductor die opposite the first surface of the first semiconductor die; and
forming a conductive pillar between the first and second interconnect structures.
26. The method of claim 25 , further including disposing a second semiconductor die over the second interconnect structure.
27. The method of claim 6 , further including disposing a second semiconductor die over the second interconnect structure.
28. The method of claim 13 , further including disposing a second semiconductor die over the second interconnect structure.