Semiconductor die and method of forming sloped surface in photoresist layer to enhance flow of underfill material between semiconductor die and substrate
View Patent ↗A semiconductor device has a semiconductor die with composite bump structures over a surface of the semiconductor die. A conductive layer is formed over a substrate. A patterning layer is formed over the substrate. A first portion of the patterning layer is removed to form an opening to expose the substrate and conductive layer. A second portion of the patterning layer is removed to form a sloped surface in the patterning layer extending from a surface of the patterning layer down to the substrate. The sloped surface in the patterning layer can be linear, concave, or convex. The die is mounted to the substrate with the composite bump structures electrically connected to the conductive layer. An underfill material is deposited over the surface of the patterning layer. The sloped surface in the patterning layer aids with the flow of underfill material to cover an area between the die and substrate.
1. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming a plurality of composite bump structures over a surface of the semiconductor die;
providing a substrate;
forming a patterning layer over the substrate, the patterning layer including a surface opposite the substrate;
removing a first portion of the patterning layer to form an opening to expose the substrate and conductive layer;
removing a second portion of the patterning layer adjacent to the opening to form a sloped surface in the patterning layer, the sloped surface extending from the surface of the patterning layer down to the substrate;
disposing the semiconductor die over the substrate; and
depositing an underfill material over the surface of the patterning layer, wherein the underfill material flows down the sloped surface to cover an area between the semiconductor die and substrate around the composite bump structures.
2. The method of claim 1 , wherein the sloped surface in the patterning layer is linear.
3. The method of claim 1 , wherein the sloped surface in the patterning layer is concave or convex.
4. The method of claim 1 , further including removing the second portion of the patterning layer by laser direct ablation.
5. The method of claim 1 , wherein forming the composite bump structures includes:
forming a conductive pillar over the semiconductor die; and
forming a bump cap over the conductive pillar.
6. The method of claim 1 , further including:
forming a conductive layer over the substrate;
bonding the composite bump structures to the conductive layer, wherein a width of the composite bump structure is greater than a width of the conductive layer.
7. A method of making a semiconductor device, comprising:
providing a semiconductor die;
providing a substrate;
forming a patterning layer over the substrate, the patterning layer including a surface opposite the substrate;
forming a sloped surface in the patterning layer extending from the surface of the patterning layer to the substrate;
disposing the semiconductor die over the substrate; and
depositing an underfill material over the surface of the patterning layer which flows down the sloped surface to cover an area between the semiconductor die and substrate.
8. The method of claim 7 , wherein the sloped surface in the patterning layer is linear.
9. The method of claim 7 , wherein the sloped surface in the patterning layer is concave or convex.
10. The method of claim 7 , further including forming the sloped surface in the patterning layer by laser direct ablation.
11. The method of claim 7 , further including:
forming a conductive layer over the substrate;
forming a bump structure over a surface of the semiconductor die; and
disposing the semiconductor die over the substrate with the bump structure electrically connected to the conductive layer.
12. The method of claim 11 , wherein forming the bump structure includes:
forming a conductive pillar over the semiconductor die; and
forming a bump cap over the conductive pillar.
13. The method of claim 11 , wherein a width of the bump structure is greater than a width of the conductive layer.
14. A method of making a semiconductor device, comprising:
providing a semiconductor die;
providing a substrate;
forming a patterning layer over the substrate, the patterning layer including a surface opposite the substrate;
forming a sloped surface in the patterning layer extending from the surface of the patterning layer down to the substrate;
disposing the semiconductor die over the substrate; and
depositing an underfill material over the surface of the patterning layer which flows down the sloped surface to cover an area between the semiconductor die and substrate.
15. The method of claim 14 , wherein the sloped surface in the patterning layer is linear, concave, or convex.
16. The method of claim 14 , further including forming the sloped surface in the patterning layer by laser direct ablation.
17. The method of claim 14 , further including:
forming a conductive layer over the substrate;
forming a bump structure over a surface of the semiconductor die; and
disposing the semiconductor die over the substrate with the bump structure electrically connected to the conductive layer.
18. A method of making a semiconductor device, comprising:
providing a semiconductor die;
forming a bump structure over a surface of the semiconductor die, wherein forming the bump structure includes,
(a) forming a conductive pillar over the semiconductor die, and
(b) forming a bump cap over the conductive pillar;
providing a substrate;
forming a conductive layer over the substrate;
forming a patterning layer over the substrate;
forming a sloped surface in the patterning layer extending from a surface of the patterning layer down to the substrate;
disposing the semiconductor die over the substrate with the bump structure electrically connected to the conductive layer;
and depositing an underfill material over the surface of the patterning layer.
19. The method of claim 17 , wherein a width of the bump structure is greater than a width of the conductive layer.
20. A method of making a semiconductor device, comprising:
providing a semiconductor die;
providing a substrate;
forming a patterning layer over the substrate, the patterning layer including a surface opposite the substrate and a sloped surface extending from the surface of the patterning layer to the substrate; and disposing the semiconductor die over the substrate; and
depositing an underfill material over the surface of the patterning layer which flows down the sloped surface to cover an area between the semiconductor die and substrate.
21. The method of claim 20 , wherein the sloped surface in the patterning layer is linear, concave, or convex.
22. The method of claim 20 , further including forming the sloped surface in the patterning layer by laser direct ablation.
23. The method of claim 20 , further including:
forming a conductive layer over the substrate;
forming a bump structure over a surface of the semiconductor die; and
disposing the semiconductor die over the substrate with the bump structure electrically connected to the conductive layer.
24. The method of claim 23 , wherein forming the bump structure includes:
forming a conductive pillar over the semiconductor die; and
forming a bump cap over the conductive pillar.
25. The method of claim 23 , wherein a width of the bump structure is greater than a width of the conductive layer.