IP Library Granted Patent US 9,390,991
Granted Patent B2
US 9,390,991 · App. 13/346,415 · Granted Jul 12, 2016

Semiconductor device and method of forming wafer level ground plane and power ring

Inventors: Guruprasad G. Badakere (Singapore, SG); Zigmund R. Camacho (Singapore, SG); Lionel Chien Hui Tay (Singapore, SG)
Assignee: STATS ChipPAC Pte. Ltd.
H01L23/3114H01L21/568H01L21/6835H01L23/3157H01L23/3171H01L23/3185H01L23/528H01L23/5286H01L23/585H01L24/18H01L24/82H01L24/96H01L2224/04105H01L2224/12105H01L2224/18H01L2224/32145H01L2924/014H01L2924/01005H01L2924/01006H01L2924/01013H01L2924/01029H01L2924/01047H01L2924/01061H01L2924/01078H01L2924/01079H01L2924/01082H01L2924/14H01L2924/15311H01L2924/15331H01L2924/181H01L2924/30105
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Quick Facts
Patent No.
US 9,390,991
App. No.
13/346,415
Granted
Jul 12, 2016
Kind
B2
Abstract

A semiconductor die has active circuits formed on its active surface. Contact pads are formed on the active surface of the semiconductor die and coupled to the active circuits. A die extension region is formed around a periphery of the semiconductor die. Conductive THVs are formed in the die extension region. A wafer level conductive plane or ring is formed on a center area of the active surface. The conductive plane or ring is connected to a first contact pad to provide a first power supply potential to the active circuits, and is electrically connected to a first conductive THV. A conductive ring is formed partially around a perimeter of the conductive plane or ring and connected to a second contact pad for providing a second power supply potential to the active circuits. The conductive ring is electrically connected to a second THV.

Claims (46)

1. A method of making a semiconductor device, comprising:

providing a semiconductor die;

depositing an encapsulant around a peripheral area of the semiconductor die to form a die extension region;

forming a plurality of conductive vias through the encapsulant in the die extension region;

forming a conductive plane over the semiconductor die and electrically connected to a first one of the conductive vias; and

forming a conductive ring over the semiconductor die and electrically connected to a second one of the conductive vias.

2. The method of claim 1 , further including coupling the conductive plane and conductive ring to the conductive vias.

3. The method of claim 1 , further including forming the conductive plane over an active surface of the semiconductor die.

4. The method of claim 1 , further including coupling the conductive plane or conductive ring to a contact pad of the semiconductor die.

5. A semiconductor device, comprising:

a semiconductor die;

an encapsulant deposited around a peripheral area of the semiconductor die to form a die extension region;

a first conductive via disposed through the encapsulant in the die extension region;

a conductive plane formed over the semiconductor die and coupled to the first conductive via;

a second conductive via disposed through the encapsulant in the die extension region; and

a conductive ring formed over the semiconductor die and coupled to the second conductive via.

6. The semiconductor device of claim 5 , further including:

a conductive layer formed over the semiconductor die; and

a plurality of bumps formed over the conductive layer.

7. The semiconductor device of claim 5 , further including an insulation layer formed between the semiconductor die and the conductive plane.

8. The semiconductor device of claim 5 , wherein the conductive plane provides a first power supply potential to the semiconductor die and the conductive ring provides a second power supply potential to the semiconductor die.

9. The semiconductor device of claim 5 , wherein the conductive plane is formed over an active surface of the semiconductor die.

10. The semiconductor device of claim 5 , further including a heat sink disposed over the conductive plane.

11. A method of making a semiconductor device, comprising:

providing a semiconductor die;

depositing a molding compound in a die extension region around a peripheral area outside a footprint of the semiconductor die;

forming a first conductive via and second conductive via through the molding compound in the die extension region;

forming a conductive plane over the semiconductor die and electrically connected to the semiconductor die and first conductive via; and

forming a conductive ring over the semiconductor die and electrically connected to the semiconductor die and second conductive via.

12. The method of claim 11 , further including forming a first conductive layer over the semiconductor die.

13. The method of claim 11 , further including forming a conductive layer over the semiconductor die opposite the conductive plane.

14. The method of claim 11 , wherein the conductive plane provides a first power supply potential to the semiconductor die and the conductive ring provides a second power supply potential to the semiconductor die.

15. The method of claim 11 , further including forming the conductive plane over an active surface of the semiconductor die.

16. A method of making a semiconductor device, comprising:

providing a semiconductor die;

depositing a molding compound in a peripheral region of the semiconductor die to form a die extension region;

forming a plurality of conductive vias in the die extension region;

forming a conductive plane over an active surface of the semiconductor die to connect to a first contact pad on the active surface and a first conductive via of the plurality of conductive vias; and

forming a conductive ring partially around a perimeter of the conductive plane to connect to a second contact pad on the active surface and a second conductive via of the plurality of conductive vias, wherein the semiconductor device includes a wafer level chip scale package.

17. The method of claim 16 , further including forming a conductive layer over a surface of the semiconductor die opposite the active surface and in electrical contact with the plurality of conductive vias.

18. The method of claim 16 , further including forming the plurality of conductive vias into a first row of conductive vias and a second row of conductive vias offset from the first row of conductive vias.

19. The method of claim 16 , wherein the conductive plane provides a first power supply potential to the semiconductor die and the conductive ring provides a second power supply potential to the semiconductor die.

20. The method of claim 16 , further including:

forming an under bump metallization over the conductive plane; and

forming a bump on the under bump metallization.

21. The method of claim 16 , wherein the conductive plane is formed over a center area of the active surface of the semiconductor die.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 18, 2019
From: STATS CHIPPAC PTE. LTD.
To: JCET SEMICONDUCTOR (SHAOXING) CO., LTD.
Reel/Frame 051365/0680 →
RELEASE OF SECURITY INTEREST Recorded Dec 13, 2019
From: CITICORP INTERNATIONAL LIMITED, AS COMMON SECURITY AGENT
To: STATS CHIPPAC, INC.; STATS CHIPPAC PTE. LTD. FORMERLY KNOWN AS STATS CHIPPAC LTD.
Reel/Frame 051285/0318 →
CHANGE OF NAME Recorded Apr 7, 2016
From: STATS CHIPPAC LTD.
To: STATS CHIPPAC PTE. LTE.
Reel/Frame 038378/0427 →
SECURITY INTEREST Recorded Aug 6, 2015
From: STATS CHIPPAC, INC.; STATS CHIPPAC LTD.
To: CITICORP INTERNATIONAL LIMITED, AS COMMON SECURITY AGENT
Reel/Frame 036288/0748 →
Continuity (3)
Continuation 12905797 · Oct 15, 2010
Continuation 11951729 · Dec 6, 2007
Related Publication 20120104601A1 · May 3, 2012