Semiconductor device and method of forming multi-layered UBM with intermediate insulating buffer layer to reduce stress for semiconductor wafer
View Patent ↗A semiconductor wafer has a contact pad. A first insulating layer is formed over the wafer. A second insulating layer is formed over the first insulating layer and contact pad. A portion of the second insulating layer is removed to expose the contact pad. A first UBM layer is formed over and follows a contour of the second insulating layer and contact pad to create a well over the contact pad. A first buffer layer is formed in the well over the first UBM layer and the contact pad. A second UBM layer is formed over the first UBM layer and first buffer layer. A third UBM layer is formed over the second UBM layer. A bump is formed over the third UBM layer. The first buffer layer reduces stress on the bump and contact pad. A second buffer layer can be formed between the second and third UBM layers.
1. A semiconductor device, comprising:
a semiconductor die;
a first conductive layer conformally disposed over a contact pad of the semiconductor die;
a buffer layer disposed over the first conductive layer and within a recess of the first conductive layer formed over the contact pad;
a second conductive layer disposed over the first conductive layer and buffer layer creating an enclosed region between the first and second conductive layers with the buffer layer disposed in the enclosed region; and
an electrical interconnect disposed over the buffer layer and second conductive layer.
2. The semiconductor device of claim 1 , wherein:
a first insulating layer is disposed over the semiconductor die; and
the first conductive layer follows a contour of the first insulating layer and contact pad.
3. The semiconductor device of claim 1 , wherein:
a first insulating layer is disposed over the semiconductor die;
a second insulating layer is disposed over the first insulating layer and the contact pad; and
the first conductive layer follows a contour of the first and second insulating layers and contact pad.
4. The semiconductor device of claim 1 , wherein the electrical interconnect includes a bump.
5. The semiconductor device of claim 1 , further including a second buffer layer disposed over the second conductive layer.
6. The semiconductor device of claim 1 , further including a third conductive layer disposed over the second conductive layer.
7. A semiconductor device, comprising:
a semiconductor die;
a first conductive layer conformally disposed over a contact pad of the semiconductor die;
a buffer layer disposed within a recess of the first conductive layer formed over the contact pad; and
a second conductive layer disposed over and following contours of the first conductive layer and the buffer layer with the buffer layer disposed between the first and second conductive layers.
8. The semiconductor device of claim 7 , further including a second buffer layer disposed over the second conductive layer and first buffer layer.
9. The semiconductor device of claim 7 , further including a first insulating layer disposed over the semiconductor die.
10. The semiconductor device of claim 7 , further including an interconnect structure disposed over the second conductive layer.
11. The semiconductor device of claim 10 , wherein the interconnect structure is a bump.
12. The semiconductor device of claim 11 , wherein the buffer layer reduces stress on the contact pad and the bump.
13. The semiconductor device of claim 7 , further including a third conductive layer disposed over the second conductive layer.
14. A semiconductor device, comprising:
a semiconductor die;
a first conductive layer disposed over a contact pad of the semiconductor die;
a buffer layer disposed over the first conductive layer and within a recess of the first conductive layer disposed over the contact pad; and
a second conductive layer conformally disposed over the first conductive layer and the buffer layer.
15. The semiconductor device of claim 14 further including an insulating layer disposed over the semiconductor die.
16. The semiconductor device of claim 14 , further including a second conductive layer disposed over the first conductive layer and the buffer layer.
17. The semiconductor device of claim 16 , further including a bump disposed over the second conductive layer.
18. The semiconductor device of claim 16 , further including a second buffer layer disposed over the second conductive layer.
19. The semiconductor device of claim 16 , further including a third conductive layer disposed over the second conductive layer.
20. A semiconductor device, comprising:
a semiconductor die;
a first and conductive layer disposed over the semiconductor die; and
a buffer layer disposed over the first and conductive layer and within a recess of the first conductive layer formed over a contact pad of the semiconductor die; and a second conductive layer disposed over the first conductive layer and buffer layer creating an enclosed region between the first and second conductive layers with the buffer layer disposed in the enclosed region.
21. The semiconductor device of claim 20 , wherein the second conductive layer is electrically connected to the first conductive layer.
22. The semiconductor device of claim 20 , further including
the first insulating layer disposed over a contact pad of the semiconductor die.
23. The semiconductor device of claim 20 , further including an interconnect structure disposed over the second conductive layer.
24. The semiconductor device of claim 20 , further including a second buffer layer disposed over the second conductive layer.
25. The semiconductor device of claim 20 , further including a third conductive layer disposed over the second conductive layer.