IP Library Granted Patent US 9,431,390
Granted Patent B2
US 9,431,390 · App. 14/267,185 · Granted Aug 30, 2016

Compact electrostatic discharge (ESD) protection structure

Inventors: Pei-Ming Daniel Chow (Los Angeles, CA); Yon-Lin Kok (Cerritos, CA); Jing Zhu (Santa Monica, CA); Steven Schell (Torrance, CA)
Assignee: MICROCHIP TECHNOLOGY INCORPORATED
H01L27/0292H01L27/0207H01L27/0248H01L27/0605H01L29/778H01L27/0629
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Quick Facts
Patent No.
US 9,431,390
App. No.
14/267,185
Granted
Aug 30, 2016
Kind
B2
Abstract

A multi-gate Schottky depletion-mode field effect transistor (FET), at least one diode and two resistors comprise a compact electrostatic discharge (ESD) protection structure. This ESD protection structure can be laid out in a smaller area than typical multiple diode ESD devices. The multi-gate FET may comprise various types of high-electron-mobility transistor (HEMT) devices, e.g., (pseudomorphic) pHEMT, (metamorphic) mHEMT, induced HEMT. The multiple gates of the Schottky field effect device are used to form an ESD trigger and charge draining paths for protection of circuits following the ESD protection device. Both single and dual polarity ESD protection devices may be provided on an integrated circuit die for protection of input-output circuits thereof.

Claims (29)

1. An electrostatic discharge (ESD) protection device, comprising:

a field effect transistor (FET) having a drain, at least two gates and a source, wherein the drain thereof is coupled to a node of a circuit to be protected from an ESD event;

at least one diode coupled between the source of the FET and a power supply common;

a first resistor coupled between the at least two gates of the FET; and

a second resistor coupled to a one of the at least two gates and the power supply common.

2. The ESD protection device according to claim 1 , wherein one of the at least two gates is a trigger gate and another one of the at least two gates is a discharge gate.

3. The ESD protection device according to claim 1 , wherein the at least one diode are two diodes connected in series between the source of the FET and power supply common.

4. The ESD protection device according to claim 1 , wherein the power supply common is coupled to an electrical ground.

5. The ESD protection device according to claim 1 , wherein the FET, the at least one diode and the first and second resistors are fabricated on an integrated circuit die and coupled to the circuit node that is coupled to an external connection of the integrated circuit die.

6. The ESD protection device according to claim 5 , wherein a function of the external connection of the integrated circuit die is selected from the group consisting of an analog input, a digital input, an analog output, a digital output, an analog input/output, a digital input/output, a power connection, a bias input, and an external compensation capacitor.

7. The ESD protection device according to claim 1 , wherein the FET is a depletion-mode FET.

8. The ESD protection device according to claim 7 , wherein the depletion-mode FET is a high-electron-mobility transistor (HEMT).

9. The ESD protection device according to claim 8 , wherein the HEMT is a pseudomorphic HEMT (pHEMT).

10. The ESD protection device according to claim 8 , wherein the HEMT is a metamorphic HEMT (mHEMT).

11. The ESD protection device according to claim 8 , wherein the HEMT is an induced HEMT.

12. An electrostatic discharge (ESD) protection device, comprising:

a field effect transistor (FET) having a drain, at least two gates and a source, wherein the drain thereof is coupled to a node of a circuit to be protected from an ESD event;

at least one diode having an anode coupled with the source of the FET;

a first resistor coupled between the at least two gates of the FET; and

a second resistor coupled to a one of the at least two gates and a cathode of the at least one diode.

13. The ESD protection device according to claim 12 , wherein one of the at least two gates is a trigger gate and another one of the at least two gates is a discharge gate.

14. The ESD protection device according to claim 12 , wherein the at least one diode are two diodes connected in series.

15. The ESD protection device according to claim 12 , wherein the cathode of the at least one diode is coupled with an electrical ground.

16. The ESD protection device according to claim 12 , wherein the FET is a depletion-mode FET.

17. The ESD protection device according to claim 16 , wherein the depletion-mode FET is a high-electron-mobility transistor (HEMT).

18. The ESD protection device according to claim 17 , wherein the HEMT is a pseudomorphic HEMT (pHEMT) or a metamorphic HEMT (mHEMT).

19. The ESD protection device according to claim 17 , wherein the HEMT is an induced HEMT.

20. The ESD protection device according to claim 17 , wherein the FET, the at least one diode and the first and second resistors are fabricated on an integrated circuit die and coupled to the circuit node that is coupled to an external connection of the integrated circuit die.

21. The ESD protection device according to claim 20 , wherein a function of the external connection of the integrated circuit die is selected from the group consisting of an analog input, a digital input, an analog output, a digital output, an analog input/output, a digital input/output, a power connection, a bias input, and an external compensation capacitor.

Assignments (16)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 16, 2025
From: MICROCHIP TECHNOLOGY INC.; MICROCHIP TECHNOLOGY IRELAND LIMITED; MICROSEMI CORPORATION; ATMEL CORPORATION; SILICON STORAGE TECHNOLOGY, INC.; MICROSEMI FREQUENCY AND TIME CORP.; MICROSEMI SEMICONDUCTOR ULC; MICROCHIP TECHNOLOGY GERMANY GMBH
To: CRESTONE IP MANAGEMENT, LLC
Reel/Frame 071991/0419 →
RELEASE OF SECURITY INTEREST Recorded Mar 14, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 060894/0437 →
RELEASE OF SECURITY INTEREST Recorded Mar 11, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059363/0001 →
RELEASE OF SECURITY INTEREST Recorded Mar 10, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059863/0400 →
RELEASE OF SECURITY INTEREST Recorded Mar 9, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059358/0001 →
RELEASE OF SECURITY INTEREST Recorded Feb 28, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED
Reel/Frame 059666/0545 →
RELEASE OF SECURITY INTEREST Recorded Feb 25, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059333/0222 →
SECURITY INTEREST Recorded Jun 4, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 057935/0474 →
SECURITY INTEREST Recorded Dec 24, 2020
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 055671/0612 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 053468/0705 →
RELEASE OF SECURITY INTEREST Recorded May 30, 2020
From: JPMORGAN CHASE BANK, N.A, AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 053466/0011 →
SECURITY INTEREST Recorded Apr 24, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 053311/0305 →
SECURITY INTEREST Recorded Sep 18, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 047103/0206 →
SECURITY INTEREST Recorded Jun 25, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 046426/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 14, 2017
From: CHOW, DANIEL; ZHU, JING; SCHELL, STEVEN; KOK, YON-LIN
To: MICROCHIP TECHNOLOGY INCORPORATED
Reel/Frame 041256/0615 →
SECURITY INTEREST Recorded Feb 10, 2017
From: MICROCHIP TECHNOLOGY INCORPORATED
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 041675/0617 →
Continuity (2)
Provisional Application 61819252 · May 3, 2013
Related Publication 20140327048A1 · Nov 6, 2014