IP Library Granted Patent US 9,543,009
Granted Patent B2
US 9,543,009 · App. 14/887,532 · Granted Jan 10, 2017

Multiple layer forming scheme for vertical cross point reram

Inventors: Chang Siau (Saratoga, CA); Tianhong Yan (San Jose, CA)
Assignee: SANDISK TECHNOLOGIES LLC
G11C13/0069G11C13/0097G11C2213/71G11C2213/77
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Quick Facts
Patent No.
US 9,543,009
App. No.
14/887,532
Granted
Jan 10, 2017
Kind
B2
Abstract

Methods for forming non-volatile storage elements in a non-volatile storage system are described. In some embodiments, during a forming operation, a cross-point memory array may be biased such that waste currents are minimized or eliminated. In one example, the memory array may be biased such that a first word line comb is set to a first voltage, a second word line comb interdigitated with the first word line comb is set to the first voltage, and selected vertical bit lines are set to a second voltage such that a forming voltage is applied across non-volatile storage elements to be formed. In some embodiments, a memory array may include a plurality of word line comb layers and a forming operation may be concurrently performed on non-volatile storage elements on all of the plurality of word line comb layers or a subset of the plurality of word line comb layers.

Claims (45)

1. A non-volatile storage system, comprising:

a memory array, the memory array includes a first group of vertical bit lines connected to a plurality of word line combs, the first group of vertical bit lines includes a first bit line, each word line comb of the plurality of word line combs is connected to the first bit line, the memory array includes a second group of vertical bit lines connected to the plurality of word line combs, the second group of vertical bit lines includes a second bit line, each word line comb of the plurality of word line combs is connected to the second bit line; and

one or more control circuits in communication with the memory array, the one or more control circuits cause a first forming operation to be performed to a first set of non-volatile storage elements connected to the first group of vertical bit lines and the plurality of word line combs, the one or more control circuits cause a second forming operation to be performed to a second set of non-volatile storage elements connected to the second group of vertical bit lines and the plurality of word line combs, the second forming operation is performed subsequent to the first forming operation, the first forming operation includes setting a first word line comb of the plurality of word line combs to a first voltage and setting a second word line comb of the plurality of word line combs to the first voltage, the first word line comb includes a first finger, the second word line comb includes a second finger, the first forming operation includes setting a first vertical bit line of the first group of vertical bit lines to a second voltage less than the first voltage, the first vertical bit line is connected to the first finger via a first storage element and is connected to the second finger via a second storage element.

2. The non-volatile storage system of claim 1 , wherein:

the one or more control circuits cause a forming voltage to be applied across the first storage element and the forming voltage to be applied across the second storage element during the first forming operation.

3. The non-volatile storage system of claim 1 , wherein:

the number of vertical bit lines in the second group of vertical bit lines is greater than the number of vertical bit lines in the first group of vertical bit lines.

4. The non-volatile storage system of claim 1 , wherein:

each word line comb of the plurality of word line combs is located at a different layer of a plurality of word line comb layers.

5. The non-volatile storage system of claim 1 , wherein:

the first word line comb is located above the second word line comb.

6. The non-volatile storage system of claim 1 , wherein:

the memory array is associated with a total number of word line comb layers, the plurality of word line combs comprises word line combs at a plurality of layers less than the total number of word line comb layers.

7. The non-volatile storage system of claim 1 , wherein:

the memory array is monolithically formed in one or more physical levels of memory cells having active areas disposed above a silicon substrate.

8. The non-volatile storage system of claim 1 , wherein:

the memory array comprises a three-dimensional memory array.

9. The non-volatile storage system of claim 1 , wherein:

each non-volatile storage element of the first set of non-volatile storage elements includes a reversible resistance-switching element without an isolation element in series with the reversible resistance-switching element.

10. A method for operating a non-volatile storage system, comprising:

determining a first group of vertical bit lines connected to a plurality of word line combs, the first group of vertical bit lines includes a first bit line, each word line comb of the plurality of word line combs is connected to the first bit line;

performing a first forming operation for a first set of non-volatile storage elements connected to the first group of vertical bit lines and the plurality of word line combs, the performing a first forming operation includes setting a first word line comb of the plurality of word line combs to a first voltage and setting a second word line comb of the plurality of word line combs to the first voltage, the first word line comb includes a first finger, the second word line comb includes a second finger, the performing a first forming operation includes setting a first vertical bit line of the first group of vertical bit lines to a second voltage less than the first voltage, the first vertical bit line is connected to the first finger via a first storage element and is connected to the second finger via a second storage element;

determining a second group of vertical bit lines connected to the plurality of word line combs different from the first group of vertical bit lines, the second group of vertical bit lines includes a second bit line, each word line comb of the plurality of word line combs is connected to the second bit line; and

performing a second forming operation for a second set of non-volatile storage elements connected to the second group of vertical bit lines and the plurality of word line combs, the second forming operation is performed subsequent to the first forming operation.

11. The method of claim 10 , wherein:

the setting a first vertical bit line to a second voltage includes setting the first vertical bit line to the second voltage such that a forming voltage is applied across the first storage element and the forming voltage is applied across the second storage element.

12. The method of claim 10 , wherein:

the number of vertical bit lines in the second group of vertical bit lines is greater than the number of vertical bit lines in the first group of vertical bit lines.

13. The method of claim 10 , wherein:

each word line comb of the plurality of word line combs is located at a different layer of a plurality of word line comb layers.

14. The method of claim 10 , wherein:

the first word line comb is located above the second word line comb.

15. The method of claim 10 , wherein:

the plurality of word line combs comprises word line combs at each layer of a plurality of word line comb layers.

16. The method of claim 10 , wherein:

the performing a first forming operation includes applying a forming voltage across non-volatile storage elements on all of the plurality of word line comb layers.

17. The method of claim 10 , wherein:

the first set of non-volatile storage elements is part of a memory array, the memory array is associated with a total number of word line comb layers, the plurality of word line combs comprises word line combs at a plurality of layers less than the total number of word line comb layers.

18. The method of claim 17 , wherein:

the memory array is monolithically formed in one or more physical levels of memory cells having active areas disposed above a silicon substrate.

19. The method of claim 10 , wherein:

the first set of non-volatile storage elements is part of a memory array, each non-volatile storage element of the first set of non-volatile storage elements includes a reversible resistance-switching element without an isolation element in series with the reversible resistance-switching element.

20. A non-volatile storage system, comprising:

a memory array, the memory array includes a first group of vertical bit lines connected to a plurality of word line combs, the first group of vertical bit lines includes a first bit line, each word line comb of the plurality of word line combs is connected to the first bit line, the memory array includes a second group of vertical bit lines connected to the plurality of word line combs, the second group of vertical bit lines includes a second bit line, each word line comb of the plurality of word line combs is connected to the second bit line, the number of vertical bit lines in the second group of vertical bit lines is greater than the number of vertical bit lines in the first group of vertical bit lines; and

one or more control circuits in communication with the memory array, the one or more control circuits cause a first voltage to be applied to a first word line comb of the plurality of word line combs and to a second word line comb of the plurality of word line combs, the first word line comb includes a first finger, the second word line comb includes a second finger, the one or more control circuits cause a second voltage less than the first voltage to be applied to a first vertical bit line of the first group of vertical bit lines, the first vertical bit line is connected to the first finger via a first storage element and is connected to the second finger via a second storage element, the one or more control circuits cause the second voltage to be applied to a second vertical bit line of the second group of vertical bit lines subsequent to applying the second voltage to the first vertical bit line, the second vertical bit line is connected to the first finger via a third storage element and is connected to the second finger via a fourth storage element.

Assignments (7)
PARTIAL RELEASE OF SECURITY INTERESTS Recorded Apr 25, 2025
From: JPMORGAN CHASE BANK, N.A., AS AGENT
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 071382/0001 →
SECURITY AGREEMENT Recorded Apr 25, 2025
From: SANDISK TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 071050/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 31, 2024
From: SANDISK TECHNOLOGIES LLC
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 069796/0423 →
CHANGE OF NAME Recorded May 25, 2016
From: SANDISK TECHNOLOGIES INC
To: SANDISK TECHNOLOGIES LLC
Reel/Frame 038812/0954 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT LISTED PATENT NUMBER 8853569 TO THE CORRECT PATENT NUMBER 8883569 PREVIOUSLY RECORDED ON REEL 038300 FRAME 0665. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Apr 25, 2016
From: SANDISK 3D LLC
To: SANDISK TECHNOLOGIES INC.
Reel/Frame 038520/0552 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 30, 2016
From: SANDISK 3D LLC.
To: SANDISK TECHNOLOGIES INC.
Reel/Frame 038300/0665 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 20, 2015
From: SIAU, CHANG; YAN, TIANHONG
To: SANDISK 3D LLC
Reel/Frame 036836/0491 →
Continuity (3)
Continuation 14246053 · Apr 5, 2014
Provisional Application 61809206 · Apr 5, 2013
Related Publication 20160042789A1 · Feb 11, 2016