Patent Assignment
Reel/Frame 012064/0121
Assignment of Assignor's Interest
Recorded: 2001-08-10
Pages: 2
Assignors
HARTNER, WALTER
Executed: 2001-05-24
SCHINDLER, GUNTHER
Executed: 2001-07-09
HINTERMAIER, FRANK
Executed: 2001-07-02
WEINRICH, VOLKER
Executed: 2001-06-15
Assignee
SIEMENS AKTIENGESELLSCHAFT
ZT GG VM, POSTFACH 22 16 34, MUNCHEN, 80506, GERMANY
Covered Property
(1)
A Method for Preventing Etching-Induced Damage to a Metal Oxide Film by Patterning the Film After a Nucleation Anneal but While Still Amorphous and Then Thermally Annealing to Crystallize
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Feb 18, 2010
From: SIEMENS AKTIENGESELLSCHAFT
To: INFINEON TECHNOLOGIES AG
Reel/Frame 024114/0059 →
Assignment of Assignor's Interest
Apr 5, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 024218/0001 →
Assignment of Assignor's Interest
May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest
Aug 14, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036353/0134 →