Patent Assignment
Reel/Frame 015797/0070
Change of Name
Recorded: 2005-03-19
Pages: 11
Assignor
JAPAN SYNTHETIC RUBBER CO., LTD.
Executed: 1997-12-10
Assignee
JSR CORPORATION
6-10, TSUKIJI 5-CHOME, CHUO-KU, TOKYO, JAPAN
Covered Properties
(55)
Process for Producing a Diolefin Polymer or Copolymer and a Rubber Composition Containing Such a Diolefin Polymer or Copolymer
Patent:
5,527,860 →
Application:
08/184,217 →
Radiation-Sensitive Composition Containing 1,2 Quinone Diazide Compound, Alkali-Soluble Resin and Monooxymonocarboxylic Acid Ester Solvent
Patent:
5,405,720 →
Application:
08/196,497 →
Thermoplastic Resin Composition
Patent:
5,409,996 →
Application:
08/200,423 →
Process for Inspecting Electrodes Using Rotation Alignment Correction
Patent:
5,537,050 →
Application:
08/202,589 →
Radiation Sensitive Resin Composition
Patent:
5,494,777 →
Application:
08/229,677 →
Radiation Sensitive Resin Composition
Patent:
5,609,988 →
Application:
08/229,746 →
Method for Domain-Dividing Liquid Crystal Alignment Film and Liquid Crystal Device Using Domain-Divided Alignment Film
Patent:
5,478,682 →
Application:
08/248,207 →
Radiation-Sensitive Resin Composition
Patent:
5,478,691 →
Application:
08/259,167 →
Radiation-Sensitive Composition
Patent:
5,482,816 →
Application:
08/263,421 →
Process for Producing Polybutadiene
Patent:
5,548,045 →
Application:
08/302,958 →
Process for Producing Copolymer Latex and Paper Coating Composition, Carpet Backing Composition or Adhesive Composition Comprising Said Latex
Patent:
5,637,644 →
Application:
08/313,911 →
Water-Based Maskant Composition and Chemical Milling Method Using the Same
Patent:
5,466,739 →
Application:
08/323,056 →
Chemically Amplified Resist
Patent:
5,580,695 →
Application:
08/339,289 →
Reflection Preventing Film and Process for Forming Resist Pattern Using the Same
Patent:
5,525,457 →
Application:
08/354,847 →
Thermoplastic Elastomer Composition
Patent:
5,504,156 →
Application:
08/355,980 →
Epoxy Group-Containing Copolymer and Radiation Sensitive Resin Compositions Thereof
Patent:
5,530,036 →
Application:
08/356,544 →
Method of Pattern Formation Utilizing Radiation-Sensitive Resin Composition Containing Monooxymonocarboxylic Acid Ester Solvent
Patent:
5,494,784 →
Application:
08/357,400 →
Radiation Sensitive Resin Composition Comprising Copolymer of Isopropenylphenol and T-Butyl(Meth)Acrylate
Patent:
5,556,734 →
Application:
08/363,269 →
Optical Film
Patent:
5,518,843 →
Application:
08/371,428 →
Liquid Crystal Display Panel
Patent:
5,516,456 →
Application:
08/393,490 →
Hydrogenated Block Copolymer and Hydrogenated Block Copolymer Composition
Patent:
5,596,041 →
Application:
08/414,230 →
Paper Coating Composition
Patent:
5,700,852 →
Application:
08/414,592 →
Coated Paper
Patent:
5,786,100 →
Application:
08/436,491 →
Liquid Crystal Aligning Agent and Liquid Crystal Display Device
Patent:
5,612,450 →
Application:
08/441,740 →
Blood-Sampling Vessel
Patent:
5,593,639 →
Application:
08/450,144 →
Ethylene-Alpha-Olefin-Non-Conjugated Diene Copolymer Rubber Composition
Patent:
5,691,413 →
Application:
08/532,098 →
Water Developable Photosensitive Resin Composition
Patent:
5,736,298 →
Application:
08/536,494 →
Radiation Sensitive Resin Composition
Patent:
5,707,558 →
Application:
08/538,049 →
Molded Article
Patent:
5,766,699 →
Application:
08/546,610 →
Thermosetting Resin Composition
Patent:
5,576,398 →
Application:
08/561,626 →
Resin Composition for Flexographic Printing Plate
Patent:
5,731,128 →
Application:
08/564,729 →
Ethylene-Alpha-Olefin-Non-Conjugated Diene Copolymer Rubber Composition
Patent:
5,677,382 →
Application:
08/567,484 →
Liquid Crystal-Aligning Agent
Patent:
5,698,135 →
Application:
08/568,508 →
Rubber Composition
Patent:
5,646,224 →
Application:
08/580,998 →
Protonic Conductor and Electrochemical Element Using the Same
Patent:
5,682,261 →
Application:
08/583,254 →
Chemically Amplified Resist Composition
Patent:
5,629,135 →
Application:
08/590,677 →
Polyimide Block Copolymer and Liquid Crystal Alignment Layer Forming Agent
Patent:
5,773,559 →
Application:
08/594,521 →
Chemically Amplified, Radiation-Sensitive Resin Composition
Patent:
5,731,125 →
Application:
08/597,561 →
Photosensitive Resin Composition Comprising a Carboxyl Group-Containing Diene Copolymer and a Hydrogenated Diene Block Polymer
Patent:
5,731,129 →
Application:
08/598,619 →
Blow Molding Apparatus
Patent:
6,048,189 →
Application:
08/620,455 →
Radiation Sensitive Resin Composition Containing Quinone Diazide Ester Having Two Hindered Phenol Groups
Patent:
5,672,459 →
Application:
08/621,008 →
Liquid Crystal Orienting Agent
Patent:
5,700,860 →
Application:
08/622,280 →
Process for Producing Polybutadiene Rubber
Patent:
5,686,543 →
Application:
08/655,676 →
An Inspection Apparatus for Printed Wiring Board
Patent:
5,672,978 →
Application:
08/657,330 →
Water-Developing Photosensitive Resin Composition
Patent:
5,861,232 →
Application:
08/657,612 →
Optical Molding Process
Patent:
5,820,811 →
Application:
08/674,915 →
Radiation Sensitive Composition for Color Filters
Patent:
5,866,298 →
Application:
08/754,811 →
Liquid Crystal Aligning Agent and Liquid Crystal Display Device
Patent:
5,756,649 →
Application:
08/791,059 →
Polyamic Acid, Polyimide and Liquid Crystal Aligning Agent
Patent:
5,783,656 →
Application:
08/791,616 →
Radiation Sensitive Composition Containing a Fluorescent Substance Dispersed Therein
Patent:
5,792,589 →
Application:
08/794,935 →
Process for Producing Modified Cross-Linked Polymer Particles
Patent:
5,773,519 →
Application:
08/814,480 →
Radiation Sensitive Resin Composition
Patent:
5,798,201 →
Application:
08/887,466 →
Water-Developable Photosensitive Resin Composition
Patent:
5,837,421 →
Application:
08/904,267 →
Blow Molding Apparatus
Patent:
6,099,285 →
Application:
09/225,686 →
Radiation Sensitive Resin Composition
Patent:
37,179 →
Application:
09/420,604 →
Related Assignments
(20)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 21, 1994
From: YAMAKAWA, YOSHITAKA; YASUDA, KYOUYUU; HATTORI, IWAKAZU; YOKOYAMA, HIDEAKI
To: JAPAN SYNTHETIC RUBBER CO., LTD.; BRIDGESTONE CORPORATION
Reel/Frame 006866/0038 →
Assignment of Assignor's Interest
Apr 8, 1994
From: HARUTA, YUICHI; SUGAWARA, KENTAROO; YAGII, KEIKICHI
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 006933/0710 →
Assignment of Assignor's Interest
Jun 13, 1994
From: MIYAMOTO, HIDETOSHI; SHIRAKI, SHINJI; YUMOTO, YOSHIJI; MIURA, TAKAO
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007022/0790 →
Assignment of Assignor's Interest
Jul 28, 1994
From: SHIRAKI, SHINJI; MIYAMOTO, HIDETOSHI; INOUE, MASAAKI; OTA, TOSHIYUKI
To: JAPAN SYNTHETIC RUBER CO., LTD.
Reel/Frame 007077/0341 →
Assignment of Assignor's Interest
Oct 21, 1994
From: NISHIKAWA, MICHINORI; ENDOH, MASAYUKI; TSUDA, YUSUKE; BESSHO, NOBUO
To: JAPAN SYNTHETIC RUBBER CO., LTD., A JAPANESE CORP.
Reel/Frame 007179/0841 →
Assignment of Assignor's Interest
Dec 14, 1994
From: TAKEZAKI, YOSHIYUKI; KOJINA, JUNJI; NEJIGAKI, KAZUMI; FUJINAGA, YOSHIHISA
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007282/0625 →
Assignment of Assignor's Interest
Jan 4, 1995
From: SHINOHARA, HIRONOBU; SUZUKI, YOSHINOBU; YAMAMOTO, KAZUHIKO
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007279/0590 →
Assignment of Assignor's Interest
Mar 10, 1995
From: HARA, YASUO; SHINOHARA, HIRONOBU
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007391/0003 →
Assignment of Assignor's Interest
Apr 7, 1995
From: SHINOHARA, HIRONOBU; OHTSUKI, TOSHIHIRO
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007421/0615 →
Assignment of Assignor's Interest
Apr 17, 1995
From: YAMACHIKA, MIKIO; KOBAYASHI, EIICHI; OTA, TOSHIYUKI; TSUJI, AKIRA
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007430/0807 →
Assignment of Assignor's Interest
May 17, 1995
From: IWANAGA, SHIN-ICHIRO; SHINGAE, SHIGERU; MORITA, TAKASI; ISHIKAWA, OSAMU
To: JAPAN SYNTHETIC RUBBER CO.,LTD.
Reel/Frame 007483/0064 →
Assignment of Assignor's Interest
Jun 26, 1995
From: SOULES, THOMAS F.; WHITMAN, PAMELA K.; BARRY, JENNIFER I.
To: GENERAL ELECTRICF COMPANY
Reel/Frame 007529/0966 →
Assignment of Assignor's Interest
Jul 11, 1995
From: MAKINO, KENYA; YAMAKAWA, YOSHITAKA; MURATA, MITSUHIRO; HAYASHI, TOSHIO
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007545/0167 →
Assignment of Assignor's Interest
Aug 9, 1995
From: HASHIGUCHI, YOSHIHARU; HASEGAWA, MINORU; GOSHIMA, KUNIO; TAKEMURA, YASUHIKO
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007579/0719 →
Assignment of Assignor's Interest
Aug 14, 1995
From: MAEDA, TUKASA; SASAGAWA, YASUHIKO; IKEDA, YORINOBU; HIRAHARU, TERUO
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007605/0776 →
Assignment of Assignor's Interest
Aug 28, 1995
From: MIZUSHIMA, SHIGEAKI; WATANABE, NORIKO; IWAGOE, HIROKO; MAKINO, SEIJI
To: JAPAN SYNTHETIC RUBBER CO., LTD.; SHARP CORPORATION
Reel/Frame 007626/0966 →
Assignment of Assignor's Interest
Mar 25, 1996
From: NEMOTO, HIROAKI; ENDO, MASAYUKI; YUMOTO, YOSHIJI; MIURA, TAKAO
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007900/0258 →
Assignment of Assignor's Interest
May 24, 1996
From: GOTO, KOHEI; HATTORI, IWAKAZU; OGASAHARA, SHOJI; SHIBATA, MASAHIRO
To: JAPAN SYNTHETIC RUBBER CO., LTD.
Reel/Frame 007959/0459 →
Change of Name
Jul 27, 1999
From: JAPAN SYNTHETIC RUBBER CO., LTD.
To: JSR CORPORATION
Reel/Frame 010086/0530 →
Change of Name
Feb 18, 2000
From: JAPAN SYNTHETIC RUBBER CO., LTD.
To: JSR CORPORATION
Reel/Frame 010556/0135 →