IP Library › Assignment 016084/0191
Patent Assignment
Reel/Frame 016084/0191

Assignment of Assignor's Interest

Recorded: 2004-12-13 Pages: 3
Assignors
SCHWARZL, SIEGFRIED
Executed: 2002-11-18
WURM, STEFAN
Executed: 2002-11-27
Assignee
INFINEON TECHNOLOGIES AG
ST.-MARTIN-STRASSE 53, MUENCHEN, 81669, GERMANY
Covered Property (1)
Reflection Mask for Euv-Lithography and Method for Fabricating the Reflection Mask
Patent: 6,849,365 →
Application: 10/292,866 →
Publication: US 2003/0091910
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 13, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023773/0457 →
Assignment of Assignor's Interest May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest Oct 7, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036808/0284 →
Assignment of Assignor's Interest Feb 12, 2020
From: POLARIS INNOVATIONS LIMITED
To: CHANGXIN MEMORY TECHNOLOGIES, INC
Reel/Frame 051917/0581 →